Abstract:
A method of forming a flow restriction in a fluid communication system is disclosed. The method comprises the steps of providing a flow restricting section having a cross sectional area and a length, measuring the flow resistivity of the flow restricting section, and modifying the cross sectional area and/or the length of the flow restricting section until a desired flow resistivity of the flow restricting section is obtained. The method provides the possibility of forming a flow restriction in an easy and cost effective manner, and to subsequently adjust the flow resistivity of the flow restriction, thereby obtaining an accurate flow resistivity.
Abstract:
A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
Abstract:
A method for producing a corrosion-resistant channel in a wetted path of a silicon device enables such device to be used with corrosive compounds, such as fluorine. A wetted path of a MEMS device is coated (210) with either an organic compound resistant to attack by atomic fluorine or a material capable of being passivated by atomic fluorine. The device is then exposed to a gas that decomposes into active fluorine compounds (220) when activated by a plasma discharge. One example of such a gas is CF4, an inert gas that is easier and safer to work with than volatile gases like CIF3. The gas will passivate the material (if applicable) and corrode any exposed silicon. The device is tested (230) in such a manner that any unacceptable corrosion of the wetted path will cause the device to fail. If the device operates properly, the wetted path is deemed to be resistant to corrosion by fluorine or other corrosive compounds, as applicable.
Abstract:
According to the present invention, there is provided a micro-fluidic sensor system (6) including a micro-conduit (56) for carrying fluid therethrough having a flexible wall portion (18), at least one micro-fluidic actuator having a closed cavity, flexible mechanism defining a wall of the cavity (11) and flexible wall portion (18) of the micro-conduit for deflecting upon an application of pressure thereto, and expanding mechanism (14) disposed in the cavity for selectively expanding the cavity and thereby selectively flexing said expanding mechanism, and sensor mechanism in fluid communication with the micro-conduit for sensing the presence or absence of molecules. The present invention further provides for a micro-fluidic system for moving micro-fluid amounts including a micro-conduit and at least one micro-fluidic actuator in fluid communication with the micro-conduit.
Abstract:
A microelectromechanical (MEMS) positioning apparatus is provided that can precisely microposition an object in each of the X, Y and Z directions. The MEMS positioning apparatus includes a reference surface, a support disposed in a fixed position to the reference surface, and a stage defining a XY plane that is suspended adjacent to the support and over at least a portion of the reference surface. The MEMS positioning apparatus also includes at least one and, more typically, several actuators for precisely positioning the stage and, in turn, objects carried by the stage. For example, the MEMS positioning apparatus can include first and second MEMS actuators for moving the stage in the XY plane upon actuation. In addition, the MEMS positioning apparatus can include a Z actuator, such as a thermal bimorph structure, for moving the stage in the Z direction.
Abstract:
Provided is a single-particle capturing apparatus in which one particle can be captured in one recess portion (16) while preventing another particle from being accumulated on a captured particle. A single-particle capturing apparatus including: a flow channel (12) on a substrate (11), a wave structure with a mountain portion (13) and a valley portion (14) on the flow channel (12), and a recess portion (16) at a top portion (15) of the mountain portion (13), the recess portion (16) including a draw-in passage (17).
Abstract:
The present invention relates to a spray device, comprising a spray nozzle body (2) and a substantially planar membrane layer (6) suspended over a nozzle cavity (3) to generate microjets, especially for pharmaceutical applications, in particular preservative free formulations. The nozzle body (2,8) contains a microbial barrier, particularly a microvalve (23,24) between a fluid supply channel (9) and said cavity (3).