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公开(公告)号：WO2020252306A1
公开(公告)日：2020-12-17
申请号：PCT/US2020/037489
申请日：2020-06-12
Applicant: SILCOTEK CORP.
Inventor： YUAN, Min , DESKEVICH, Nicholas Peter , BISCHOF, Jesse , VEZZA, Thomas F. , MATTZELA, James B. , BARONE, Gary A. , SMITH, David A. , WHITE, Geoffrey K.
Abstract: Nano-wire growth processes, nano-wires, and articles having nano-wires are disclosed. The nano-wire growth process includes trapping growth-inducing particles on a substrate, positioning the substrate within a chamber, closing the chamber, applying a vacuum to the chamber, introducing a precursor gas to the chamber, and thermally decomposing the precursor gas. The thermally decomposing of the precursor gas grows nano-wires from the growth-inducing particles. The nano-wires and the articles having the nano-wires are produced by the nano-wire growth process.
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公开(公告)号：WO2021076471A1
公开(公告)日：2021-04-22
申请号：PCT/US2020/055322
申请日：2020-10-13
Applicant: SILCOTEK CORP.
Inventor： WHITE, Geoffrey K. , DESKEVICH, Nicholas P. , MATTZELA, James B. , BARONE, Gary A. , SMITH, David A. , LECLAIR, Pierre A. , YUAN, Min , BISCHOF, Jesse
IPC: C23C16/04 , C23C16/44 , C23C16/455 , C23C16/46 , C23C16/52
Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.
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公开(公告)号：WO2023081013A1
公开(公告)日：2023-05-11
申请号：PCT/US2022/047086
申请日：2022-10-19
Applicant: SILCOTEK CORP.
Inventor： BARLETT, Ashley , YUAN, Min , BISCHOF, Jesse , WHITE, Geoffrey K. , PATTERSON, Lucas D. , BARONE, Gary A.
Abstract: Processes, components, and systems including such components are disclosed. The process includes providing a component having a substrate and an amorphous silicon-containing coating, and exposing the amorphous silicon-containing coating to a temperature greater than 600 degrees Celsius. The amorphous silicon-containing coating does not crystallize. The components include the substrate and the amorphous silicon-containing coating, with the coating having been exposed to the temperature greater than 600 degrees Celsius and the amorphous silicon-containing coating not crystallizing. The systems include the component.
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公开(公告)号：WO2020112938A1
公开(公告)日：2020-06-04
申请号：PCT/US2019/063513
申请日：2019-11-27
Applicant: SILCOTEK CORP
Inventor： YUAN, Min
Abstract: Fluid contact process, coated article, and coating processes are disclosed. The fluid contact process includes flowing a corrosive fluid to contact a coated article. The coated article includes an aluminum-containing substrate, a first region on the aluminum-containing substrate, the first region comprising carbon and silicon, a second region distal from the aluminum-containing substrate in comparison to the first region, the second region having oxygen at a greater concentration, by weight, than the first region, a third region distal from the first region in comparison to the second region, the third region comprising amorphous silicon. The coating process includes positioning the aluminum-containing substrate within an enclosed chamber, then, thermally decomposing dimethylsilane-and-silane-containing mixture within the enclosed chamber, then thermally oxidizing, and then, thermally decomposing silane.
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公开(公告)号：WO2019165249A1
公开(公告)日：2019-08-29
申请号：PCT/US2019/019209
申请日：2019-02-22
Applicant: SILCOTEK CORP
Inventor： BISCHOF, Jesse , PATTERSON, Lucas D. , BARONE, Gary , YUAN, Min , SMITH, David A.
IPC: G01N30/56
Abstract: LC techniques are disclosed. The LC technique includes providing a liquid chromatography system having a coated metallic fluid-contacting element, and transporting a fluid to contact the coated metallic fluid contacting element. Conditions for the transporting of the fluid are selected from the group consisting of the temperature of the fluid being greater than 150 degree Celsius, pressure urging the fluid being greater than 60 MPa, the fluid having a protein-containing analyte incompatible with one of titanium and polyether ether ketone, the fluid having a chelating agent incompatible with the one or both of the titanium or the polyether ether ketone.
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Patent Agency Ranking6.发明公开THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT AND COATING 审中-公开热化学气相沉积分裂功能化工艺，产品和涂层
公开(公告)号：EP3165633A1
公开(公告)日：2017-05-10
申请号：EP16196501.7
申请日：2016-10-31
Applicant: Silcotek Corp.
Inventor： YUAN, Min , SMITH, David A. , SILVIS, Paul H. , MATTZELA, James B.
CPC classification number: C23C16/45557 , C04B41/456 , C04B41/524 , C23C16/24 , C23C16/30 , C23C16/401 , C23C16/56
Abstract: Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time.
Abstract translation: 公开了热化学气相沉积分裂功能化工艺，涂层和产品。 热化学气相沉积分裂官能化方法包括将制品放置在封闭室内，在第一温度范围内使制品功能化第一段时间，然后在第二温度范围内进一步功能化制品第二段时间 。 热化学气相沉积分裂官能化产品包括通过在第一温度范围内官能化第一时间段和通过在第二温度范围内进一步官能化第二时间段形成的另一官能化形成的官能化。
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公开(公告)号：EP4426479A1
公开(公告)日：2024-09-11
申请号：EP22803429.4
申请日：2022-10-19
Applicant: Silcotek Corp.
Inventor： BARLETT, Ashley , YUAN, Min , BISCHOF, Jesse , WHITE, Geoffrey K. , PATTERSON, Lucas D. , BARONE, Gary A.
CPC classification number: B01J21/08 , B01J37/0215 , C23C16/24 , C23C16/56
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公开(公告)号：EP4343321A2
公开(公告)日：2024-03-27
申请号：EP23207802.2
申请日：2019-02-22
Applicant: Silcotek Corp.
Inventor： BISCHOF, Jesse , PATTERSON, Lucas D. , BARONE, Gary , YUAN, Min , SMITH, David A.
IPC: G01N30/60
Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated stainless steel fluid contacting element; and transporting a fluid to contact the coated stainless-steel fluid-contacting element; wherein the fluid includes adenosine triphosphate; wherein the coated stainless steel fluid-contacting element has a coating, the coating including carbon, silicon, oxygen, and hydrogen.
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公开(公告)号：EP4343321A3
公开(公告)日：2024-04-10
申请号：EP23207802.2
申请日：2019-02-22
Applicant: Silcotek Corp.
Inventor： BISCHOF, Jesse , PATTERSON, Lucas D. , BARONE, Gary , YUAN, Min , SMITH, David A.
IPC: G01N30/56
Abstract: Liquid chromatography techniques are disclosed. Specifically, the liquid chromatography technique includes providing a liquid chromatography system having a coated stainless steel fluid contacting element; and transporting a fluid to contact the coated stainless-steel fluid-contacting element; wherein the fluid includes adenosine triphosphate; wherein the coated stainless steel fluid-contacting element has a coating, the coating including carbon, silicon, oxygen, and hydrogen.
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