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    LIQUID CHROMATOGRAPHY TECHNIQUE
    1.
    发明申请
    LIQUID CHROMATOGRAPHY TECHNIQUE 审中-公开

    公开(公告)号：WO2019165249A1

    公开(公告)日：2019-08-29

    申请号：PCT/US2019/019209

    申请日：2019-02-22

    Applicant: SILCOTEK CORP

    Inventor： BISCHOF, Jesse ,  PATTERSON, Lucas D. ,  BARONE, Gary ,  YUAN, Min ,  SMITH, David A.

    IPC: G01N30/56

    Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.

    COLD THERMAL CHEMICAL VAPOR DEPOSITION
    4.
    发明申请
    COLD THERMAL CHEMICAL VAPOR DEPOSITION 审中-公开

    公开(公告)号：WO2021076471A1

    公开(公告)日：2021-04-22

    申请号：PCT/US2020/055322

    申请日：2020-10-13

    Applicant: SILCOTEK CORP.

    Inventor： WHITE, Geoffrey K. ,  DESKEVICH, Nicholas P. ,  MATTZELA, James B. ,  BARONE, Gary A. ,  SMITH, David A. ,  LECLAIR, Pierre A. ,  YUAN, Min ,  BISCHOF, Jesse

    IPC: C23C16/04 ,  C23C16/44 ,  C23C16/455 ,  C23C16/46 ,  C23C16/52

    Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.

    VAPOR PHASE TREATMENT OF AMORPHOUS CARBON FILMS WITH (PERFLUORO 1,1,2,2 TETRAHYDROALKYL)TRIALKOXYSILANE
    7.
    发明申请
    VAPOR PHASE TREATMENT OF AMORPHOUS CARBON FILMS WITH (PERFLUORO 1,1,2,2 TETRAHYDROALKYL)TRIALKOXYSILANE 审中-公开
    （PERFLUORO 1,1,2,2四氢喹啉酮）三羧酸的蒸气相处理非晶碳膜

    公开(公告)号：WO2014186470A1

    公开(公告)日：2014-11-20

    申请号：PCT/US2014/038006

    申请日：2014-05-14

    Applicant: SILCOTEK CORP.

    Inventor： SMITH, David A. ,  SILVIS, Paul H.

    IPC: B05D5/08 ,  B05D1/00

    CPC classification number: B05D1/60 ,  B05D5/083 ,  C09D5/08

    Abstract: Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

    Abstract translation: 化学气相沉积制品和方法包括在材料上的化学气相沉积功能化，该材料包括碳的sp3排列。 化学气相沉积功能化被定位成与工艺流体，烃，分析物，排气或其组合接触。 另外或替代地，化学气相沉积功能化不是冰箱架或挡风玻璃。

    COATED ARTICLE AND CHEMICAL VAPOR DEPOSITION PROCESS
    8.
    发明申请
    COATED ARTICLE AND CHEMICAL VAPOR DEPOSITION PROCESS 审中-公开

    公开(公告)号：WO2014011251A3

    公开(公告)日：2014-01-16

    申请号：PCT/US2013/033807

    申请日：2013-03-26

    Applicant: SILCOTEK CORP.

    Inventor： SMITH, David A.

    IPC: B05D1/00

    Abstract: A coated article and a chemical vapor deposition process are disclosed. The coated article includes a functionalized layer applied to the coated article by chemical vapor deposition. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, a trimethylsilane treated surface, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, and combinations thereof. The process includes applying the functionalized layer.

    THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT AND COATING
    9.
    发明公开
    THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT AND COATING 审中-公开
    热化学气相沉积分裂功能化工艺，产品和涂层

    公开(公告)号：EP3165633A1

    公开(公告)日：2017-05-10

    申请号：EP16196501.7

    申请日：2016-10-31

    Applicant: Silcotek Corp.

    Inventor： YUAN, Min ,  SMITH, David A. ,  SILVIS, Paul H. ,  MATTZELA, James B.

    IPC: C23C16/24 ,  C23C16/30 ,  C23C16/40 ,  C23C16/56

    CPC classification number: C23C16/45557 ,  C04B41/456 ,  C04B41/524 ,  C23C16/24 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56

    Abstract: Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time.

    Abstract translation: 公开了热化学气相沉积分裂功能化工艺，涂层和产品。 热化学气相沉积分裂官能化方法包括将制品放置在封闭室内，在第一温度范围内使制品功能化第一段时间，然后在第二温度范围内进一步功能化制品第二段时间 。 热化学气相沉积分裂官能化产品包括通过在第一温度范围内官能化第一时间段和通过在第二温度范围内进一步官能化第二时间段形成的另一官能化形成的官能化。

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