AN ON-LINE DEVICE FOR PREDICTING AT LEAST ONE FLUID FLOW PARAMETER IN A PROCESS
    93.
    发明公开
    AN ON-LINE DEVICE FOR PREDICTING AT LEAST ONE FLUID FLOW PARAMETER IN A PROCESS 审中-公开
    在线设备用于预测至少一个流体流动参数的过程

    公开(公告)号:EP1248943A1

    公开(公告)日:2002-10-16

    申请号:EP00984682.5

    申请日:2000-12-06

    CPC classification number: C02F1/325 C02F1/008 C02F1/32 C02F2201/326 G01F1/00

    Abstract: There is described an on-line device for predicting at least one fluid flow parameter in a process. In embodiment, the process in question comprises a flow domain having disposed therein a pre-determined portion in which a fluid flows and the device comprises a computer having: (i) a memory for receiving a database, the database comprising relative information in respect of a plurality of nodes or a plurality of particle pathways in the pre-determined portion; (ii) means to receive input data from the process; and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. In another embodiment the process in question comprises a bounded flow domain having disposed therein a pre-determined matrix and the device comprises a computer having: (i) a memory for receiving a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix; (ii) means to receive input data from the process; and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. The device is particularly advantageously employed as a UV dosimeter.

    OPTICAL RADIATION SENSOR SYSTEM
    94.
    发明公开
    OPTICAL RADIATION SENSOR SYSTEM 有权
    光辐射测量仪

    公开(公告)号:EP1240483A2

    公开(公告)日:2002-09-18

    申请号:EP00982796.5

    申请日:2000-12-15

    Abstract: There is disclosed an optical radiation sensor device. The device includes a radiation collector for receiving radiation from a predefined arc around the collector within the field and redirecting the received radiation along a predefined pathway; motive means to move the radiation collector from a first position in which a first portion of the predefined arc is received by the radiation collector and a second portion in which a second portion of the predefined arc is received by the radiation collector; and a sensor element capable of detecting and responding to incident radiation along the pathway when the radiation collector is in the first position and in the second. The use of the optical radiation sensor device in a radiation source module and in a fluid treatment system is also described.

    UV-fluid treatment system and process
    98.
    发明公开
    UV-fluid treatment system and process 失效
    系统和Verfahren zur UVFlüssigkeitsbehandlung

    公开(公告)号:EP0811579A2

    公开(公告)日:1997-12-10

    申请号:EP97112786.5

    申请日:1994-03-04

    Abstract: The invention relates to a cleaning apparatus for a radiation source assembly in a fluid treatment system.
    The invention is characterized in that the cleaning apparatus comprises:

    a cleaning sleeve engaging a portion of the exterior of a radiation source in the radiation source assembly and movable between: (i) a retracted position wherein a portion of the radiation source is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the portion of the radiation source is completely or partially covered by the cleaning sleeve,
    the cleaning sleeve further comprising a chamber in contact with the portion of the radiation source, the chamber adapted for receiving a cleaning solution suitable to remove undesired materials from the portion of the radiation source.

    Abstract translation: 本发明涉及一种用于流体处理系统中的辐射源组件的清洁装置。 本发明的特征在于,清洁装置包括:清洁套筒,与辐射源组件中的辐射源的外部的一部分接合并可在以下位置之间移动:(i)缩回位置,其中辐射源的一部分暴露于 待处理的流体流动,以及(ii)延伸位置,其中辐射源的该部分被清洁套筒完全或部分地覆盖,清洁套筒还包括与辐射源的该部分相接触的室, 适于接收适于从所述辐射源的所述部分去除不需要的材料的清洁溶液。

    RADIATION SOURCE MODULE AND CLEANING APPARATUS THEREFOR
    100.
    发明授权
    RADIATION SOURCE MODULE AND CLEANING APPARATUS THEREFOR 有权
    辐射源装置,清洁手段THEREFOR

    公开(公告)号:EP1159226B1

    公开(公告)日:2011-09-21

    申请号:EP99953469.6

    申请日:1999-11-03

    CPC classification number: C02F1/325 C02F2201/3227 C02F2201/324

    Abstract: A cleaning apparatus for a radiation source assembly (120) in a fluid treatment system is described. The cleaning system comprises: a cleaning sleeve (145) comprising a cleaning ring (150) for engagement with a portion of the exterior of the radiation source assembly (120); a slidable member (155) magnetically coupled to the cleaning sleeve, the slidable member being disposed on and slidable with respect to a rodless cylinder (140); and motive means to translate the slidable member along the rodless cylinder whereby the cleaning whereby the cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module (100) comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source as when it becomes fouled.

Patent Agency Ranking