公开(公告)号：SG125948A1

公开(公告)日：2006-10-30

申请号：SG200401666

申请日：2004-03-26

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  ELP VAN JAN ,  HOOGKAMP JAN FREDERIK ,  MEER VAN ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPNAJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  BERG VAN DEN JOHANNES CHARLES ,  SANDE VAN DE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B25J15/00 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/68 ,  H01L21/683 ,  H02N13/00

Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure maybe a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus maybe cleaned with one single substrate only.

公开(公告)号：SG122003A1

公开(公告)日：2006-05-26

申请号：SG200506798

申请日：2005-10-19

Applicant: ASML NETHERLANDS BV

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  MEER VAN ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  GOMPEL VAN EDWIN AUGUSTINUS MA

Abstract: An apparatus including a support table (WT) for supporting a substrate (W) is disclosed. The support table includes a plurality of support pr

公开(公告)号：SG121753A1

公开(公告)日：2006-05-26

申请号：SG200300099

申请日：2003-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEERENS GERT-JAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  SPANJERS FRANCISCUS ANDREAS CO ,  MEER VAN ASCHWIN LODEWIJK HEND ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool.