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公开(公告)号：FR2669465B1
公开(公告)日：1996-07-12
申请号：FR9014287
申请日：1990-11-16
Applicant: THOMSON RECH
Inventor： PRIBAT DIDIER , VU THIEN BINH , LEGAGNEUX PIERRE
Abstract: Electron source made notably in the form of a micropoint cathode electrode in which a microcathode is located in a cavity (CA) of a dielectric (3). A first gate electrode (VG1) surrounds the cavity (CA) and a second gate electrode (VG2) surrounds the first gate electrode (VG1). The different electrodes are carried to potentials such that the first gate electrode (VG1) acts as an extraction electrode and the second gate electrode acts as a focusing electrode.
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公开(公告)号：GB2235087B
公开(公告)日：1994-04-13
申请号：GB9013216
申请日：1990-06-13
Applicant: HITACHI LTD
Inventor： HAZAKI EIICHI , OTAKA TADASHI , SHIMIZU MINORU
Abstract: In a particle beam surface analyzer, having a partition wall separation a vacuum space, an opening that is provided in a partition wall through which the particle beam is taken out, a seal member which is moved along a seal surface of the seal member and seals the opening, a condenser lens which converges the particle beam onto the sample, and detector for detecting a physical quantity from the sample when the particle beam is irradiated on the sample, the surface analyzer further has a movable shift member that pushes one side surface of the seal member along the seal surface of the seal member and a stopping member which the other side surface of the seal member having a predetermined angle being larger than 55 DEG and smaller than 75 DEG to the seal surface is abutted so as to move the seal member along the other side surface till the seal member reaches the openings, whereby resultant forces between the seal member and the seal surface in the side of the one side surface is equal to that in the side of the other side surface. As the predetermined angle is larger than 55 DEG and smaller than 75 DEG to the seal surface, the abrasion and seizure of the seal member are prevented and the contamination of the sample is lessened.
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公开(公告)号：CA2070478A1
公开(公告)日：1992-12-28
申请号：CA2070478
申请日：1992-06-04
Applicant: RAYTHEON CO
Inventor： FEIST WOLFGANG M , STACEY WILLIAM F
Abstract: A technique for forming field emitters for displays and vacuum microelectronic devices is described. The field emitters include a tip, a grid to control electron emission from the tip, and an electrode for focusing the electron emission. The method avoids simultaneous evaporation at vastly different angles and replaces simultaneous evaporation with successive evaporations followed by a noncritical lift-off.
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公开(公告)号：CA2060809A1
公开(公告)日：1992-09-02
申请号：CA2060809
申请日：1992-02-07
Applicant: RAYTHEON CO
Inventor： FEIST WOLFGANG M
Abstract: A field emitter includes an electron emitting structure spaced from an anode structure, with the intervening gap being substantially evacuated. The electron emitting structure includes a first electrically conductive layer spaced by an insulating layer from a second conductive layer, and a generally circular aperture disposed through the layers. The anode structure includes an electrically conductive layer. Electrostatic forces, provided from a potential applied between the first conductive layer and the anode structure, causes an electron beam to be drawn from a cathode provided by a peripheral edge portion of the first conductive layer within the aperture onto an adjacent surface portion of the anode structure. Such field emission occurs under the control of a potential applied between the first and second conductive layers of the electron emitting structure with the second conductive layer functioning as a control electrode of the emitting structure. The anode structure converts the electrical energy from the electron bombardment into visible light energy. In one embodiment, potential applied to a third conductive layer of the emitting structure serves to focus the electron stream on the anode structure. Methods of manufacturing the disclosed electron emitting structures are also described.
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公开(公告)号：DE2945177C2
公开(公告)日：1988-08-25
申请号：DE2945177
申请日：1979-11-08
Applicant: CONTROL DATA CORP., MINNEAPOLIS, MINN., US
Inventor： NEWBERRY, STERLING PRICE, WINCHESTER, MASS., US , BRUGESS, JOHN REYNOLDS, DUNSTABLE, MASS., US
Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential. The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.
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Patent Agency Ranking
公开(公告)号：NL182996C
公开(公告)日：1988-06-16
申请号：NL7811418
申请日：1978-11-20
Applicant: HELL RUDOLF DR ING GMBH
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公开(公告)号：NL182996B
公开(公告)日：1988-01-18
申请号：NL7811418
申请日：1978-11-20
Applicant: HELL RUDOLF DR ING GMBH
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公开(公告)号：GB2178893A
公开(公告)日：1987-02-18
申请号：GB8608726
申请日：1986-04-10
Applicant: FINNIGAN MAT GMBH
Inventor： JUNG GERHARD
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公开(公告)号：ES8609814A1
公开(公告)日：1986-07-16
申请号：ES549236
申请日：1985-11-25
Applicant: PHILIPS NV
Abstract: MODIFICACIONES EN UN DISPOSITIVO DE HAZ ELECTRONICO. CONSISTENTES EN: UNOS ELECTRODOS SOBRE LA CAPA ELECTRICAMENTE AISLANTE, QUE COMPRENDEN CUATRO ELECTRODOS (14, 15, 16, 18) FORMADORES DE HAZ QUE ESTAN ESPACIADOS DE FORMA REGULAR ALREDEDOR DE LA ABERTURA Y QUE CADA UNO TIENE UN POTENCIAL TAL QUE SE GENERA UN CAMPO DE N POLOS O UNA COMBINACION DE CAMPOS DE N POLOS, EN LOS QUE N ES UN NUMERO ENTERO PAR IGUAL O MAYOR QUE 4 Y MENOR O IGUAL A 16; UNA CAPA AISLANTE QUE PUEDE ESTAR DIVIDIDA EN UNA PRIMERA Y UNA SEGUNDA CAPA AISLANTE ENTRE LAS CUALES ESTA INTERPUESTO UN ELECTRODO ACELERADOR (18) EN TORNO A LA ABERTURA.
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公开(公告)号：AU537286B2
公开(公告)日：1984-06-14
申请号：AU6607981
申请日：1981-01-08
Applicant: CONTROL DATA CORP
Inventor： BONO DAVID CURRIER , FISHBEIN MARVIN , HARTE KENNETH JEREMY
IPC: H01J3/18 , H01J37/12 , H01J37/305 , H01J37/317 , H01J29/56 , H01J29/62
Abstract: A unipotential electrostatic lens and method of operation for charged particle beam tubes of the electron beam, compound fly's eye type having both coarse and fine deflection sections wherein the objective lens assembly may lack coaxial symmetry about the lens axis. The unipotential lens comprises an assembly of axially aligned electrostatic lens elements with each lens element having an array of micro lenslet apertures and with each set of axially aligned micro lenslet apertures forming a micro lenslet. Preferably, there are three such lens elements in the assembly with a high voltage excitation potential supplied to the center lens element. A dynamic focus correction potential derived from the deflection potentials applied to the tube is supplied to the entrance outer lens element closest to the electron gun of the beam tube. The remaining outer lens element is maintained at system ground reference potential. In preferred arrangements, a fixed offset potential is added to the high voltage excitation potential supplied to the center lens element and a compensating offset potential is supplied to the entrance outer lens element along with the dynamic focusing correction potential to thereby distribute and minimize the effect of deflection sweep and astigmatism errors which otherwise might be introduced by the uncompensated dynamic focus correction potential.
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