公开(公告)号：US20130286471A1

公开(公告)日：2013-10-31

申请号：US13846785

申请日：2013-03-18

Applicant: Rolf FREIMANN ,  Norman BAER ,  Guido LIMBACH ,  Thure BOEHM ,  Gero WITTICH

Inventor： Rolf FREIMANN ,  Norman BAER ,  Guido LIMBACH ,  Thure BOEHM ,  Gero WITTICH

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

Abstract: A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) with a substrate (S) and a layer arrangement configured such that light (32) having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P′″) having a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include a high refractive index layer (H′″) and a low refractive index layer (L′″). The layer arrangement has at least one graphine layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

Abstract translation: 具有衬底（S）的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'）和被配置为使得波长低于250nm的光（32）被配置成入射到反射镜上的至少 0°和30°之间的入射角反映其强度的20％以上。 层布置具有至少一个具有至少两个单独层的周期（P3）的周期性序列的表面层系统（P“），其中周期（P3）包括高折射率层（H”） 和低折射率层（L“'）。 层布置具有至少一个石墨层。 石墨烯（G，SPL，B）在光学元件上的使用将表面粗糙度降低到低于0.1nm rms HSFR，和/或保护EUV元件免受辐射诱导的体积变化超过1％。 石墨烯也被用作阻挡层以防止层相互扩散。

公开(公告)号：US08537970B2

公开(公告)日：2013-09-17

申请号：US13154746

申请日：2011-06-07

Applicant: Philipp Bernhardt

Inventor： Philipp Bernhardt

IPC: G21K1/06

CPC classification number: G21K1/06 ,  A61B6/4035 ,  A61B6/4441 ,  A61B6/544 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/067

Abstract: For a quasi-monochromatic x-ray radiation with high radiation intensity, an x-ray radiator generates quasi-monochromatic x-ray radiation to expose a subject from a point-shaped radiation source that emits a polychromatic x-ray radiation, and having a diffraction device to diffract the polychromatic x-ray radiation. The diffraction device has a super-mirror made of crystalline material with a flat surface. In the super-mirror, the crystalline material has at least one (in particular continuous) variation of the lattice plane spacing of the crystal lattice. The radiation source and the diffraction device are arranged such that quasi-monochromatic x-ray radiation is generated from the polychromatic x-ray radiation by partial reflection at the super-mirror.

Abstract translation: 对于具有高辐射强度的准单色X射线辐射，x射线辐射器产生准单色X射线辐射，以从发射多色X射线辐射的点状辐射源暴露受试者，并具有 衍射装置衍射多色X射线辐射。 衍射装置具有由具有平坦表面的结晶材料制成的超级反射镜。 在超镜中，晶体材料具有晶格的晶格面间距的至少一个（特别是连续的）变化。 辐射源和衍射装置被布置成使得通过在超镜下的部分反射从多色X射线辐射产生准单色x射线辐射。

公开(公告)号：US08515002B2

公开(公告)日：2013-08-20

申请号：US13147952

申请日：2010-07-06

Applicant: Zhifeng Huang ,  Zhiqiang Chen ,  Li Zhang ,  Zhentian Wang ,  Yuxiang Xing ,  Ziran Zhao ,  Yongshun Xiao

Inventor： Zhifeng Huang ,  Zhiqiang Chen ,  Li Zhang ,  Zhentian Wang ,  Yuxiang Xing ,  Ziran Zhao ,  Yongshun Xiao

IPC: A61B6/00

CPC classification number: G01N23/04 ,  B82Y10/00 ,  G01N23/20075 ,  G21K2201/061 ,  G21K2207/005

Abstract: An x-ray imaging technology, performing an x-ray dark-field CT imaging of an examined object using an imaging system which comprises an x-ray source, two absorbing gratings G1 and G2, an x-ray detector, a controller and a data processing unit, comprising the steps of: emitting x-rays to the examined object; enabling one of the two absorbing gratings G1 and G2 to perform phase stepping motion within at least one period range thereof; where in each phase stepping step, the detector receives the x-ray and converts it into an electric signal; wherein through the phase stepping of at least one period, the x-ray intensity at each pixel point on the detector is represented as an intensity curve; calculating a second moment of scattering angle distribution for each pixel, based on a contrast of the intensity curve at each pixel point on the detector and an intensity curve without presence of the examined object; taking images of the object at various angles, then obtaining an image with scattering information of the object in accordance with a CT reconstruction algorithm.

Abstract translation: 一种X射线成像技术，使用包括x射线源，两个吸收光栅G1和G2，x射线检测器，控制器和控制器的成像系统对检查对象进行X射线暗场CT成像 数据处理单元，包括以下步骤：向被检查对象发射X射线; 使得两个吸收光栅G1和G2中的一个能够在其至少一个周期范围内执行相位步进运动; 在每个相位步进步骤中，检测器接收x射线并将其转换为电信号; 其中通过至少一个周期的相位步进，将检测器上每个像素点处的x射线强度表示为强度曲线; 基于检测器上的每个像素点处的强度曲线的对比度和不存在检查对象的强度曲线，计算每个像素的散射角分布的第二时刻; 以各种角度拍摄对象的图像，然后根据CT重建算法获得具有对象的散射信息的图像。

公开(公告)号：US08488743B2

公开(公告)日：2013-07-16

申请号：US13491705

申请日：2012-06-08

Applicant: Boris Verman

Inventor： Boris Verman

IPC: G21K1/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/067 ,  G21K2201/061

Abstract: A nanotube based device for guiding a beam of x-rays, photons, or neutrons, includes a beam source and at least one nanotube. Each nanotube has an optical entrance positioned in a manner that a projection of the direction of the central axis at the optical entrance intersects with the beam source. Each nanotube may have an interior diameter that varies along the length of the nanotube. to point the entrances of a bundle of nanotubes toward a point-shaped beam source, the bundle can be grown as an array of multilayer nanotubes from a spherical growth plate. The clear aperture of the bundle is enhanced by providing a smaller number of wall layers of each nanotube near the growth plate than at a distance from the growth plate.

Abstract translation: 用于引导X射线，光子或中子束的基于纳米管的装置包括束源和至少一个纳米管。 每个纳米管具有以使得在光学入口处的中心轴的方向的投影与光束源相交的方式定位的光学入口。 每个纳米管可具有沿纳米管长度变化的内径。 为了将一束纳米管的入口指向点状束源，该束可以从球形生长板作为多层纳米管的阵列生长。 通过在生长板附近提供比与生长板相距一定距离的每个纳米管的较小数量的壁层来增强束的透明孔。

公开(公告)号：US20130163727A1

公开(公告)日：2013-06-27

申请号：US13820072

申请日：2011-08-23

Applicant: Kohei Okamoto ,  Atsushi Komoto ,  Wataru Kubo ,  Hirokatsu Miyata ,  Takashi Noma

Inventor： Kohei Okamoto ,  Atsushi Komoto ,  Wataru Kubo ,  Hirokatsu Miyata ,  Takashi Noma

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K1/062 ,  G21K2201/061

Abstract: A X-ray waveguide includes a core for guiding X-rays having a wavelength band in which the real part of refractive index of material is smaller than 1 and a cladding for confining the X-rays in the core. The core has a one-dimensional periodic structure in which a plurality of layers respectively formed of inorganic materials having different real parts of refractive index are periodically laminated. The core and the cladding are configured so that a critical angle for total reflection for the X-rays at an interface between the core and the cladding is larger than a Bragg angle due to a periodicity of the one-dimensional periodic structure. A critical angle for total reflection for the X-rays at an interface between layers in the one-dimensional periodic structure is smaller than the Bragg angle due to the periodicity of the one-dimensional periodic structure.

Abstract translation: X射线波导包括用于引导具有材料折射率的实部的小于1的波长带的X射线的芯和用于将X射线限制在芯中的包层。 芯具有一维周期性结构，其中分别由具有不同实际折射率部分的无机材料形成的多个层周期性层压。 芯和包层被配置为使得在芯和包层之间的界面处的X射线的全反射的临界角度由于一维周期性结构的周期性而大于布拉格角。 由于一维周期性结构的周期性，在一维周期结构中的层之间的界面处的X射线的全反射的临界角小于布拉格角。

公开(公告)号：US20130148200A1

公开(公告)日：2013-06-13

申请号：US13763709

申请日：2013-02-10

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Dirk Heinrich Ehm ,  Stephan Muellender ,  Thomas Stein ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dieter Kraus ,  Richard Versluis ,  Marcus Gerhardus Hendrikus Meijerink

IPC: G03B27/16

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 光学装置，例如 用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个优选反射光学元件（4-10,12,14.1-14.6）; 至少一个用于所述壳体（2）的内部空间（15）的真空发生单元（3）; 以及布置在所述内部空间（15）中并且至少包围所述光学元件（4-10,12,14.1-14.5）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1-18.10） 。 污染减少单元与真空壳体（18.1-18.10）相关联，并且至少紧邻光学表面（17,17.1,17.2）处的污染物质特别是水和/或烃的分压降低 与内部空间（15）中污染物质的分压有关。

公开(公告)号：US20130003167A1

公开(公告)日：2013-01-03

申请号：US13635851

申请日：2011-03-16

Applicant: Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

Inventor： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

IPC: G02B7/195 ,  G02B5/08

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

Abstract: An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with thermal loading of the collector and avoid deformations, the reflective shell (25) is mounted on a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29); to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

Abstract translation: 用于收集在中央EUV生产地点产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对收集器的热负荷并避免变形，反射壳体（25）安装在支撑结构（24）上，使得在反射壳体（25）的背面和 支撑结构（24），反射壳体（25）的厚度被大大减小，使得反射壳体（25）的背面与流过冷却通道的冷却介质（26）之间的对流热传递 29）支配相对于热传导从反射壳体（25）去除热量的过程，并且冷却回路（33）连接到冷却通道（29）; 以受控的冷却剂压力和/或质量流量将冷却介质（26）供应到冷却通道（29）。

公开(公告)号：US20120256105A1

公开(公告)日：2012-10-11

申请号：US13494778

申请日：2012-06-12

Applicant: Masato MORIYA ,  Osamu Wakabayashi ,  Georg Soumagne

Inventor： Masato MORIYA ,  Osamu Wakabayashi ,  Georg Soumagne

IPC: G21K5/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.

Abstract translation: 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。

公开(公告)号：US08137870B2

公开(公告)日：2012-03-20

申请号：US12383640

申请日：2009-03-26

Applicant: Myoung-soo Lee ,  Young-su Sung ,  Hee-bom Kim ,  Min-kyung Lee ,  Dong-gun Lee

Inventor： Myoung-soo Lee ,  Young-su Sung ,  Hee-bom Kim ,  Min-kyung Lee ,  Dong-gun Lee

IPC: G03F1/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G03F1/70 ,  G03F7/70625 ,  G21K2201/061

Abstract: A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.

Abstract translation: 制造光掩模的方法包括：提供光掩模; 曝光光掩模以获得光掩模的空间图像，并使用空中图像评估光掩模; 以及根据评估结果改变与空中图像相关联的光掩模的光学参数。

公开(公告)号：US08121258B2

公开(公告)日：2012-02-21

申请号：US12667464

申请日：2008-07-02

Applicant: Peter Hoghoj ,  Pascal Boulee ,  Paraskevi Ntova ,  Sergio Rodrigues

Inventor： Peter Hoghoj ,  Pascal Boulee ,  Paraskevi Ntova ,  Sergio Rodrigues

IPC: H01J35/10

CPC classification number: H01J35/10 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/14 ,  H01J35/20

Abstract: The invention relates to X-ray analytical instruments (RX), more precisely a device for providing a high energy X-ray beam, typically above 4 keV, for X-ray analysis applications. The device comprises an X-ray tube with a turning anode and an X-ray lens for shaping the beam.

Abstract translation: 本发明涉及X射线分析仪器（RX），更准确地说，一种用于提供通常高于4keV的高能X射线束用于X射线分析应用的装置。 该装置包括具有转向阳极的X射线管和用于使束成形的X射线透镜。