-
公开(公告)号：WO2014176516A1
公开(公告)日：2014-10-30
申请号：PCT/US2014/035478
申请日：2014-04-25
Applicant: AXCELIS TECHNOLOGIES, INC. , COLVIN, Neil , HSIEH, Tseh Jen
Inventor： COLVIN, Neil , HSIEH, Tseh Jen
CPC classification number: H01J37/3171 , F16J15/02 , H01J5/26 , H01J5/32 , H01J27/08 , H01J37/08 , H01J37/3002
Abstract: An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. Electrically insulating seal element(s) engaging an outer surface of the arc chamber body are provided for impeding material from exiting the chamber interior openings of the arc chamber body. The seal element(s) have a ceramic body that includes an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall. The electrically insulating seal element comprises a Boron Nitride (BN) material.
Abstract translation: 用于产生离子流的示例性离子源具有至少部分地界定电弧室的电离区域的室主体。 电弧室主体与热丝电弧室壳体一起使用，其直接或间接地将阴极加热至足够的温度，以使电子流过电弧室的电离区域。 设置与电弧室主体的外表面接合的绝缘密封元件用于阻止材料离开电弧室主体的室内部开口。 密封元件具有陶瓷体，该陶瓷体包括沿着圆周外唇缘邻接电弧室主体的外壁。 密封件还具有一个或多个径向内部通道，其由与外壁间隔开的一个或多个内壁限定。 电绝缘密封元件包括氮化硼（BN）材料。
-
公开(公告)号：WO2014099430A1
公开(公告)日：2014-06-26
申请号：PCT/US2013/073786
申请日：2013-12-09
Applicant: SCHLUMBERGER CANADA LIMITED , SERVICES PETROLIERS SCHLUMBERGER , SCHLUMBERGER HOLDINGS LIMITED , SCHLUMBERGER TECHNOLOGY B.V. , PRAD RESEARCH AND DEVELOPMENT LIMITED , SCHLUMBERGER TECHNOLOGY CORPORATION
Inventor： REIJONEN, Jani , MOLODETSKY, Irina , STEPHENSON, Kenneth E.
CPC classification number: H01J27/08
Abstract: An ion source includes a cathode to emit electrons, a cathode grid downstream of the cathode, a reflector electrode downstream of the cathode grid, reflector grid radially inward of the reflector electrode, and an extractor electrode downstream of the reflector electrode, the extractor electrode and cathode grid defining an ionization region therebetween. The cathode and the cathode grid have a first voltage difference such the electrons are accelerated through the cathode grid and into the ionization region on a trajectory toward the extractor electrode. The reflector grid and the extractor electrode have a second voltage difference less than the first voltage difference such that the electrons slow as they near the extractor electrode and are repelled on a trajectory toward the reflector electrode. The reflector electrode has a negative potential such that the electrons are repelled away from the reflector electrode and into the ionization region.
Abstract translation: 离子源包括发射电子的阴极，阴极下游的阴极栅极，阴极栅极下游的反射器电极，反射器电极的径向内侧的反射器栅极和反射器电极下游的提取器电极，提取器电极和 阴极栅极限定其间的电离区域。 阴极和阴极栅极具有第一电压差，使得电子通过阴极栅极加速并进入到提取器电极的轨迹上的电离区域。 反射器栅格和提取器电极具有小于第一电压差的第二电压差，使得电子随着它们靠近提取器电极而减慢并且在朝向反射器电极的轨迹上被排斥。 反射器电极具有负电位，使得电子被反射离开反射器电极并进入电离区域。
-
公开(公告)号：WO2014074414A1
公开(公告)日：2014-05-15
申请号：PCT/US2013/068104
申请日：2013-11-01
Inventor： GAMMEL, George M. , BINNS, Brant S. , LUBICKI, Piotr R. , KOO, Bon-Woong , WHITE, Richard M. , DANIELS, Kevin M.
CPC classification number: C23C14/54 , C23C14/48 , H01J27/08 , H01J37/026 , H01J37/08 , H01J2237/0206 , H01J2237/022
Abstract: Methods of reducing glitch rates within an ion implanter are described. In one embodiment, a plasma-assisted conditioning is performed, wherein the bias voltage to the extraction electrodes is modified so as to inhibit the formation of an ion beam. The power supplied to the plasma generator in the ion source is increased, thereby creating a high density plasma, which is not extracted by the extraction electrodes. This plasma extends from the arc chamber through the extraction aperture. Energetic ions then condition the extraction electrodes. In another embodiment, a plasma-assisted cleaning is performed. In this mode, the extraction voltage applied to the arc chamber body is modulated between two voltages so as to clean both the extraction electrodes and the faceplate of the arc chamber body.
Abstract translation: 描述了降低离子注入机内毛刺率的方法。 在一个实施例中，执行等离子体辅助调理，其中对提取电极的偏压被修改以便抑制离子束的形成。 提供给离子源中的等离子体发生器的功率增加，从而产生不被提取电极提取的高密度等离子体。 该等离子体从电弧室延伸通过提取孔。 然后，能量离子对引出电极进行调节。 在另一个实施例中，执行等离子体辅助清洁。 在该模式中，施加到电弧室主体的提取电压在两个电压之间调制，以便清洁电弧室主体的提取电极和面板。
-
公开(公告)号：WO2007136722A2
公开(公告)日：2007-11-29
申请号：PCT/US2007011863
申请日：2007-05-17
Applicant: AXCELIS TECH INC , VANDERBERG BO , BENVENISTE VICTOR , FALLON JOHN , POKIDOV ILYA
Inventor： VANDERBERG BO , BENVENISTE VICTOR , FALLON JOHN , POKIDOV ILYA
CPC classification number: H01J27/08 , H01J37/08 , H01J37/304 , H01J37/32467 , H01J2237/002 , H01J2237/082 , H01J2237/31701
Abstract: An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A temperature sensor monitors temperatures within the arc chamber and provides a signal related to sensed temperature. A controller monitors sensed temperature as measured by the sensor and adjusts the temperature to maintain the sensed temperature within a range.
Abstract translation: 用于产生离子流的示例性离子源具有至少部分地限定电弧室的电离区域的铝合金电弧室体。 电弧室主体与热丝电弧室壳体一起使用，其直接或间接地将阴极加热至足够的温度，以使电子流过电弧室的电离区域。 温度传感器监测电弧室内的温度，并提供与感测温度相关的信号。 控制器监测由传感器测量的感测温度，并调节温度以将感测到的温度保持在一定范围内。
-
公开(公告)号：WO0188946A8
公开(公告)日：2003-12-11
申请号：PCT/US0113236
申请日：2001-04-25
Applicant: VARIAN SEMICONDUCTOR EQUIPMENT
Inventor： OLSON JOSEPH C , KLOS LEO , RENAU ANTHONY , VENUTO NICHOLAS A
CPC classification number: H01J27/022 , H01J27/08
Abstract: A cathode in an indirectly heated cathode ion source is supported by at least one rod or pin. The cathode is preferably in the form of a disk, and the support rod is smaller in diameter than the disk to limit thermal conduction and radiation. In one embodiment, the cathode is supported by a single rod at or near its center. The support rod may be held by a spring-action clamp for simple and reliable clamping and unclamping. The disk shaped cathode and the support rod may be fabricated as a single piece. A filament that emits electrons thermionically may be disposed around the rod in close proximity to the cathode.
Abstract translation: 间接加热的阴极离子源中的阴极由至少一个杆或销支撑。 阴极优选为盘的形式，并且支撑杆的直径小于盘以限制热传导和辐射。 在一个实施例中，阴极由其中心处或附近的单个杆支撑。 支撑杆可以通过弹簧夹来保持，以简单可靠的夹紧和松开。 盘形阴极和支撑杆可以制成单件。 热电子发射电子的灯丝可以靠近阴极设置在杆周围。
-
Patent Agency Ranking
公开(公告)号：WO01088946A1
公开(公告)日：2001-11-22
申请号：PCT/US2001/013236
申请日：2001-04-25
CPC classification number: H01J27/022 , H01J27/08
Abstract: A cathode in an indirectly heated cathode ion source is supported by at least one rod or pin. The cathode is preferably in the form of a disk, and the support rod is smaller in diameter than the disk to limit thermal conduction and radiation. In one embodiment, the cathode is supported by a single rod at or near its center. The support rod may be held by a spring-action clamp for simple and reliable clamping and unclamping. The disk shaped cathode and the support rod may be fabricated as a single piece. A filament that emits electrons thermionically may be disposed around the rod in close proximity to the cathode.
Abstract translation: 间接加热的阴极离子源中的阴极由至少一个杆或销支撑。 阴极优选为盘的形式，并且支撑杆的直径小于盘以限制热传导和辐射。 在一个实施例中，阴极由其中心处或附近的单个杆支撑。 支撑杆可以通过弹簧夹来保持，以简单可靠的夹紧和松开。 盘形阴极和支撑杆可以制成单件。 热电子发射电子的灯丝可以靠近阴极设置在杆周围。
-
公开(公告)号：WO00063459A1
公开(公告)日：2000-10-26
申请号：PCT/US2000/010304
申请日：2000-04-17
CPC classification number: H01J27/08 , C23C14/0605 , C23C14/221 , C23C14/564
Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source (2) may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power application element (8) to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.
Abstract translation: 公开了实现更均匀和无颗粒的DLC沉积的系统，其自动循环模式以实现碳基积累的自动去除，或者提供阻碍实现适当气体流动的障碍涉及不同的电路和设计参数选项。 一个离子源（2）可以以两种不同的模式使用，无论是通过自动控制气流类型和速率以及通过控制功率应用元件（8）来实现最大吞吐量或其他期望的处理目标，用于DLC沉积。 可以控制电弧，甚至允许优化实现的整体结果。
-
公开(公告)号：WO1998014977A1
公开(公告)日：1998-04-09
申请号：PCT/US1997017938
申请日：1997-10-03
Applicant: ABBOTT, Richard, C.
IPC: H01J27/16
CPC classification number: H01J27/022 , H01J27/04 , H01J27/08 , H01J27/16 , H01J27/22 , H01J37/08 , H01J37/3171 , H01J2237/31701
Abstract: The present invention relates to the fabrication of materials and structures having selected mechanical, thermal and electrical properties. More particularly, the invention relates to the use of these materials and structures in ion implantation systems. Structures comprising boron material provide components for use in implanters including arc chambers with which a beam of ions is generated for implantation into a target such as a semiconductor wafer.
Abstract translation: 本发明涉及具有选择的机械，热和电特性的材料和结构的制造。 更具体地说，本发明涉及这些材料和结构在离子注入系统中的应用。 包括硼材料的结构提供了用于包括电弧室的注入器中的组件，通过该组件产生离子束用于注入诸如半导体晶片的靶。
-
公开(公告)号：WO2015099711A1
公开(公告)日：2015-07-02
申请号：PCT/US2013/077690
申请日：2013-12-24
Applicant: HALLIBURTON ENERGY SERVICES, INC.
Inventor： PERKINS, David L. , FREESE, Robert Paul , JONES, Christopher Michael , GARDNER, Richard Neal
CPC classification number: G05B19/41875 , C23C14/30 , C23C14/547 , G01B11/0625 , G01B11/0683 , G01N21/211 , G01N21/25 , G01N21/8422 , G01N2021/213 , G05B2219/32368 , H01J27/022 , H01J27/08 , H01J37/3488
Abstract: Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample; forming at least some of the plurality of layers of the ICE in accordance with the ICE design; performing at least two different types of in-situ measurements; predicting, using results of the at least two different types of in situ measurements, performance of the ICE relative to the ICE design; and adjusting the forming of the layers remaining to be formed, at least in part, by updating the ICE design based on the predicted performance.
Abstract translation: 技术包括接收集成计算元件（ICE）的设计，ICE设计包括基板和多个层的规格，它们各自的目标厚度和复折射率，相邻层的复折射率彼此不同，以及 根据ICE设计制造的名义ICE与样品的特性相关; 根据ICE设计形成ICE的多个层中的至少一些层; 执行至少两种不同类型的原位测量; 使用至少两种不同类型的原位测量的结果来预测ICE相对于ICE设计的性能; 并且至少部分地通过基于预测的性能更新ICE设计来调整形成剩余的层的形成。
-
公开(公告)号：WO2013128939A1
公开(公告)日：2013-09-06
申请号：PCT/JP2013/001252
申请日：2013-02-28
CPC classification number: H01J49/0027 , B01D59/44 , G01N30/7266 , H01J27/08 , H01J49/0454 , H01J49/168
Abstract: 大気圧環境下で微小な量の物質をイオン化するにあたり、より容易にソフトイオン化を達成すること。液体に含まれる物質のイオン化方法であって、プローブから基板に液体を供給し、該プローブと該基板との間に該物質が溶解した液体による液架橋を形成する工程と、該プローブを振動させる工程と、該液体が接する該プローブの導電性部位とイオン引き出し電極の間に電界を形成する工程と、を有することを特徴とするイオン化方法。
Abstract translation: 本发明的目的是在大气环境中电离微量的物质时容易进行软电离。 一种用于离子化包含在液体中的物质的方法，所述电离方法的特征在于包括：用于将液体从探针供给到基底并通过所述液体形成所述探针和所述基底之间的液体交联的步骤 其中物质溶解; 使基板振动的工序; 以及在离子引出电极与液体接触的探针的导电部位之间形成电场的步骤。
-
-
-
-
-
-
-
-
-
Search Results
790
records
(took 0.026 seconds)
