Abstract:
A quartz glass provides an opaque quartz glass having high light-shielding property, excellent mechanical strength and excellent cleaning resistance against hydrofluoric acid. By setting the maximum width of the amorphous bubbles existing in the opaque quartz glass to an average of 3 to 15 μm and the density to 2.15 g/cm3 or more, the mechanical strength after baking and the cleaning resistance by hydrofluoric acid are improved. The opaque quartz glass has a whiteness at a thickness of 10 mm of 75 to 90%, the reflectance of light with a wavelength of 0.24 to 2.6 μm at a thickness of 4 mm is 60 to 85%, and the bending strength after baking is 95 MPa. In addition, a foaming agent may be mixed in the opaque quartz glass. An opaque quartz glass having cleaning resistance against acid can be obtained.
Abstract:
One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. On aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.
Abstract:
According to embodiments, an optical fiber may include a core portion comprising an outer radius rC and a maximum relative refractive index ΔCmax. A cladding may surround the core portion and include a low-index trench and an outer cladding. The low index trench may surround the core portion and includes an outer radius rT and relative refractive index ΔT. The outer cladding may surround and be in direct contact with the low-index trench. The outer cladding may be formed from silica-based glass comprising greater than 1.0 wt. % bromine and has a relative refractive index ΔOC, wherein Δcmas>ΔOC>ΔT. The optical fiber may have a cable cutoff of less than or equal to 1530 nm. An attenuation of the optical fiber may be less than or equal to 0.185 dB/km at a wavelength of 1550 nm.
Abstract:
A system and method for sintering a thin, high purity fused silica glass sheet having a thickness of 500 μm or less, includes a step of rastering a beam of a laser across a sheet of high purity fused silica soot; wherein a pattern of the rastering includes tightly spacing target locations on the sheet such that the laser sinters the soot and simultaneously forms tiny notches on a first major surface of the sheet when viewed in cross-section, wherein the tiny notches are crenellated such that at least some of the notches have generally flat bottom surfaces and at least some respective adjoining caps have generally plateau top surfaces offset from the bottom surfaces by steeply-angled sidewalls.
Abstract:
Provided is a method for producing a multi-core optical fiber that includes a plurality of cores made of pure silica glass and exhibits a minor transmission loss. The method for producing a multi-core optical fiber according to the present invention is a method for producing a multi-core optical fiber including a plurality of cores made of pure silica glass substantially free of Ge and a cladding surrounding the plurality of cores and made of a fluorine-containing silica glass. The multi-core optical fiber is produced by drawing an optical fiber preform at a drawing tension T satisfying the relationship 0.06 g/μm2
Abstract:
Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.
Abstract:
A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom.
Abstract:
Microspheres, typically sterile, inert, silica glass microspheres, are dispersed in a carrier suitable for use relative to the object to be imaged and analyzed. In the case of ophthalmic imaging, an ophthalmically-acceptable gel is used and the resulting composition is dispensed into a mammalian eye. The gel and microspheres dispersed therein coat and conform to the surface of the eye. The microspheres enhance reflectance from the eye which improves signal-to-noise ratio and improves imaging quality.
Abstract:
First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
Abstract:
Process for preparing a silicon dioxide granule having a specific surface area of less than 1 m2/g and a proportion of impurities of less than 50 ppm, in which a) a silicon dioxide powder with a tamped density of 15 to 190 g/l, b) is compacted to slugs which are subsequently crushed, the slug fragments having a tamped density of 210 to 800 g/l, and c) the slug fragments are treated with one or more reactive compounds at 400 to 1100° C.