Abstract:
Treated articles and a process of producing the treated articles, systems having treated articles, and processes incorporating treated articles are disclosed. The treated articles include a metal or metallic substrate, and a surface treatment of the metal or metallic substrate, the surface treatment having fluorine, silicon, and carbon. The systems include a flow path, with the surface treatment being within the flow path. The processes include flowing a fluid through the flow path.
Abstract:
A coated article and a chemical vapor deposition process are disclosed. The coated article includes a functionalized layer applied to the coated article by chemical vapor deposition. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, a trimethylsilane treated surface, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, and combinations thereof. The process includes applying the functionalized layer.
Abstract:
Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated stainless steel fluid contacting element; and transporting a fluid to contact the coated stainless-steel fluid-contacting element; wherein the fluid includes adenosine triphosphate; wherein the coated stainless steel fluid-contacting element has a coating, the coating including carbon, silicon, oxygen, and hydrogen.
Abstract:
Semiconductor fabrication processes are described. An embodiment of the semiconductor fabrication process includes providing a layer formed by decomposition of dimethylsilane through chemical vapor deposition, the layer beign applied by a fluid material, and then positioning the layer in a system for producing a semiconductor product. Additionally or alternatively, the semiconductor product is produced and/or the layer is on a substrate.
Abstract:
A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.
Abstract:
Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated stainless steel fluid contacting element; and transporting a fluid to contact the coated stainless-steel fluid-contacting element; wherein the fluid includes adenosine triphosphate; wherein the coated stainless steel fluid-contacting element has a coating, the coating including carbon, silicon, oxygen, and hydrogen.