公开(公告)号：DE602004019835D1

公开(公告)日：2009-04-23

申请号：DE602004019835

申请日：2004-04-20

Applicant: ASML NETHERLANDS BV

Inventor： GILLISEN NOUD JAN ,  OTTENS JOOST JEROEN ,  VEN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRICUS

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/027 ,  H01L21/68

Abstract: A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.

公开(公告)号：NL1035995A1

公开(公告)日：2009-03-31

申请号：NL1035995

申请日：2008-09-29

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BIJVOET DIRK-JAN ,  ZOUW GERBRAND VAN DER ,  JONG FREDERIK EDUARD DE

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：DE602004017380D1

公开(公告)日：2008-12-11

申请号：DE602004017380

申请日：2004-04-29

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MARIA ,  VAN MEER ASCHWIN LODEWIJK HENDRICUS JOHANNES ,  VAN EMPEL TJARKO ADRIAAN RUDOLF ,  MIEDEMA JAN REIN ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/027

Abstract: A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (2) for holding a substrate (1) said substrate holder (2) provided with means to provide a holding force for pressing the substrate against the substrate holder; releasing means (4) for ejecting said substrate (1) from said holder (2) against said holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. According to the invention, the lithographic projection apparatus comprises a controller (5) for controlling said releasing means (4) so as to release said substrate (1) from said holder (2) with a release force that is reduced preceding to final release.

公开(公告)号：SG122003A1

公开(公告)日：2006-05-26

申请号：SG200506798

申请日：2005-10-19

Applicant: ASML NETHERLANDS BV

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  MEER VAN ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  GOMPEL VAN EDWIN AUGUSTINUS MA

Abstract: An apparatus including a support table (WT) for supporting a substrate (W) is disclosed. The support table includes a plurality of support pr

公开(公告)号：SG112968A1

公开(公告)日：2005-07-28

申请号：SG200407386

申请日：2004-11-18

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  NEERHOF HENDRIK ANTONY JOHANNE ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  LE KLUSE MARCO

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.

公开(公告)号：SG111314A1

公开(公告)日：2005-05-30

申请号：SG200407087

申请日：2004-11-02

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: H01L21/027 ,  G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; an article support (1) for supporting a flat article to be placed in a beam path of said projection beam of radiation on said article support (1), comprising a plurality of supporting protrusions (2), said plurality of protrusions (2) defining a support zone (3) for providing a flat plane of support; and a backfill gas feed comprising a backfill gas discharge zone (8) arranged in said support zone (3) for feeding backfill gas to a backside of said article when supported by said article support (1), for providing an improved thermal conduction between said article and said article support (1). According to the invention, said backfill gas discharge zone (8) substantially encloses said support zone (3).