公开(公告)号：JPH0566555A

公开(公告)日：1993-03-19

申请号：JP22752191

申请日：1991-09-07

Applicant: CANON KK

Inventor： SAITO KENJI ,  UEDA HIROHARU ,  NOSE TETSUSHI ,  YOSHII MINORU ,  CHITOKU KOICHI

IPC: G03F1/42 ,  H01L21/027

Abstract: PURPOSE:To eliminate the influence of a shape error generated between patterns of respective layers at the time of alignment verification. CONSTITUTION:A mark for alignment and a mark for verification are provided on the mask and the mask and a transfer destination body 60 are aligned by using the alignment mark on the same mask with a transferred alignment mark on the transfer destination body 60 to which the alignment mark and verification mark are transferred; while they are aligned, a verification mark 8'' transferred to the transfer destination body 60 is compared with the verification mark 8' transferred by the 1st transfer to verify the alignment.

公开(公告)号：JPH04212002A

公开(公告)日：1992-08-03

申请号：JP6024991

申请日：1991-03-25

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  SAITO KENJI ,  CHITOKU KOICHI ,  YOSHII MINORU

IPC: G01B11/00 ,  G01N21/88 ,  G03F9/00 ,  H01L21/027 ,  H01L21/66

Abstract: PURPOSE:To provide a method and an apparatus for measuring overlap accuracy or positioning accuracy of a device which can be automated, can shorten measurement time and enables stable and high measurement accuracy. CONSTITUTION:The invention detects a shift in relative positions between first and second grid patterns by applying coherent light to the first grid pattern A and the second grid pattern B on the same plane and making diffraction light emitted from the first/second grid patterns coherent. The respective grid patterns are formed in different processes. Thus overlap accuracy, etc., between the respective processes is measured.

公开(公告)号：JPH04172204A

公开(公告)日：1992-06-19

申请号：JP29706590

申请日：1990-11-05

Applicant: CANON KK

Inventor： TAKAYAMA HIDEMI ,  SAKAMOTO EIJI ,  YOSHII MINORU

IPC: G01B9/02

Abstract: PURPOSE:To know a position of the point peculiar to an object by setting up at least two reflecting mirrors in the same direction on a position-detecting target and correcting a change component of a reflecting mirror interval by a modification of an object. CONSTITUTION:The light of a light source 9 is divided by a semitransparent mirror 4, and the reflected light is reflected by a reflecting mirror 7, penetrates semitransparent mirrors 4 and 3 and arrives at a detector 10 as the reference light. The transparent light is reflected by a semitransparent mirror 2 through the semitransparent mirror 2 and a reflecting mirror 5, reflected by a semitransparent mirror 3 through a semitransparent mirror 1 and a reflecting mirror 6 and interfered by a detector 10. The position of a holding plate 8 is known counting fringes of the interfering light. The optical path is 4XDELTAx long when the holding plate 8 whose the optical path difference is firstly zero is moved DELTAx. The mirrors 5 and 6 move only + or -(1/2)alphaDELTATXL each other and the optical path change is cancelled to become zero, when the interval of the reflecting mirror 5 and 6 is L, the center line of the holding plate 8 is fixed, the coefficient of thermal expansion is alpha and the temperature change is DELTAT. Therefore, the reduction of the measuring accuracy by thermal deformation of the measured object can be perfectly prevented.

公开(公告)号：JPH03245687A

公开(公告)日：1991-11-01

申请号：JP4132190

申请日：1990-02-23

Applicant: CANON KK

Inventor： UNNO YASUYUKI ,  TOKUMITSU JUN ,  YOSHII MINORU ,  SUDA SHIGEYUKI

IPC: G03B21/58 ,  H04N5/74

Abstract: PURPOSE:To prevent occurrence of uneven brightness by providing an overlap state detection means between a screen and plural projectors at a position where at least one of adjacent picture lights at a joint overlapped with parts of adjacent picture lights is always projected onto the screen. CONSTITUTION:A picture generated by a position deviation detection picture generator 30 is projected onto screen parts 5a-5d at a prestage prior to projecting an externally inputted picture signal S1 onto the screen and the projected position of each split picture is detected by each output of line sensors 11-14, and when the picture is deviated from a prescribed position, the deviation is corrected by VAP 7a-7d. Figure shoes four split screens 5a-5d and the hatched line is a part on which pictures are overlapped. Moreover, the part surrounding in thick lines in figure is a range in which a video light from the projector 1a is projected. A microprocessor 39 controls a VAP drive circuit 38 so that the output state of the line sensor 11 is restored to a position to be placed substantially to drive a VAP driver 36.

公开(公告)号：JPH03204278A

公开(公告)日：1991-09-05

申请号：JP25790

申请日：1990-01-05

Applicant: CANON KK

Inventor： TOKUMITSU JUN ,  YOSHII MINORU ,  SUDA SHIGEYUKI ,  SEKINE MASAYOSHI

IPC: G02B7/28 ,  H04N5/232 ,  H04N9/04

Abstract: PURPOSE:To detect the focusing state accurately by calculating the width of a color transit region from a color component of a video signal in the color transit region of an object and comparing the width of the color transit region so as to discriminate the focusing. CONSTITUTION:A hue calculation circuit 53 reads a data in a range finding region from a frame memory 52. The hue calculation circuit 53 calculates the hue from each color component of R, G, B and a focus detection signal generating circuit 54 generates a focus detection signal. Then a width calculation circuit 55 calculates the signal width, that is, transit width from a focus detection signal from the focus detection signal generating circuit 54 and a minimum value detection circuit 56 detects the minimum value in the range finding region in the widths calculated by the width calculation circuit 54. Then an area setting circuit 58 decides a focus detection region based on the detection output from the minimum value detection circuit 56. Thus, focus detection with high accuracy is attained.

公开(公告)号：JPH0353512A

公开(公告)日：1991-03-07

申请号：JP18972489

申请日：1989-07-20

Applicant: CANON KK

Inventor： KAWAKAMI EIGO ,  YOSHII MINORU ,  UZAWA SHUNICHI

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/30

Abstract: PURPOSE:To suppress the generation of transfer distortion, and to accomplish highly precise exposure by a method wherein a fine beam, when compared with an exposure light, is projected on a reflection plate having a reflection surface and a position pattern, and the mutual relation is corrected by observing the positional relation of the formed spot and the position pattern. CONSTITUTION:First, the optical axis of an exposure beam and the optical axis of an optical- axis adjusting optical system 8 are matched with each other using a first observation optical system. The optical axis adjusting system 8 is shifted by a second driving device 17, and the optical axis OX of a radiant light 3 and the optical axis OA of an autocollimetor 14 are brought into the relation of common axis or almost common axis. Then, using a second observation optical system, an optical-axis matching operation is conducted on the optical-axis adjusting optical system 13 and a transferring exposure part main body 1. To be more precise, the deviation between a reflected image and a cursor 22 is detected by treating the image information obtained by the autocollimeter, and a control part 19 controls a driving device 2 in accordance with the detected value. By repeating the above-mentioned adjustment, the optical axis of the transferring exposure part main body 1 and the optical-axis adjusting optical system 8, the optical axis OX of the exposure light and the optical axis OM of the transferring exposure part main body are coincided finally, and they are brought in an exposable state.

公开(公告)号：JPH0274812A

公开(公告)日：1990-03-14

申请号：JP22601088

申请日：1988-09-09

Applicant: CANON KK

Inventor： YOSHII MINORU ,  ABE NAOTO

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to detect positional relation with few errors by obtaining the specified position in the cross section of luminous flux whose position fluctuation due to the effect of noises and the like is hard to occur, detecting the movement of said position, and obtaining the relative position relation between a first body and a second body. CONSTITUTION:Luminous flux from a light source means S is projected on first and second bodies Q1 and Q2. The luminous flux which is deflected through at least either of the body Q1 or Q2 is received with a specified surface. The light intensity of the luminous flux at each point within the specified surface is detected with a light detecting means IS. The value of the light intensity of the luminous flux at each point is detected with the light detecting means IS at the position of each point within the specified surface. The value is multiplied by constants which are different in correspondence with the values of the light intensities. The resultant values are averaged, and the average position is obtained with an average-position detecting means. A means which detects the relative positional relation between the first and second bodies Q1 and Q2 based on the average position with the average-position detecting means is provided. In this way, the highly accurate detection can be performed when the position deviation and the interval between the two bodies are detected.

公开(公告)号：JPH021504A

公开(公告)日：1990-01-05

申请号：JP3674689

申请日：1989-02-16

Applicant: CANON KK

Inventor： MATSUGI MASAKAZU ,  SAITO KENJI ,  SUDA SHIGEYUKI ,  NIWA YUKICHI ,  YOSHII MINORU ,  NOSE TETSUSHI

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To improve the misalignment detection accuracy by providing two alignment marks and two reference marks on a mask and a wafer, respectively and detecting a misalignment between both of them by utilizing a luminous flux passing through each mark. CONSTITUTION:A first alignment mark 5 and the first reference mark 6 are formed on a mask 1, and also, a second alignment mark 3 and the second reference mark 4 are formed on a wafer 2. In this state, an alignment light beam 7 is made incident on the first and the second alignment marks 5, 3, and a position of its diffracted light is detected by a first detector 11, and also, a reference light 8 is made incident on the first and the second reference marks 6, 4, and a position of its diffracted light beam is detected by the second detector 12. In this case, each element is set so that an incident position of a luminous flux which is made incident on the first detector 11 and an incident position of a luminous flux which is made incident on the second detector 12 are displaced by each different magnification against a misalignment of the mask 1 and the wafer 2. Subsequently, by utilizing signals of the detectors 11, 12, the misalignment between the mask 1 and the wafer 2 is detected by a CPU 11a.

公开(公告)号：JPH01147318A

公开(公告)日：1989-06-09

申请号：JP30574887

申请日：1987-12-04

Applicant: CANON KK

Inventor： KAWAKAMI EIGO ,  SAITO KENJI ,  YOSHII MINORU ,  KAWASE TOSHIMITSU

IPC: G01D5/245 ,  G01B7/00 ,  G01D5/244 ,  G01Q60/10

Abstract: PURPOSE:To take a measurement with high accuracy by adding a high-resolution position detecting means to the encoder so that its resolution is interpolated. CONSTITUTION:A light emitting element 1, a collimator lens 2, a photodetecting element 3, and a mask 5 which constitute a 1st position detecting means are fixed on a holding member 100. This 1st position detecting means counts repetitive patterns of a reflection type code plate 41 to find a relative movement quantity with relatively low resolution. The 2nd position detecting means consisting of the probe 7 and a probe driving means 8 compensates the resolution of the 1st position detecting means to make the resolution of the relative movement measurement high. Repetitive patterns on the code plate 42 are finer than those on the code plate 41.

公开(公告)号：JPS63277922A

公开(公告)日：1988-11-15

申请号：JP11226187

申请日：1987-05-11

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  YOSHII MINORU ,  NIWA YUKICHI ,  KURODA AKIRA

IPC: G01D5/30 ,  G01B11/00 ,  G01D5/38 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

Abstract: PURPOSE:To increase a stroke and to obtain high accuracy by performing length measurement with a large stroke by a 1st length measuring means which generates a pulse signal at intervals of specific unit length and performing interpolation between pulse signals with an electric level signal from a 2nd length measuring means. CONSTITUTION:A Y stage YS is mounted on a state base DS and an X stage XS is mounted on the Y stage YS. A laser interference length measuring instrument LI as a large-stroke length measuring instrument measures the movement quantities and positions of the X and Y stages XS and YS. A length measuring instrument which generates the electric level signal corresponding to a displacement quantity within a range of one measurement length pitch by the laser interference length measuring instrument LI in a space DS on the X stage XS. This length measuring instrument and laser interference length measuring instrument LI measure the movement and positions of the X and Y stages XS and YS.