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    RADIATION BEAM APPARATUS
    1.
    发明申请
    RADIATION BEAM APPARATUS 审中-公开
    辐射波束装置

    公开(公告)号：WO2016083120A3

    公开(公告)日：2016-07-28

    申请号：PCT/EP2015076179

    申请日：2015-11-10

    Applicant: ASML NETHERLANDS BV

    Inventor： DEKKERS JEROEN ,  NIENHUYS HAN-KWANG ,  RENKENS MICHAEL JOZEF MATHIJS ,  AKKERMANS JOHANNES ANTONIUS GERARDUS ,  DE VRIES GOSSE CHARLES ,  LOOPSTRA ERIK ROELOF

    IPC: G03F7/20 ,  G02B5/18 ,  G02B6/293

    CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B6/29314 ,  G03F7/70266

    Abstract: An adjustable diffraction grating comprises: an optical element and a distortion mechanism. The optical element has an optical surface for receiving an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism comprises one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

    Abstract translation: 可调衍射光栅包括：光学元件和失真机构。 光学元件具有用于接收输入辐射束的光学表面。 光学元件在光学表面下方设置有多个封闭通道，在每个封闭通道上方，光学表面由材料膜形成。 所述变形机构包括一个或多个致动器，所述致动器可操作以使所述膜在所述封闭通道上变形，从而控制所述光学表面的形状并且在所述光学表面上形成充当衍射光栅的周期性结构，使得所述输入辐射 光束从光学元件衍射以形成多个角度分离的子光束。

    MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY
    5.
    发明专利
    MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY 未知

    公开(公告)号：SG193240A1

    公开(公告)日：2013-10-30

    申请号：SG2013065149

    申请日：2012-02-22

    Applicant: ASML NETHERLANDS BV

    Inventor： PEETERS FELIX ,  BENSCHOP JOZEF ,  RENKENS MICHAEL ,  VAN BAARS GREGOR ,  DEKKERS JEROEN

    Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target (40) onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target (42). The system further includes a radiation detector (41) to detect radiation from one of the spots, and a controller (46) to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.

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