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公开(公告)号：US09890071B2
公开(公告)日：2018-02-13
申请号：US15291379
申请日：2016-10-12
Applicant: Corning Incorporated
Inventor： Carlos Alberto Duran
CPC classification number: C03B25/00 , C03B25/02 , C03B25/08 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C2201/00 , C03C2201/42 , Y02P40/57
Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
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公开(公告)号：US20180016176A1
公开(公告)日：2018-01-18
申请号：US15716084
申请日：2017-09-26
Applicant: NIKON CORPORATION
Inventor： Toshio YOSHINARI , Tadahiko SAITO
CPC classification number: C03B19/1415 , C03B11/00 , C03B19/1453 , C03B19/1469 , C03B19/1476 , C03B19/1492 , C03B23/0013 , C03B23/0496 , C03B32/005 , C03B2201/12 , C03B2201/42 , C03C3/04 , C03C3/06 , C03C2201/12 , C03C2201/42 , C03C2203/44 , C03C2203/52
Abstract: A device for manufacturing SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.
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公开(公告)号：US20170038672A1
公开(公告)日：2017-02-09
申请号：US15041113
申请日：2016-02-11
Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Inventor： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
CPC classification number: G03F1/24 , C03B19/1415 , C03B19/1423 , C03B2201/42 , C03B2207/64 , C03C3/06 , C03C4/0085 , C03C4/08 , C03C2201/42 , C03C2203/42 , G03F1/50
Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
Abstract translation: 在二氧化钛掺杂石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）与双折射测量点（A）之间的直线和 在测量点（A）处的双折射具有大于45度的平均值。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。
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公开(公告)号：US20160355429A1
公开(公告)日：2016-12-08
申请号：US15176259
申请日：2016-06-08
Applicant: Momentive Performance Materials Inc.
Inventor： Kipyung Ahn , Guangjun Xu , Martin Panchula , Samuel Conzone , Tianjun Rong , Konstantin S. Zuyev , Yen Zhou
CPC classification number: C03C3/06 , A61J1/00 , A61J1/1468 , B65D1/00 , C03B1/00 , C03B17/04 , C03C4/00 , C03C4/085 , C03C4/20 , C03C2201/11 , C03C2201/23 , C03C2201/32 , C03C2201/3423 , C03C2201/42 , C03C2203/10 , C03C2204/00 , Y10T428/131
Abstract: A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al2O3, CeO2, TiO2, La2O3, Y2O3, Nd2O3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000° C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.
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公开(公告)号：US09505649B2
公开(公告)日：2016-11-29
申请号：US14474427
申请日：2014-09-02
Applicant: Corning Incorporated
Inventor： Carlos Alberto Duran
CPC classification number: C03B25/00 , C03B25/02 , C03B25/08 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C2201/00 , C03C2201/42 , Y02P40/57
Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
Abstract translation: 在宽范围的零交叉温度下具有小的温度变化系数的二氧化硅 - 二氧化钛玻璃以及用于制造眼镜的方法。 该方法包括在两种不同温度方案下具有受控退火的冷却方案。 较高的温度控制退火可能在750°C-950°C的温度区间或其次间隔发生。 较低的温度控制退火可以在650℃-875℃或其子间隔的温度区间内进行。 受控退火允许独立控制二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc。 独立控制提供固体组合物的二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc值，迄今为止只能通过组成变化来实现。
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Patent Agency Ranking
116.发明授权Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method 有权掩模空白基板，具有多层反射膜的基板，透射掩模板，反射掩模和半导体器件制造方法公开(公告)号：US09494851B2
公开(公告)日：2016-11-15
申请号：US14348413
申请日：2013-03-28
Applicant: HOYA CORPORATION
Inventor： Toshihiko Orihara , Kazuhiro Hamamoto , Hirofumi Kozakai , Youichi Usui , Tsutomu Shoki , Junichi Horikawa
IPC: G03F1/50 , G03F1/22 , G02B5/08 , G03F1/48 , B82Y10/00 , B82Y40/00 , G03F7/20 , C03C3/06 , C03C17/34 , C03C17/36 , C03C23/00
CPC classification number: G03F1/48 , B82Y10/00 , B82Y40/00 , C03C3/06 , C03C17/3435 , C03C17/3626 , C03C17/3636 , C03C17/3639 , C03C17/3649 , C03C17/3665 , C03C23/0075 , C03C2201/42 , C03C2218/33 , G02B5/08 , G02B5/0816 , G02B5/0891 , G03F1/22 , G03F7/16 , G03F7/2002 , G03F7/2004 , G03F7/70733 , H01L21/3081 , H01L21/3085
Abstract: Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 μm−1.
Abstract translation: 公开了一种用于光刻的掩模空白基板，其中形成基板的转印图案的主表面具有通过测量1μm×1的面积获得的不大于0.15nm的均方根粗糙度（Rms） 具有原子力显微镜，并且在不小于1μm-1的空间频率下具有不大于10nm 4的功率谱密度。
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公开(公告)号：US20160306271A1
公开(公告)日：2016-10-20
申请号：US15137954
申请日：2016-04-25
Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Inventor： Shigeru Maida , Hisatoshi Otsuka
CPC classification number: G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/81 , C03C3/06 , C03C2201/42 , C03C2203/42 , Y02P40/57
Abstract: Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.
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118.发明授权Low expansion silica-titania articles with a Tzc gradient by compositional variation 有权通过组成变化具有Tzc梯度的低膨胀二氧化硅 - 二氧化钛制品公开(公告)号：US09382151B2
公开(公告)日：2016-07-05
申请号：US14604998
申请日：2015-01-26
Applicant: Corning Incorporated
Inventor： William R. Angell, IV , Sezhian Annamalai , Carlos Alberto Duran , John Edward Maxon
CPC classification number: C03C3/076 , C03B19/09 , C03B19/1407 , C03B19/1415 , C03B2201/42 , C03B2207/50 , C03C3/06 , C03C3/062 , C03C2201/23 , C03C2201/42 , C03C2203/10 , C03C2203/40 , G03F1/24 , G03F1/60
Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).
Abstract translation: 提供了一种用于极光紫外光刻（EUVL）的玻璃制品。 玻璃制品包括通过玻璃制品具有组成梯度的二氧化硅 - 二氧化钛玻璃，组成梯度由以下功能定义：[TiO 2] =（c + f（x，y，z））和[SiO 2] =（ 100- {c + f（x，y，z）}-δ（x，y，z））其中[TiO 2]是二氧化钛的重量浓度。 ％，[SiO2]是二氧化硅的重量浓度。 ％，c是以重量计的二氧化钛浓度。 对于预定的零交叉温度（Tzc），f（x，y，z）是三维空间中的函数，其定义以坐标（x，y，z）为中心的体积元素的平均成分的差异与 对于c而言，δ（x，y，z）是定义以坐标（x，y，z）为中心的体元素的所有其他分量的和的三维空间中的函数。
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公开(公告)号：US20160137545A1
公开(公告)日：2016-05-19
申请号：US14921487
申请日：2015-10-23
Applicant: Corning Incorporated
Inventor： Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina
IPC: C03C3/06
CPC classification number: C03C3/06 , C03B19/06 , C03B19/12 , C03B19/1453 , C03B32/00 , C03B2201/10 , C03B2201/23 , C03B2201/30 , C03B2201/32 , C03B2201/40 , C03B2201/42 , C03B2201/50 , C03B2201/54 , C03C3/076 , C03C10/0009 , C03C2201/10 , C03C2201/23 , C03C2201/30 , C03C2201/32 , C03C2201/40 , C03C2201/42 , C03C2201/50 , C03C2201/54 , C03C2201/58 , C03C2203/54
Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.
Abstract translation: 超低膨胀二氧化钛 - 二氧化硅玻璃。 玻璃具有高羟基含量，并且任选地包括一种或多种掺杂剂。 代表性的可选掺杂剂包括硼，碱元素，碱土金属元素或诸如Nb，Ta，Al，Mn，Sn Cu和Sn的金属。 玻璃通过包括蒸汽固结以增加羟基含量的方法制备。 高羟基含量或掺杂剂和高羟基含量的组合降低了玻璃的假想温度，以提供具有非常低的热膨胀系数（CTE），低假想温度（Tf）和低膨胀斜率的玻璃。
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120.发明申请TiO2-CONTAINING QUARTZ-GLASS SUBSTRATE FOR AN IMPRINT MOLD AND MANUFACTURING METHOD THEREFOR 审中-公开用于印模的二氧化钛包覆石英玻璃基板及其制造方法公开(公告)号：US20150097304A1
公开(公告)日：2015-04-09
申请号：US14570340
申请日：2014-12-15
Applicant: Asahi Glass Company, Limited
Inventor： Akio KOIKE , Junko Miyasaka , Hiroshi Nakanishi
CPC classification number: B29D11/00769 , B24B9/10 , B29C59/002 , B29C59/026 , C03B19/14 , C03B19/1453 , C03B2201/075 , C03B2201/42 , C03C3/06 , C03C19/00 , C03C2201/42 , C03C2204/08 , G03F7/0002 , Y10T428/24355
Abstract: The present invention relates to a TiO2-containing quartz glass substrate for an imprint mold having a main surface and a side surface, in which the side surface has an arithmetic average roughness (Ra) of 1 nm or less, and the side surface has a root mean square (MSFR_rms) of concaves and convexes in the wavelength region of from 10 μm to 1 mm being 10 nm or less.
Abstract translation: 本发明涉及一种用于压印模具的含TiO 2石英玻璃基板，其具有主表面和侧表面，其中侧表面的算术平均粗糙度（Ra）为1nm或更小，并且侧表面具有 在10μm至1mm的波长范围内的凹凸的平均均方根（MSFR_rms）为10nm以下。
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