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公开(公告)号：KR1020100132282A
公开(公告)日：2010-12-17
申请号：KR1020090051025
申请日：2009-06-09
Applicant: 한국기계연구원
CPC classification number: B29C35/0238 , G03F7/0002
Abstract: PURPOSE: A method for fabricating a nanoparticle thin film is provided to simplify a manufacturing process by arranging nanoparticles in a resin through the pressurizing the thin film. CONSTITUTION: A method for fabricating a nanoparticle thin film(160) comprises the steps of: depositing a nanoparticle mixed resin(130) on a substrate(140) in which a nano particle(111) and a polymer matrix are mixed; removing a solvent(112) from the nano particle mixing resin; and pressurizing and curing the nano particle mixing resin with a non-pattern lithographic plate(150).
Abstract translation: 目的：提供一种制造纳米颗粒薄膜的方法，以通过将薄膜加压而在纳米颗粒中排列纳米颗粒来简化制造过程。 构成：制造纳米颗粒薄膜（160）的方法包括以下步骤：将纳米颗粒混合树脂（130）沉积在其中混合纳米颗粒（111）和聚合物基质的基底（140）上; 从纳米颗粒混合树脂中除去溶剂（112）; 并用非图案平版印刷板（150）对纳米颗粒混合树脂进行加压和固化。
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公开(公告)号：KR100995897B1
公开(公告)日：2010-11-22
申请号：KR1020100009904
申请日：2010-02-03
Applicant: 한국기계연구원
CPC classification number: H01L51/56 , B01J19/123 , B82Y20/00 , C08L101/00
Abstract: PURPOSE: A gap filling method of a nanostructure and a manufacturing method of an organic light-emitting device(OLED) using thereof are provided to form an oxide thin film with a flat surface by pressing a gap of the nanostructure with a mold. CONSTITUTION: A gap filling method of a nanostructure comprises the following steps: supplying a substrate with the nanostructure including a gap on the upper side(S1); spreading a coating composition to fill the gap(S2); pressing the layer of the coating composition with a mold(S3); irradiation ultraviolet rays to the coating composition layer(S4); heating the layer to form a metal oxide thin film; and separating the mold from the metal oxide thin film(S5).
Abstract translation: 目的：提供纳米结构的间隙填充方法和使用其的有机发光器件（OLED）的制造方法，以通过用模具压制纳米结构的间隙来形成具有平坦表面的氧化物薄膜。 构成：纳米结构的间隙填充方法包括以下步骤：向衬底提供包括在上侧的间隙的纳米结构（S1）; 铺展涂料组合物以填补间隙（S2）; 用模具挤压涂层组合物层（S3）; 向涂料组合物层照射紫外线（S4）; 加热层以形成金属氧化物薄膜; 并将模具与金属氧化物薄膜分离（S5）。
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公开(公告)号：KR100979747B1
公开(公告)日：2010-09-02
申请号：KR1020080070250
申请日：2008-07-18
Applicant: 한국기계연구원
IPC: H01L51/42
CPC classification number: Y02E10/549 , Y02P70/521
Abstract: 본 발명은 유기 태양 전지의 제조 방법에 관한 것으로서, 나노 패턴이 형성된 몰드 준비 단계와, 상기 몰드의 나노 패턴 상에 P형 유기반도체층을 도포하는 P형 유기반도체층 형성 단계와, 상기 P형 유기반도체층의 한면에 애노드 전극층을 형성하는 애노드 전극층 형성 단계와, 상기 몰드를 상기 P형 유기반도체층에서 분리하는 몰드 분리 단계와, 상기 P형 유기반도체층의 다른 면에 N형 유기반도체층을 도포하는 N형 유기반도체층 형성 단계, 및 상기 N형 유기반도체층의 한 면에 캐소드 전극층을 형성하는 캐소드 전극층 형성 단계를 포함한다.
이와 같이 본 발명에 따르면 몰드를 이용하여 고정도의 규칙적인 패턴을 갖는 유기 태양 전지를 용이하게 제작할 수 있다.
태양 전지, 몰드, 유기, 패턴-
公开(公告)号：KR100965904B1
公开(公告)日：2010-06-24
申请号：KR1020090082592
申请日：2009-09-02
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: H01L33/44 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L2933/0083 , B29C59/022
Abstract: PURPOSE: A patterning method of a metal oxide thin film using nano-imprint and manufacturing method of a light emitting diode are provided to reduce a pattern process by removing a process of covering an ultraviolet resin additionally. CONSTITUTION: A photosensitivity metal-organic precursor solution is coated on a substrate(S1). A photosensitivity metal-organic precursor coating layer is pressurized into a patterned mold(S2). Ultraviolet ray is radiated on the pressured metal-organic precursor coating layer to form a hardened metal oxide film pattern(S3). The patterned mold is removed from the metal oxide thin film pattern(S4). A plastic process of processing the metal oxide thin film pattern with a thermal process is performed.
Abstract translation: 目的：提供使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法，以通过除去另外掩盖紫外线树脂的工艺来减少图案处理。 构成：将光敏金属 - 有机前体溶液涂覆在基材上（S1）。 将光敏金属 - 有机前体涂层加压成图案化模具（S2）。 将紫外线照射在加压的金属 - 有机前体涂层上以形成硬化的金属氧化物膜图案（S3）。 从金属氧化物薄膜图案去除图案化的模具（S4）。 进行利用热处理来处理金属氧化物薄膜图案的塑性工艺。
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公开(公告)号：KR1020100038948A
公开(公告)日：2010-04-15
申请号：KR1020080098119
申请日：2008-10-07
Applicant: 한국기계연구원
IPC: H01L51/42
CPC classification number: H01L51/424 , H01L51/0036
Abstract: PURPOSE: An organic photovoltaic device and a manufacturing method thereof are provided to improve reliability of the device by preventing pattern breakdown of P3HT in a PCBM coating process. CONSTITUTION: A buffer layer(20) is formed on a first electrode(10). A photoactive layer(30) is formed to have a nano pattern on the buffer layer. A protective layer(40) is formed to protect the photoactive layer. An electron receiving layer(50) is formed on the protective layer. A second electrode(60) is formed on the electron receiving layer.
Abstract translation: 目的：提供有机光伏器件及其制造方法，以通过防止PCBM涂层工艺中P3HT的图案击穿来提高器件的可靠性。 构成：在第一电极（10）上形成缓冲层（20）。 光敏层（30）形成为在缓冲层上具有纳米图案。 形成保护层（40）以保护光敏层。 在保护层上形成电子接收层（50）。 在电子接收层上形成第二电极（60）。
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Patent Agency Ranking
公开(公告)号：KR1020100027458A
公开(公告)日：2010-03-11
申请号：KR1020080086391
申请日：2008-09-02
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: G03F7/0002 , B82Y40/00
Abstract: PURPOSE: A method for forming an electro-conductive polymer layer with a nano pattern is provided to form the pattern on a conductive polymer layer with a low solubility by forming the conductive polymer layer with a polymerization method instead of a spin coating method. CONSTITUTION: A mold with nano pattern is prepared(S101). A conductive polymer layer is formed on the nano pattern with a chemical oxidization polymerization method(S102). The mold is immersed into a bath in which a monomer solution is contained in order to form the conductive polymer layer on the nano pattern of the mold. A conductive polymer layer is attached on a substrate(S103). The mold is separated from the conductive polymer layer(S104). The conductive polymer layer is formed the mold in the water tub putting the monomer [monomer] solution as dipping on the nano pattern of the mold.
Abstract translation: 目的：提供一种形成具有纳米图案的导电聚合物层的方法，通过用聚合方法代替旋涂法形成导电聚合物层，在具有低溶解度的导电聚合物层上形成图案。 构成：制备具有纳米图案的模具（S101）。 用化学氧化聚合法在纳米图案上形成导电聚合物层（S102）。 将模具浸入其中含有单体溶液的浴中，以便在模具的纳米图案上形成导电聚合物层。 将导电聚合物层附着在基板上（S103）。 模具与导电聚合物层分离（S104）。 导电聚合物层在水桶中形成模具，将单体[单体]溶液浸渍在模具的纳米图案上。
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公开(公告)号：KR100935019B1
公开(公告)日：2010-01-06
申请号：KR1020080070252
申请日：2008-07-18
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: H01L21/0334 , B82Y40/00
Abstract: PURPOSE: A method for manufacturing a metal nano pattern is provided to improve productivity by manufacturing a metal nano pattern easily by applying dry or wet etching. CONSTITUTION: A nano pattern is formed on a substrate(S101). A metal layer is formed on a nano pattern(S102). A polarization polymer layer is formed on the metal layer(S103). The metal layer and the planarization layer are etched to expose the metal partially(S104). The pattern is etched to expose the upper surface of the nano pattern to the outside and make the metal layer remain on the groove of the nano pattern(S105).
Abstract translation: 目的：提供一种用于制造金属纳米图案的方法，以通过采用干蚀刻或湿蚀刻方式容易地制造金属纳米图案来提高生产率。 构成：在基板上形成纳米图案（S101）。 在纳米图案上形成金属层（S102）。 在金属层上形成极化聚合物层（S103）。 蚀刻金属层和平坦化层以使金属部分露出（S104）。 蚀刻图案以将纳米图案的上表面暴露于外部，并使金属层保留在纳米图案的凹槽上（S105）。
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公开(公告)号：KR1020090114962A
公开(公告)日：2009-11-04
申请号：KR1020080040865
申请日：2008-04-30
Applicant: 한국기계연구원
CPC classification number: G02F1/13471 , G02B6/004 , G02F2001/133507
Abstract: PURPOSE: A transparent substrate and a manufacturing method thereof are provided to prevent the reflection of emitted light by forming a anti-reflection nano patterns at both sides of a main substrate. CONSTITUTION: A transparent substrate(200) comprises a main substrate(210) which is faced with a light source. The main substrate comprises the first surface facing the light source and the second surface facing the first surface. Nano-patterns(213,215) for preventing the reflection of light are arranged on the first and second surfaces and consist of a plurality of protrusions. The nano patterns have a pitch of 20 to 500nm. An ITO(Indium Tin Oxide) substrate(230) is attached to the first side of the substrate.
Abstract translation: 目的：提供透明基板及其制造方法，以通过在主基板的两侧形成抗反射纳米图案来防止发射光的反射。 构成：透明基板（200）包括面向光源的主基板（210）。 主基板包括面对光源的第一表面和面向第一表面的第二表面。 用于防止光反射的纳米图案（213,215）布置在第一和第二表面上，并且由多个突起组成。 纳米图案具有20至500nm的间距。 ITO（氧化铟锡）衬底（230）附着到衬底的第一侧。
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公开(公告)号：KR100885656B1
公开(公告)日：2009-02-26
申请号：KR1020070023591
申请日：2007-03-09
Applicant: 한국기계연구원
IPC: G03F7/20 , H01L21/027
Abstract: 본 발명은 다중간섭현상을 이용한 미세패턴의 형성장치 및 방법에 관한 것이다. 본 발명의 장치는 레이저소스; 상기 레이저소스로부터의 출사광을 콜리메이팅된 상태의 평행광으로 입사하여 반사시키는 회절격자; 및 상기 회절격자로부터의 반사광을 상기 기판쪽으로 투과하고 나머지의 광은 상기 회절격자쪽으로 반사시키는 미러를 포함하며, 상기 회절격자와 미러에서 반사 및 투과를 반복하는 광은 매번 투과율(T)만큼의 광이 상기 미러를 투과하여 상기 포토레지스터에 조사되며 이 광들이 다중 간섭현상을 일으키며, 이때 다중 간섭신호의 주기를 변경하여 상기 기판 상에 노광된 노광부위의 위치를 변경시킴으로써 변경된 주기의 갯수 만큼의 패턴형성이 가능한 것을 특징으로 한다. 따라서, 본 발명은 다중 간섭현상을 이용하여 다양한 모양의 패턴의 형성이 가능하며 2회 이상의 패턴형성 시에 얼라인이 가능한 효과를 제공한다.
다중간섭, 패턴, 노광-
120.发明公开
公开(公告)号：KR1020080101048A
公开(公告)日：2008-11-21
申请号：KR1020070047238
申请日：2007-05-15
Applicant: 한국기계연구원
IPC: H01L21/027 , B82Y40/00
CPC classification number: H01L21/0274 , B82Y40/00 , G03F1/80 , G03F7/0002
Abstract: A uniform pattern formation can be formed and the process for forming pattern step can be reduced by direct structuring of functional pattern including conductivity. A step is for depositing the adhesion protection layer(9) on the master board(12) having the master pattern(12a). A step is for preparing the substrate(13) for direct-structuring the master pattern of the master board by depositing the adhesion film(10) on the upper side. A step is for spraying the nano metal particle based ultraviolet ray(UV) curing resin(11) on the adhesion protection layer of the master board. A step is for evaporating the solvent of resin by heating the resin-coated master board with the hot plate. The step is for installing the substrate and master board within the ultraviolet curing apparatus and for adhering the nano metal particle based ultraviolet ray(UV) curing resin(15) on the substrate in order to be contacted with the upper side of the master board by irradiating the ultraviolet ray. A step is for separating the nano metal particle based ultraviolet ray(UV) curing resin(15) from the master board. A step is for forming the nano metal particle based ultraviolet ray(UV) curing resin pattern on the substrate by the etching process.
Abstract translation: 可以形成均匀的图案形成，并且可以通过直接构造包括导电性的功能图案来减少形成图案步骤的工艺。 步骤是将粘合保护层（9）沉积在具有主图案（12a）的母板（12）上。 步骤是通过在上侧沉积粘合膜（10）来制备用于直接构造主板的主图案的基板（13）。 一步是将纳米金属颗粒基紫外线（UV）固化树脂（11）喷涂在主板的粘附保护层上。 通过加热带有树脂的主板与热板蒸发树脂溶剂的步骤。 该步骤用于将基板和母板安装在紫外线固化装置内，并将基于纳米金属颗粒的紫外线（UV）固化树脂（15）粘附在基板上，以便与主板的上侧接触。 照射紫外线。 一步是从母板上分离纳米金属颗粒的紫外线（UV）固化树脂（15）。 通过蚀刻工艺在基板上形成基于纳米金属颗粒的紫外线（UV）固化树脂图案的步骤。
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