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公开(公告)号：US08629071B2
公开(公告)日：2014-01-14
申请号：US13761881
申请日：2013-02-07
Applicant: Shin-Etsu Chemical Co., Ltd.
Inventor： Shigeru Maida , Hisatoshi Otsuka
CPC classification number: G03F1/22 , C03B19/1423 , C03B2201/20 , C03B2201/42 , C03C3/06 , C03C4/0085 , C03C2201/20 , C03C2201/42 , Y02P40/57
Abstract: A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided.
Abstract translation: 提供二氧化钛和硫共掺杂石英玻璃构件。 由于二氧化钛和硫的共掺杂，石英玻璃构件在宽温度范围内在一定温度下经历零膨胀和低热膨胀，因此适用于商业EUV光刻工具。 还提供了用于EUV光刻的制造方法和光学构件。
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公开(公告)号：US08546283B2
公开(公告)日：2013-10-01
申请号：US13531928
申请日：2012-06-25
Applicant: Junko Miyasaka , Akio Koike , Tomonori Ogawa
Inventor： Junko Miyasaka , Akio Koike , Tomonori Ogawa
CPC classification number: C03C3/06 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1461 , C03B2201/075 , C03B2201/12 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/54 , G02B5/0891 , G03F1/24
Abstract: The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.
Abstract translation: 本发明涉及一种用于EUV光刻光学部件的基板，其包括含有二氧化钛的二氧化硅玻璃，其中该基板具有两个相对的表面，该基板具有线性热膨胀系数（CTE）为0ppb /°的温度 C.（交叉温度：COT），其中两个相对表面的COT值在5℃以上有差异。
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公开(公告)号：US20120264584A1
公开(公告)日：2012-10-18
申请号：US13531928
申请日：2012-06-25
Applicant: Junko Miyasaka , Akio Koike , Tomonori Ogawa
Inventor： Junko Miyasaka , Akio Koike , Tomonori Ogawa
IPC: C03C3/04
CPC classification number: C03C3/06 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1461 , C03B2201/075 , C03B2201/12 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/54 , G02B5/0891 , G03F1/24
Abstract: The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.
Abstract translation: 本发明涉及一种用于EUV光刻光学部件的基板，其包括含有二氧化钛的二氧化硅玻璃，其中该基板具有两个相对的表面，该基板具有线性热膨胀系数（CTE）为0ppb /°的温度 C.（交叉温度：COT），其中两个相对表面的COT值在5℃以上有差异。
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124.发明申请BLANK OF TITANIUM-DOPED GLASS WITH A HIGH SILICA CONTENT FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF 有权具有高二氧化硅含量的钛白粉玻璃用于在EUV光刻中使用的镜面基板及其生产方法公开(公告)号：US20120183719A1
公开(公告)日：2012-07-19
申请号：US13499352
申请日：2010-09-28
Applicant: Bodo Kuehn
Inventor： Bodo Kuehn
CPC classification number: C03B23/20 , C03B19/1453 , C03B32/00 , C03B2201/42 , C03C3/06 , C03C2201/42 , G02B5/10 , G03F7/708 , Y10T428/22 , Y10T428/24612
Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.
Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。
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公开(公告)号：US20120058419A1
公开(公告)日：2012-03-08
申请号：US13223808
申请日：2011-09-01
Applicant: Shigeru Maida , Hisatoshi Otsuka , Osamu Sekizawa , Naoki Yanagisawa
Inventor： Shigeru Maida , Hisatoshi Otsuka , Osamu Sekizawa , Naoki Yanagisawa
CPC classification number: C03C3/06 , C03B19/1423 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/62 , C03B2207/64 , C03C4/0085 , C03C2201/21 , C03C2201/42
Abstract: A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.
Abstract translation: 通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃 二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。 目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。
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Patent Agency Ranking
126.发明申请公开(公告)号：US20120056106A1
公开(公告)日：2012-03-08
申请号：US13262298
申请日：2010-03-11
Applicant: Christian Neumann
Inventor： Christian Neumann
CPC classification number: G02B5/208 , C03C3/06 , C03C4/0085 , C03C2201/30 , C03C2201/42 , C03C2203/10 , G02B5/226
Abstract: The invention relates to an optical filter material made of doped quartz glass, which at a low dopant concentration exhibits spectral transmission as high as possible of at least 80% cm−1 for operating radiation of 254 nm, transmission as low as possible in the wave range below approximately 250 nm, and an edge wavelength λc within the wave range of 230 to 250 nm. It was found that this aim is achieved by doping comprising a gallium compound, which in the wave range below 250 nm has a maximum of an absorption band and thus determines the edge wave range λc.
Abstract translation: 本发明涉及由掺杂石英玻璃制成的滤光材料，其在低掺杂浓度下表现出尽可能高的至少80％cm -1的光谱透射率，用于操作254nm的辐射，在波中尽可能低的透射 范围在250nm以下，边缘波长λc在230〜250nm的波长范围内。 发现该目的通过掺杂包括镓化合物来实现，该镓化合物在250nm以下的波长范围内具有最大吸收带，从而确定边缘波长λc。
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公开(公告)号：US07989378B2
公开(公告)日：2011-08-02
申请号：US12824923
申请日：2010-06-28
Applicant: Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
Inventor： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
CPC classification number: C03B19/1453 , C03B19/1461 , C03B32/00 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/40 , C03C2201/42 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.
Abstract translation: 本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。 本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO2的二氧化硅玻璃，其温度范围为 的热膨胀为0±5ppb /℃，为5℃以上。
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128.发明授权Doped silica glass articles and methods of forming doped silica glass boules and articles 有权掺杂的二氧化硅玻璃制品和形成掺杂的石英玻璃微珠和制品的方法公开(公告)号：US07589040B2
公开(公告)日：2009-09-15
申请号：US11589584
申请日：2006-10-30
Applicant: Steven B. Dawes , Richard M. Fiacco , Kenneth E. Hrdina , Michael H. Wasilewski
Inventor： Steven B. Dawes , Richard M. Fiacco , Kenneth E. Hrdina , Michael H. Wasilewski
IPC: C03C3/06
CPC classification number: C03B19/06 , C03B19/02 , C03B19/12 , C03B2201/42 , C03C3/06 , C03C2201/42 , C03C2203/20
Abstract: The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal expansion of between about −30 ppb/° C. and about +30 ppb/° C. at a temperature between 15° C. and 30° C.; and a variation in coefficient of thermal expansion of less than about 5 ppb/° C. at a temperature between 15° C. and 30° C.
Abstract translation: 本发明提供了具有低热膨胀和低膨胀变化的掺杂二氧化钛掺杂二氧化硅玻璃制品。 根据本发明的一个实施方案，二氧化钛掺杂的石英玻璃制品的二氧化钛含量为约5重量％至约9重量％; 在15℃和30℃之间的温度下，约30ppb /℃和约+ 30ppb /℃之间的热膨胀系数。 和在15℃至30℃之间的温度下热膨胀系数的变化小于约5ppb /℃。
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公开(公告)号：US07485593B2
公开(公告)日：2009-02-03
申请号：US11874373
申请日：2007-10-18
Applicant: Masanobu Ezaki , Masashi Kobata , Sachiko Kato
Inventor： Masanobu Ezaki , Masashi Kobata , Sachiko Kato
CPC classification number: B82Y40/00 , B82Y10/00 , C03C3/06 , C03C4/0085 , C03C2201/42 , G03F1/24 , G03F1/60
Abstract: To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirror material in extreme ultraviolet ray lithography, and which is excellent in homogeneity within the field and stability.Titania-silica glass is used which has 8 to 10% by weight of titania and 90 to 92% by weight of silica, where a Ti3+ concentration is 10 to 60 ppm by weight.
Abstract translation: 为了提供作为低热膨胀的透明玻璃的二氧化钛 - 二氧化硅玻璃，特别是在0〜100℃的宽的温度范围（工作温度范围）中作为 光掩模或极光紫外线光刻中的镜面材料，其在场内的均匀性和稳定性方面优异。 使用二氧化钛 - 二氧化硅玻璃，其具有8至10重量％的二氧化钛和90至92重量％的二氧化硅，其中Ti 3+浓度为10至60重量ppm。
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130.发明授权公开(公告)号：US07462574B2
公开(公告)日：2008-12-09
申请号：US11174533
申请日：2005-07-06
Applicant: Yasutomi Iwahashi , Akio Koike
Inventor： Yasutomi Iwahashi , Akio Koike
CPC classification number: C03C3/06 , C03B19/1484 , C03B2201/42 , C03C4/0085 , C03C2201/42
Abstract: A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.
Abstract translation: 含有TiO 2的二氧化硅玻璃，其特征在于，在至少一个平面中，在30mm×30mm的面积内，折射率（Deltan）的波动至多为2×10 -4。 含有TiO 2的二氧化硅玻璃，其特征在于TiO 2浓度为1质量％以上，条纹间距为10μm以下。 一种用于EUV光刻的光学材料，其特征在于它由含有TiO 2的二氧化硅玻璃制成，并且在垂直于入射光方向的平面中折射率（Deltan）的波动为至多2×10 -4。 一种用于EUV光刻的光学材料，其特征在于，其由TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且TiO 2浓度的最大值和最小值之间的差为至多0.06 在垂直于入射光方向的平面中的质量％。
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