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公开(公告)号：JP2004343103A
公开(公告)日：2004-12-02
申请号：JP2004133419
申请日：2004-04-28
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： LEENDERS MARTINUS HENDRIKUS AN , MEIJER HENDRICUS JOHANNES MARI , VAN DER PASCH ENGELBERTUS ANTO , RENKENS MICHAEL JOZEF MATHIJS , RUIJL THEO ANJES MARIA
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70258 , G03F7/7085
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of manufacturing device and an anglar decoder.
SOLUTION: A system for measuring the position of a projection system PL with respect to a reference frame RF in the lithographic system includes a sensor rigidly mounted in relation to a corresponding sensor of a system for measuring the position of a substrate table WT. Rotation of the projection system PL about its optical axis is measured using an anglar decoder for transmitting a light from a target 41 to two optical paths having an opposite inclination sensitivity.
COPYRIGHT: (C)2005,JPO&NCIPI-
公开(公告)号：JP2011037261A
公开(公告)日：2011-02-24
申请号：JP2010147035
申请日：2010-06-29
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KRUIJT-STEGEMAN YVONNE WENDELA , JEUNINK ANDRE BERNARDUS , DEN BOEF ARIE JEFFREY , BANINE VADIM YEVGENYEVICH , RENKENS MICHAEL JOZEF MATHIJS , GERARD VAN SCHOTHORST , DIJKSMAN JOHAN FREDERIK , SCHOORMANS CAROLUS JOHANNES CATHARINA , KOEVOETS ADRIANUS HENDRIK , DE SCHIFFART CATHARINUS , WUISTER SANDER FREDERIK
IPC: B29C59/02 , B81C99/00 , H01L21/027
CPC classification number: G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography apparatus and a method. SOLUTION: This imprint lithography apparatus includes: an imprint template holder 22 which is constituted in a manner to hold an imprint template 20; and a plurality of position sensors 28 which are constituted in a manner to measure the variation of the size and/or shape of the imprint template 20, and the position sensors 28 are mechanically separated from the imprint template 20. In addition, the imprint template 20 is used in order to imprint a pattern on a board 34, and the variation of the size and/or shape of the imprint template 20 are measured while the pattern is imprinted on the board 34 by this lithography method. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：提供一种改进的压印光刻设备和方法。 解决方案：该压印光刻设备包括：压印模板保持器22，其以保持压印模板20的方式构成; 以及以测量压印模板20的尺寸和/或形状的变化的方式构成的多个位置传感器28，并且位置传感器28与压印模板20机械分离。此外，压印模板 20用于在板34上印刷图案，并且通过该光刻方法在图案印刷在板34上的同时测量压印模板20的尺寸和/或形状的变化。 版权所有（C）2011，JPO＆INPIT
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3.发明专利
公开(公告)号：JP2009260339A
公开(公告)日：2009-11-05
申请号：JP2009092537
申请日：2009-04-07
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： BUTLER HANS , CUIJPERS MARTINUS AGNES WILLEM , CHRISTIAAN ALEXANDER HOOGENDAM , DE JONGH ROBERTUS JOHANNES MAR , RENKENS MICHAEL JOZEF MATHIJS , VAN DER WIJST MARC WILHELMUS M , WIJCKMANS MAURICE WILLEM JOZEF , TOUSAIN ROBERTUS LEONARDUS , FAASSEN RONALD PETRUS HENDRICU , KOEVOETS ADRIANUS HENDRIK
IPC: H01L21/68 , G03F7/20 , H01L21/027
CPC classification number: G03F7/709 , G03F7/70758 , G03F7/70766
Abstract: PROBLEM TO BE SOLVED: To provide a positioning system in which vibrations caused by a torque transferred from a balance mass to a base plate are minimized. SOLUTION: The positioning system to position a table within a base frame of a lithographic apparatus includes a first actuator for exerting an actuation force on the table, and being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, and the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种定位系统，其中由从平衡块传递到基板的扭矩引起的振动最小化。 解决方案：用于将工作台定位在光刻设备的基架内的定位系统包括用于在工作台上施加致动力的第一致动器，并且连接到构造和布置成吸收反应力的第一平衡块 第一致动器和定位系统包括控制器和第二致动器，其构造和布置成施加补偿力和/或扭矩以补偿由第一致动器施加在第一平衡块上的致动力引起的扭矩。 版权所有（C）2010，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：WO2016083120A3
公开(公告)日：2016-07-28
申请号：PCT/EP2015076179
申请日：2015-11-10
Applicant: ASML NETHERLANDS BV
Inventor： DEKKERS JEROEN , NIENHUYS HAN-KWANG , RENKENS MICHAEL JOZEF MATHIJS , AKKERMANS JOHANNES ANTONIUS GERARDUS , DE VRIES GOSSE CHARLES , LOOPSTRA ERIK ROELOF
CPC classification number: G03F7/70158 , G02B5/1828 , G02B6/29314 , G03F7/70266
Abstract: An adjustable diffraction grating comprises: an optical element and a distortion mechanism. The optical element has an optical surface for receiving an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism comprises one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
Abstract translation: 可调衍射光栅包括：光学元件和失真机构。 光学元件具有用于接收输入辐射束的光学表面。 光学元件在光学表面下方设置有多个封闭通道，在每个封闭通道上方，光学表面由材料膜形成。 所述变形机构包括一个或多个致动器，所述致动器可操作以使所述膜在所述封闭通道上变形，从而控制所述光学表面的形状并且在所述光学表面上形成充当衍射光栅的周期性结构，使得所述输入辐射 光束从光学元件衍射以形成多个角度分离的子光束。
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公开(公告)号：WO2008087597A3
公开(公告)日：2008-09-12
申请号：PCT/IB2008050160
申请日：2008-01-16
IPC: G03F7/20
CPC classification number: G03F7/70933 , G03F7/70841 , G03F7/70858
Abstract: A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
Abstract translation: 一种器件制造方法，包括：使光刻投影装置的真空室内的压力达到温度稳定压力范围; 保持真空室内的压力在温度稳定压力范围内一段时间，以便稳定真空室内的温度; 将真空室内的压力降低至生产压力范围; 利用辐射系统产生辐射束; 图案化辐射束; 以及将图案化的辐射束通过真空室投影到衬底上的辐射敏感材料层的目标部分上。
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公开(公告)号：SG156572A1
公开(公告)日：2009-11-26
申请号：SG2009023359
申请日：2009-04-03
Applicant: ASML NETHERLANDS BV
Inventor： BUTLER HANS , CUIJPERS MARTINUS AGNES WILLEM , HOOGENDAM CHRISTIAAN ALEXANDER , DE JONGH ROBERTUS JOHANNES MARINUS , RENKENS MICHAEL JOZEF MATHIJS , VAN DER WIJST MARC WILHELMUS MARIA , WIJCKMANS MAURICE WILLEM JOZEF ETIENNE , TOUSAIN ROBERTUS LEONARDUS , FAASSEN RONALD PETRUS HENDRICUS , KOEVOETS ADRIANUS HENDRIK
Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including: a first actuator to exert an actuation force on the table, the first actuator being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, wherein the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass.
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公开(公告)号：SG147288A1
公开(公告)日：2008-11-28
申请号：SG2004021929
申请日：2004-04-22
Applicant: ASML NETHERLANDS BV
Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS , MEIJER HENDRICUS JOHANNES MARIA , VAN DER PASCH ENGELBERTUS ANTONIUS , RENKENS MICHAEL JOZEF MATHIJS , RUIJL THEO ANJES MARIA
IPC: G03F7/20 , H01L21/027
Abstract: Lithographic Apparatus, Device Manufacturing Method and Angular Encoder In a lithographic projection apparatus, a measuring system for measuring the position of the projection system PL relative to a reference frame RF includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table WT position. An angular encoder which sends light from a target 41 down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system PL about its optical axis.
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公开(公告)号：NL2011427A
公开(公告)日：2014-04-02
申请号：NL2011427
申请日：2013-09-12
Applicant: ASML NETHERLANDS BV
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