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公开(公告)号：WO2021076471A1
公开(公告)日：2021-04-22
申请号：PCT/US2020/055322
申请日：2020-10-13
Applicant: SILCOTEK CORP.
Inventor： WHITE, Geoffrey K. , DESKEVICH, Nicholas P. , MATTZELA, James B. , BARONE, Gary A. , SMITH, David A. , LECLAIR, Pierre A. , YUAN, Min , BISCHOF, Jesse
IPC: C23C16/04 , C23C16/44 , C23C16/455 , C23C16/46 , C23C16/52
Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.
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公开(公告)号：WO2011056550A1
公开(公告)日：2011-05-12
申请号：PCT/US2010/054058
申请日：2010-10-26
Applicant: SILCOTEK CORP. , SMITH, David A. , MATTZELA, James B. , SILVIS, Paul H. , BARONE, Gary A.
Inventor： SMITH, David A. , MATTZELA, James B. , SILVIS, Paul H. , BARONE, Gary A.
CPC classification number: C23C16/325 , B05D1/60 , B05D2202/15 , C23C8/10 , C23C16/56 , Y10T428/24802
Abstract: The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.
Abstract translation: 本发明涉及化学气相沉积涂层，化学气相沉积制品和化学气相沉积方法。 涂层，制品和方法涉及二甲基硅烷的热分解以达到所需的表面性能。
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公开(公告)号：WO2023081013A1
公开(公告)日：2023-05-11
申请号：PCT/US2022/047086
申请日：2022-10-19
Applicant: SILCOTEK CORP.
Inventor： BARLETT, Ashley , YUAN, Min , BISCHOF, Jesse , WHITE, Geoffrey K. , PATTERSON, Lucas D. , BARONE, Gary A.
Abstract: Processes, components, and systems including such components are disclosed. The process includes providing a component having a substrate and an amorphous silicon-containing coating, and exposing the amorphous silicon-containing coating to a temperature greater than 600 degrees Celsius. The amorphous silicon-containing coating does not crystallize. The components include the substrate and the amorphous silicon-containing coating, with the coating having been exposed to the temperature greater than 600 degrees Celsius and the amorphous silicon-containing coating not crystallizing. The systems include the component.
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公开(公告)号：WO2017040623A1
公开(公告)日：2017-03-09
申请号：PCT/US2016/049647
申请日：2016-08-31
Applicant: SILCOTEK CORP.
Inventor： VEZZA, Thomas F. , MATTZELA, James B. , BARONE, Gary A. , GROVE, William David , SILVIS, Paul H.
IPC: C23C16/24 , C23C16/455
CPC classification number: C23C16/24 , C23C16/45523
Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.
Abstract translation: 公开了热化学气相沉积涂覆制品和热化学气相沉积工艺。 热化学气相沉积涂覆制品包括基材和基材上的涂层，涂层具有多层并且位于不能通过视线技术同时涂覆的热化学气相沉积涂覆制品的区域上。 该涂层具有每100平方微米气相成核的少于6个尺寸大于0.5微米的颗粒的颗粒浓度。 热化学气相沉积工艺包括使用中间气体浸泡将含有硅的前体的多重等分试样引入封闭的容器中以产生涂覆制品。
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公开(公告)号：WO2022026070A1
公开(公告)日：2022-02-03
申请号：PCT/US2021/037637
申请日：2021-06-16
Applicant: SILCOTEK CORP.
Inventor： BARONE, Gary A.
Abstract: Heat exchanger processes are disclosed. A heat exchanger process uses a heat exchanger. The heat exchanger has a surface positioned to be contacted by a fluid. The heat exchanger process includes contacting the surface with the fluid by transporting the fluid through the heat exchanger and transferring heat between the surface and the fluid. The transporting is at a rate of less than 2 meters per second, the surface includes a fouling-resistant coating, the fluid includes particles known to cause fouling, or a combination thereof.
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Patent Agency Ranking
公开(公告)号：WO2020252306A1
公开(公告)日：2020-12-17
申请号：PCT/US2020/037489
申请日：2020-06-12
Applicant: SILCOTEK CORP.
Inventor： YUAN, Min , DESKEVICH, Nicholas Peter , BISCHOF, Jesse , VEZZA, Thomas F. , MATTZELA, James B. , BARONE, Gary A. , SMITH, David A. , WHITE, Geoffrey K.
Abstract: Nano-wire growth processes, nano-wires, and articles having nano-wires are disclosed. The nano-wire growth process includes trapping growth-inducing particles on a substrate, positioning the substrate within a chamber, closing the chamber, applying a vacuum to the chamber, introducing a precursor gas to the chamber, and thermally decomposing the precursor gas. The thermally decomposing of the precursor gas grows nano-wires from the growth-inducing particles. The nano-wires and the articles having the nano-wires are produced by the nano-wire growth process.
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公开(公告)号：WO2012047945A3
公开(公告)日：2012-04-12
申请号：PCT/US2011/054835
申请日：2011-10-05
Applicant: SILCOTEK CORP. , SMITH, David A. , MATTZELA, James B. , SILVIS, Paul H. , BARONE, Gary A. , HIGGINS, Martin E.
Inventor： SMITH, David A. , MATTZELA, James B. , SILVIS, Paul H. , BARONE, Gary A. , HIGGINS, Martin E.
Abstract: A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.
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公开(公告)号：EP2494087A1
公开(公告)日：2012-09-05
申请号：EP10771619.3
申请日：2010-10-26
Applicant: Silcotek Corp.
Inventor： SMITH, David A. , MATTZELA, James B. , SILVIS, Paul H. , BARONE, Gary A.
CPC classification number: C23C16/325 , B05D1/60 , B05D2202/15 , C23C8/10 , C23C16/56 , Y10T428/24802
Abstract: The present invention relates to a chemical vapor deposition coating, a chemical vapor deposition article, and a chemical vapor deposition method. The coating, article, and method involve thermal decomposition of dimethylsilane to achieve desired surface properties.
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公开(公告)号：EP2625307A2
公开(公告)日：2013-08-14
申请号：EP11773611.6
申请日：2011-10-05
Applicant: Silcotek Corp.
Inventor： SMITH, David A. , MATTZELA, James B. , SILVIS, Paul H. , BARONE, Gary A. , HIGGINS, Martin E.
CPC classification number: C09D5/00 , C23C16/0272 , C23C16/18 , C23C16/30 , C23C16/401 , C23C16/56 , C23C30/00 , Y10T428/265 , Y10T428/31612 , Y10T428/31663
Abstract: A wear coating is disclosed that includes a layer treated by a trifunctional organosilane. An article is also disclosed, the article having a surface to which the wear coating is applied. A method of applying the wear coating is also disclosed. In some embodiments, the organosilane is trimethylsilane and the wear coating is applied by chemical vapor deposition, followed by heat treating the wear coating in the presence of the trimethylsilane.
Abstract translation: 公开了一种耐磨涂层，其包括由三官能有机硅烷处理的层。 还公开了一种制品，其具有施加耐磨涂层的表面。 还公开了施加耐磨涂层的方法。 在一些实施方案中，有机硅烷是三甲基硅烷，并且通过化学气相沉积施加耐磨涂层，然后在三甲基硅烷存在下对耐磨涂层进行热处理。
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10.发明公开
公开(公告)号：EP4426479A1
公开(公告)日：2024-09-11
申请号：EP22803429.4
申请日：2022-10-19
Applicant: Silcotek Corp.
Inventor： BARLETT, Ashley , YUAN, Min , BISCHOF, Jesse , WHITE, Geoffrey K. , PATTERSON, Lucas D. , BARONE, Gary A.
CPC classification number: B01J21/08 , B01J37/0215 , C23C16/24 , C23C16/56
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