A movable electron source for a mass spectrometer

    公开(公告)号:GB2391695A

    公开(公告)日:2004-02-11

    申请号:GB0309510

    申请日:2003-04-25

    Abstract: A electron source 52 for a mass spectrometer which produces electrons 54 by the application of an electrical current, directly through a filament or indirectly through a filament heater, is movable to an operating position (fig 6a) from a parking position (fig 6b) by the Lorentz force created by the interaction of the current and a magnetic field 12. Return of the source to the parking position may be by gravity, by a spring or by reversing the current. The electron source may be pivotally mounted on a frame or slidable along rails. The electron source is for use in a mass spectrometer, e.g. an ICR mass spectrometer, having an ion trap 55 with an entrance opening through which an ion or laser beam 57 may be introduced when the electron source is in its parking position. The electron source may also be part of an electron impact ion source.

    Device and method for moving an ion source

    公开(公告)号:GB0309510D0

    公开(公告)日:2003-06-04

    申请号:GB0309510

    申请日:2003-04-25

    Abstract: A mass spectrometer has an assembly which generates electrons in a magnetic field. The assembly has an electrically-powered electron emitter secured by a fixture. The fixture is preferably movable. The electron source is a filament conducting electricity, or an indirectly heated electron source. The movable fixture is redirected by Fourier transform ion cyclotron resonance mass spectrometer requiring no further supplementary magnetic field. The magnetic field is generated either by a permanent magnet, or by a normal-conducting or superconducting electro-magnet. Return of the electron source from the operating position to the parked position is effected either by gravity or a return-spring, or by reversed operating current. The electron source is fixed to a swivel or sliding fixture. An Independent claim states that the Lorentz force which is generated in the magnetic field by the electrical current, redirects the electron source between an operating position and a parked position.

    ELECTRON BEAM GENERATION PROCESS
    115.
    发明专利

    公开(公告)号:RU2113033C1

    公开(公告)日:1998-06-10

    申请号:RU97102904

    申请日:1997-02-20

    Abstract: FIELD: generation of accelerated charge particle beams for quantum electronics, plasma chemistry, etc. SUBSTANCE: space pulse discharge is initiated in gas-filled gap between electrodes. Electron beam is shaped by avalanche breeding of initial electron beam in discharge at pressure close to atmospheric value with discharge current chosen to ensure compensation for space charge formed in discharge during development of electron avalanches; electric field strength is chosen to exceed threshold value for developing avalanches of running electrons. EFFECT: improved quantity and energy of beam electrons, lifetime of beam, and pressure at which beam- shaping discharge occurs.

    116.
    发明专利
    未知

    公开(公告)号:DE69115150T2

    公开(公告)日:1996-05-15

    申请号:DE69115150

    申请日:1991-07-26

    Applicant: TOSHIBA KK

    Abstract: There is disclosed a method of irradiating low-energy electrons that has the steps of irradiating a primary electron beam from a primary electron beam irradiation portion onto a secondary electron emission portion to emit a secondary electron beam, accelerating the emitted secondary electron beam, removing high-energy components from the accelerated secondary beam, and decelerating the secondary electron beam without the high-energy components into a focus. And there is also disclosed an apparatus for irradiating low-energy electrons that has a primary electron beam irradiating section (101), a secondary electron emitting section (107) which receives the primary electron beam and emits a secondary electron beam, a secondary electron beam accelerating section (109), energy analyzing section (110) which removes high-energy components from the accelerated secondary electron beam, to obtain low-energy secondary electrons, and deceleration section (114, 115) for decelerating the low-energy secondary electrons into a focus.

    117.
    发明专利
    未知

    公开(公告)号:DE69115150D1

    公开(公告)日:1996-01-18

    申请号:DE69115150

    申请日:1991-07-26

    Abstract: There is disclosed a method of irradiating low-energy electrons that has the steps of irradiating a primary electron beam from a primary electron beam irradiation portion onto a secondary electron emission portion to emit a secondary electron beam, accelerating the emitted secondary electron beam, removing high-energy components from the accelerated secondary beam, and decelerating the secondary electron beam without the high-energy components into a focus. And there is also disclosed an apparatus for irradiating low-energy electrons that has a primary electron beam irradiating section (101), a secondary electron emitting section (107) which receives the primary electron beam and emits a secondary electron beam, a secondary electron beam accelerating section (109), energy analyzing section (110) which removes high-energy components from the accelerated secondary electron beam, to obtain low-energy secondary electrons, and deceleration section (114, 115) for decelerating the low-energy secondary electrons into a focus.

    118.
    发明专利
    未知

    公开(公告)号:DE3866076D1

    公开(公告)日:1991-12-12

    申请号:DE3866076

    申请日:1988-09-02

    Applicant: SIEMENS AG

    Abstract: The beam generation system has an acceleration electrode (A), a control electrode (W) and a directly heated boride cathode (BK). The latter is supported by a cathode holder (4) within a central opening of the control electrode (W), with an associated clamping device (K,S) comprising a pair of metal clamps (K) and setting screws (S) exerting the required clamping force on a graphite support device (G) directly beneath the electron-emitting zone of the boride cathode (BK). Pref. the cathode uses a LaB6 crystal supported between a pair of graphite elements within a high vacuum of between 10 power -6 and 10 power -7 Torr, operated at a temp. of between 1200 and 1800 deg. C.

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