Method of making extreme ultraviolet lithography glass substrates
    95.
    发明申请
    Method of making extreme ultraviolet lithography glass substrates 审中-公开
    制造极紫外光刻玻璃基板的方法

    公开(公告)号:US20040025542A1

    公开(公告)日:2004-02-12

    申请号:US10456318

    申请日:2003-06-05

    Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

    Abstract translation: 用于制造极紫外光刻工具玻璃基板的方法包括产生等离子体,将包含二氧化硅前体和二氧化钛前体的反应物输送到等离子体中以产生二氧化钛和二氧化硅颗粒,并将二氧化钛和二氧化硅颗粒沉积在沉积表面上以形成均匀的 二氧化钛掺杂二氧化硅。 本发明提供了不含条纹变化的均匀玻璃基底,并提供有益的极紫外光刻反射光学器件。

    Quartz glass preform for optical waveguide
    99.
    发明授权
    Quartz glass preform for optical waveguide 失效
    用于光波导的石英玻璃预制件

    公开(公告)号:US5790736A

    公开(公告)日:1998-08-04

    申请号:US598925

    申请日:1996-02-09

    Applicant: Heinz Fabian

    Inventor: Heinz Fabian

    Abstract: In an optical component having a cylindrical core of quartz glass and a coaxial jacket of quartz glass containing a dopant which decreases the index of refraction, the jacket glass contains a viscosity-increasing stiffening agent to reduce tensile strength on the core at drawing temperature of 1000.degree. to 2500.degree. C. or a relaxation agent for lowering the viscosity of the quartz glass in a concentration which is lower than that present in the core glass.

    Abstract translation: 在具有石英玻璃的圆柱形芯和含有掺杂剂的同轴套管的光学部件中,该玻璃包含降低折射率的掺杂剂,夹套玻璃含有增粘硬化剂,以在拉伸温度为1000℃时降低芯上的拉伸强度 DEG至2500℃或用于降低石英玻璃的粘度的松弛剂,其浓度低于芯玻璃中存在的浓度。

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