公开(公告)号：JP2005136413A

公开(公告)日：2005-05-26

申请号：JP2004312062

申请日：2004-10-27

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  GELLRICH BERNARD ,  WURMBRAND ANDREAS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To enclose humid air in a lithography apparatus. SOLUTION: Liquid is supplied to a space between a final element of a projection system and a substrate. The leakage of the humid air into the other components of the projecting apparatus is prevented by a flow of gas toward a vacuum chamber, thereby preventing complicated components of the lithography apparatus from being damaged by the presence of the humid air. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：将湿空气包围在光刻设备中。 解决方案：将液体供应到投影系统的最终元件和基板之间的空间。 通过气体朝向真空室的流动来防止湿空气泄漏到投影装置的其他部件中，从而防止光刻设备的复杂部件被潮湿空气的损坏所损坏。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005109441A

公开(公告)日：2005-04-21

申请号：JP2004196167

申请日：2004-07-02

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN SCHOTHORST GERARD ,  VAN EIJK JAN ,  LOOPSTRA ERIK ROELOF ,  MUNNING SCHMIDT ROBERT-HAN ,  PEETERS FELIX GODFRIED PETER

IPC: F16F15/02 ,  G03B27/42 ,  G03F7/20 ,  H01L21/027

CPC classification number: F16F7/1005 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for eliminating vibrations caused by reaction forces applied on a base frame BF by acceleration in the apparatus without requiring a complex positioning device and a plurality of balance masses.
SOLUTION: On the basis of information on the movement and acceleration of a substrate table WT and other components in an apparatus, a compensating force is applied on a base frame BF by an actuator 26 by using feedforward control (by a control device 25).
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，用于消除由于在设备上加速而施加在基架BF上的反作用力引起的振动，而不需要复杂的定位装置和多个平衡块。 解决方案：基于衬底台WT和装置中的其它部件的移动和加速度的信息，通过使用前馈控制（通过控制装置），通过致动器26将补偿力施加在基架BF上 25）。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005012996A

公开(公告)日：2005-01-13

申请号：JP2004156996

申请日：2004-05-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HOL SVEN ANTOIN JOHAN ,  JOHAN CORNELIS COMPTER ,  LOOPSTRA ERIK ROELOF ,  VREUGDEWATER PATRICIA

IPC: H01L21/027 ,  H02K7/09 ,  H02K41/025 ,  H02N15/02 ,  H02P25/06 ,  H02P7/00

CPC classification number: H02K7/09 ,  H02K41/025 ,  H02K2201/18 ,  H02N15/02 ,  Y10S414/135

Abstract: PROBLEM TO BE SOLVED: To provide a mobile apparatus at a low cost usable even in the vacuum, controlling a first/second part moved high accurately relating to each other, positioning a mask holder relating to a projected beam in a lithograph projector, and in a manner of positioning a wafer table relating to the projected beam. SOLUTION: The mobile apparatus includes three-phase coil devices 1, 2, 3 of a first part, and a platen 7 of a second part. An AC current is supplied by a current supply 8 to the first/second coil devices 1, 2, 3. The platen 7 is arranged in a region where an induction field is generated when the current is supplied to the coil device. The coil device and the platen are arranged in such a manner that a magnetic field, generated in the platen when the current is allowed to flow in a coil, causes movement toward a first/second direction between the platen and the coil. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：即使在真空中也可以使用低成本的移动设备，控制彼此高精度地移动的第一/第二部分，将与投射的光束相关的掩模保持器定位在光刻投影仪中 并且以与投影光束相关的晶片台的定位方式。 解决方案：移动装置包括第一部分的三相线圈装置1,2,3和第二部分的压板7。 交流电流由电流源8提供给第一/第二线圈装置1,2,3，压板7设置在向线圈装置提供电流时产生感应电场的区域。 线圈装置和压板被布置成使得当电流被允许在线圈中流动时在压板中产生的磁场使得朝向台板和线圈之间的第一/第二方向移动。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343114A

公开(公告)日：2004-12-02

申请号：JP2004142059

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BAKKER LEVINUS PIETER ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus intended to reduce liquid which remains on the surface of a substrate after exposure by a projection system.
SOLUTION: In the lithographic apparatus, a local region on the surface of the substrate under a projection system PL is immersed in a liquid. The height of a liquid feed system 310 above the surface of a substrate W can be varied using an actuator 314. In a control system, the liquid feed system 310 is maintained at a predetermined height above the surface of the substrate W, using feedforward control or feedback control by inputting the height of the surface of the substrate W.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004312002A

公开(公告)日：2004-11-04

申请号：JP2004105078

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  GALBURT DANIEL N

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70775 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method for Y-direction position correction of masked object shifts caused by Z-direction offset and oblique lighting.
SOLUTION: In a reflective lithographic projection apparatus, shifts of a mask pattern image in the scanning direction, which are caused by changes in the position of the mask pattern surface along the optical axis, are corrected by shifting the relative position(s) of the mask and/or a substrate in the scanning direction. Rotating the relative position(s) of the mask and/or the substrate around the optical axis can correct image rotation errors. After installing the mask in the lithographic projection apparatus, changes in the position of the mask pattern surface along the optical axis can be determined by using an interferometer. These changes can be mapped and stored to be used for controlling the lithographic projection apparatus.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004289126A

公开(公告)日：2004-10-14

申请号：JP2003417259

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004177956A

公开(公告)日：2004-06-24

申请号：JP2003393923

申请日：2003-11-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/11 ,  G02B5/18 ,  G03F1/24 ,  G03F7/00 ,  G03F7/20 ,  G03F7/40 ,  G21K1/06 ,  H01L21/027

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/001 ,  G21K1/062

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing technique for manufacturing an optical element having a relief profile with which a reflective film can surely be deposited on a multilayered stack. SOLUTION: In this manufacturing technique, the relief profile is formed by selectively applying a plasma etching to a multilayered stack including alternative layers of a first material and a second material, which have relative etching selectivity. The relief profile is coated with the film such as a reflective coating film. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2004165155A

公开(公告)日：2004-06-10

申请号：JP2003363845

申请日：2003-09-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  KIEFT ERIK RENE ,  LOOPSTRA ERIK ROELOF ,  STEVENS LUCAS HENRICUS JOHANNE ,  SIDELKOV YURII VICTOROVITCH ,  KOLOSHNIKOV VSEVOLOD GRIGOREVI ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: PROBLEM TO BE SOLVED: To provide a radiation source in which an output level and a repeating speed that are suitable for production are realized.
SOLUTION: The radiation source comprises an anode 220 and a cathode 210 that are configured and arranged to create a discharge in a gas or vapor in a space between the anode 220 and cathode 210 to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium, and tin. In order to improve heat dissipation, the radiation source LA comprises a plurality of plasma discharge elements 240, each of which is only used for short intervals, after which another discharge element is selected.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003158070A

公开(公告)日：2003-05-30

申请号：JP2002237163

申请日：2002-07-12

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SEMICONDUCTOR MFG

Inventor： LOOPSTRA ERIK ROELOF ,  FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS ,  SMITS JOSEPHUS JACOBUS ,  VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  HOF ALBRECHT ,  MAUL GUNTER ,  MUHLBEYER MICHAEL ,  MEHLKOPP KLAUS

IPC: G02B7/182 ,  G02B7/00 ,  G02B7/02 ,  G02B27/62 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a projection system which realizes high positioning precision necessary for an EUV lithographic apparatus and does not need to cool a frame to which an optical element is fixed, and to perform predictive temperature compensation positioning control which is complicated and expensive. SOLUTION: In this lithographic projection apparatus, the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1×10 K thereby avoiding the need for expensive cooling system and/or predictive temperature compensation.

公开(公告)号：WO2016083120A3

公开(公告)日：2016-07-28

申请号：PCT/EP2015076179

申请日：2015-11-10

Applicant: ASML NETHERLANDS BV

Inventor： DEKKERS JEROEN ,  NIENHUYS HAN-KWANG ,  RENKENS MICHAEL JOZEF MATHIJS ,  AKKERMANS JOHANNES ANTONIUS GERARDUS ,  DE VRIES GOSSE CHARLES ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  G02B5/18 ,  G02B6/293

CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B6/29314 ,  G03F7/70266

Abstract: An adjustable diffraction grating comprises: an optical element and a distortion mechanism. The optical element has an optical surface for receiving an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism comprises one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

Abstract translation: 可调衍射光栅包括：光学元件和失真机构。 光学元件具有用于接收输入辐射束的光学表面。 光学元件在光学表面下方设置有多个封闭通道，在每个封闭通道上方，光学表面由材料膜形成。 所述变形机构包括一个或多个致动器，所述致动器可操作以使所述膜在所述封闭通道上变形，从而控制所述光学表面的形状并且在所述光学表面上形成充当衍射光栅的周期性结构，使得所述输入辐射 光束从光学元件衍射以形成多个角度分离的子光束。