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公开(公告)号：US08746903B2
公开(公告)日：2014-06-10
申请号：US13392453
申请日：2010-08-27
Applicant: Marcos Bavdaz
Inventor： Marcos Bavdaz
CPC classification number: G21K1/06 , G21K2201/064 , G21K2201/067 , Y10T156/1002
Abstract: The invention relates to a method for assembling two or more mirror plate stacks into a rigid unit in turn comprising a plurality of mirror plates and a base plate onto which the plurality of mirror plates are stacked. To improve assembly accuracy of the mirror plates, a base plate is provided with a first mirror plate mounted thereto, a handling tool is provided with a second mirror plate and a spacer is provided to a first surface of the second mirror plate and positioned to align the second mirror plate with the first mirror plate. This alignment is based on a measured position and shape of the first mirror plate to compensate for a deviation from a pre-defined position and shape. The plates are then attached to each other with the spacer; the handling tool is removed and the position and shape of the second mirror plate is measured.
Abstract translation: 本发明涉及一种用于将两个或更多个反射镜板组合成刚性单元的方法，该刚性单元依次包括多个反射镜板和多个反射镜板堆叠在其上的基板。 为了提高镜板的装配精度，底板设置有安装在其上的第一镜板，处理工具设置有第二镜板，并且间隔件设置在第二镜板的第一表面上并且被定位成对齐 第二个镜面板与第一个镜面板。 该对准基于第一镜板的测量位置和形状，以补偿与预定义位置和形状的偏差。 然后将板用间隔件彼此连接; 拆卸搬运工具，测定第二镜板的位置和形状。
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122.发明授权Grazing incidence collector optical systems for EUV and X-ray applications 有权用于EUV和X射线应用的掠入射收集器光学系统公开(公告)号：US08594277B2
公开(公告)日：2013-11-26
申请号：US12735525
申请日：2009-01-28
Applicant: Fabio Zocchi , Pietro Binda , Enrico Benedetti
Inventor： Fabio Zocchi , Pietro Binda , Enrico Benedetti
IPC: G21K1/06
CPC classification number: G03F7/70166 , G21K1/06 , G21K2201/064
Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
Abstract translation: 公开了一种用于EUV和X射线应用的收集器光学系统，其中所述系统包括以嵌套配置布置的关于光轴对称的多个反射镜。 反射镜具有第一和第二反射表面，其提供来自辐射源的辐射的连续掠入射反射。 第一和第二反射表面具有补偿辐射的远场强度分布中的高空间频率变化的校正形状。
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123.发明授权公开(公告)号：US08592787B2
公开(公告)日：2013-11-26
申请号：US13437678
申请日：2012-04-02
Applicant: Masato Moriya , Osamu Wakabayashi , Georg Soumagne
Inventor： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
IPC: G21K5/04
CPC classification number: G02B5/1838 , G02B5/0891 , G02B5/1857 , G03F7/70575 , G21K1/065 , G21K2201/064
Abstract: An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
Abstract translation: EUV光源被配置为产生用于曝光装置的EUV光。 所述EUV光源包括室，被配置为将靶供给到所述室中的目标供给装置，用于将来自驱动器激光器的激光引入所述室并且用所述激光照射所述靶的光学系统，以将所述靶转换成等离子体 哪个EUV光被发射，并且在室中的EUV收集器反射镜。 EUV收集器反射镜可以包括具有凹槽的多层反射表面并且将来自等离子体的EUV光收集到焦点。 凹槽可以以同心的方式布置，并且被配置为至少衍射与来自驱动器激光器的激光的波长相同的光。
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124.发明申请Source-collector modules for EUV lithography employing a GIC mirror and a LPP source 有权用于采用GIC镜和LPP光源的EUV光刻的源极集电极模块公开(公告)号：US20130207004A1
公开(公告)日：2013-08-15
申请号：US13761189
申请日：2013-02-07
Applicant: Media Lario, S.R.L.
Inventor： Natale M. Ceglio , Daniel STEARNS , Jacques KOOLS , Giuseppe VALSECCHI , Fabio ZOCCHI , Riccardo BINDA
CPC classification number: H05G2/005 , G02B5/203 , G02B19/0095 , G02B27/425 , G03F7/70033 , G03F7/70166 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G21K1/067 , H05G2/008 , G21K2201/06 , G21K2201/064
Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
Abstract translation: 公开了用于EUV光刻系统的源极集电极模块，其中源极 - 集电极模块采用激光产生的等离子体EUV辐射源和放电入射收集器。 通过首先形成低密度等离子体，然后用足够强度的红外辐射照射低密度等离子体来产生EUV辐射源，以产生最终的EUV发射等离子体。 掠入射收集器可以包括被配置为防止红外辐射到达中间焦点的光栅。 使用碎片减轻装置可以保持源 - 收集器模块的使用寿命。
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125.发明申请公开(公告)号：US20130068969A1
公开(公告)日：2013-03-21
申请号：US13619837
申请日：2012-09-14
Applicant: Doug Childers
Inventor： Doug Childers
IPC: G21K5/00
CPC classification number: G21K5/00 , C03C25/12 , F26B3/28 , F26B13/00 , G21K1/067 , G21K2201/064 , G21K2201/065
Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.
Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。
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Patent Agency Ranking
公开(公告)号：US08338809B2
公开(公告)日：2012-12-25
申请号：US13164745
申请日：2011-06-20
Applicant: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
Inventor： Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC classification number: G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
Abstract translation: 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面，并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
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公开(公告)号：US20120256105A1
公开(公告)日：2012-10-11
申请号：US13494778
申请日：2012-06-12
Applicant: Masato MORIYA , Osamu Wakabayashi , Georg Soumagne
Inventor： Masato MORIYA , Osamu Wakabayashi , Georg Soumagne
IPC: G21K5/00
CPC classification number: H05G2/003 , B82Y10/00 , G03F7/70575 , G21K1/062 , G21K2201/061 , G21K2201/064 , G21K2201/067
Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.
Abstract translation: 曝光装置只能将EUV辐射提供给掩模，同时消除EUV辐射以外的辐射。 在反射镜的前表面上设置由多个Mo / Si对层制成的多层，并且在该多层中形成闪耀的凹槽。 从光源装置入射的辐射入射在该反射镜上并被反射或衍射。 由于反射的EUV辐射（包括衍射的EUV辐射）和其他波长的辐射在不同的角度被反射或衍射，因此它们的进展方向是不同的。 通过用孔和/或自卸车消除其它波长的辐射，可以仅用高纯度的EUV辐射照射掩模。
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128.发明申请公开(公告)号：US20120248342A1
公开(公告)日：2012-10-04
申请号：US13437678
申请日：2012-04-02
Applicant: Masato MORIYA , Osamu Wakabayashi , Georg Soumagne
Inventor： Masato MORIYA , Osamu Wakabayashi , Georg Soumagne
IPC: G21K5/04
CPC classification number: G02B5/1838 , G02B5/0891 , G02B5/1857 , G03F7/70575 , G21K1/065 , G21K2201/064
Abstract: An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
Abstract translation: EUV光源被配置为产生用于曝光装置的EUV光。 所述EUV光源包括室，被配置为将靶供给到所述室中的目标供给装置，用于将来自驱动器激光器的激光引入所述室并且用所述激光照射所述靶的光学系统，以将所述靶转换成等离子体 哪个EUV光被发射，并且在室中的EUV收集器反射镜。 EUV收集器反射镜可以包括具有凹槽的多层反射表面并且将来自等离子体的EUV光收集到焦点。 凹槽可以以同心的方式布置，并且被配置为至少衍射与来自驱动器激光器的激光的波长相同的光。
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公开(公告)号：US08235769B2
公开(公告)日：2012-08-07
申请号：US11989960
申请日：2006-08-03
Applicant: Yuzo Mori
Inventor： Yuzo Mori
IPC: B24B49/00
CPC classification number: G21K1/06 , B23H5/04 , B23H7/38 , B23K15/00 , B24B31/10 , B24C1/08 , G21K2201/064 , G21K2201/067 , Y10S451/908
Abstract: To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process. After the exposure of the workpiece in its working face to an electron beam to conduct modification so that the machining speed of the surface layer part in the working face is substantially even, ultraprecision smoothening is carried out by working process.
Abstract translation: 提供一种能够实现包括玻璃陶瓷材料在内的工件的超精密加工的电子束辅助EEM方法，其中在加工过程中以加工速度彼此不同的至少两种组分材料以精细混合状态存在，并且表面状态 不均匀，表面粗糙度为0.2〜0.05nm RMS。 EEM方法包括工作过程，其中允许工件和化学反应性微粒沿着工作面流动，以通过细颗粒与细颗粒之间的化学相互作用将微粒与化学键合的工作面上的原子除去 工作面界面。 工件包括以精加工的混合状态存在并且在加工过程中以加工速度彼此不同的至少两种组分材料。 在将工件的工作面暴露于电子束进行变形，使得工作面中的表层部的加工速度基本均匀的情况下，通过加工工序进行超精密平滑化。
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公开(公告)号：US20120182634A1
公开(公告)日：2012-07-19
申请号：US13392453
申请日：2010-08-27
Applicant: Marcos Bavdaz
Inventor： Marcos Bavdaz
CPC classification number: G21K1/06 , G21K2201/064 , G21K2201/067 , Y10T156/1002
Abstract: The invention relates to a method for assembling a mirror plate stack 30 comprising a plurality of mirror plates 10 and a base plate 13 onto which the plurality of mirror plates are stacked. Additionally, the invention relates to a method for assembling two or more mirror plate stacks into a rigid unit. In order to improve the assembly accuracy of the mirror plates, it is proposed that the method comprises the steps of providing a base plate 13 with a first mirror plate mounted thereto; providing a handling tool with a second mirror plate; providing a spacer to a first surface of the second mirror plate; positioning the handling tool comprising the second mirror plate with the spacer to align the second mirror plate with the first mirror plate, wherein the second mirror plate is aligned relative to the first mirror plate based on a measured position and shape of the first mirror plate to compensate a deviation of the measured position and shape of the first mirror plate from a pre-defined position and shape of the first mirror plate; attaching the second mirror plate to the first mirror plate by bonding the spacer to the first mirror plate, wherein the spacer determines a pre-defined distance between the first and the second mirror plates; exposing a second surface of the second mirror plate by removing the handling tool from the attached second mirror plate; and measuring the position and shape of the attached second mirror plate after the second surface has been exposed.
Abstract translation: 本发明涉及一种组装反光板叠层30的方法，所述镜板组30包括多个镜板10和底板13，所述多个镜板堆叠在该底板上。 另外，本发明涉及一种用于将两个或多个镜板组装配成刚性单元的方法。 为了提高镜板的装配精度，提出了该方法包括以下步骤：为基板13提供安装在其上的第一镜板; 提供具有第二镜板的处理工具; 在所述第二镜板的第一表面上设置间隔件; 将包括第二镜板的处理工具定位成具有间隔件以使第二镜板与第一镜板对准，其中第二镜板相对于第一镜板基于第一镜板的测量位置和形状对准 将第一镜板的测量位置和形状与第一镜板的预定位置和形状的偏差补偿; 通过将间隔件接合到第一镜板将第二镜板附接到第一镜板，其中间隔件确定第一和第二镜板之间的预定义距离; 通过从附接的第二镜板上移除操作工具来暴露第二镜板的第二表面; 并且在第二表面已经暴露之后测量附接的第二镜板的位置和形状。
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