Systems and methods for three-dimensional lithography and nano-indentation
    132.
    发明申请
    Systems and methods for three-dimensional lithography and nano-indentation 审中-公开
    三维光刻和纳米压痕的系统和方法

    公开(公告)号:US20050257709A1

    公开(公告)日:2005-11-24

    申请号:US10699287

    申请日:2003-10-31

    Abstract: Systems and methods for three dimensional lithography, nano-indentation, and combinations thereof are disclosed. One exemplary three dimensional lithography method, among others, includes: providing a substrate having at least one optical element, wherein the optical element is selected from a refractive element and a diffractive element; disposing a polymer layer on the substrate and the at least one optical element, wherein the polymer layer includes a polymer material selected from a positive-tone polymer material and a negative-tone polymer material; positioning a mask adjacent the polymer layer, wherein the mask does not cover at least one directly exposed portion of the polymer material directly overlaying the at least one element; and exposing the at least one directly exposed portion of the polymer material to optical energy, wherein the optical energy passes through the at least one directly exposed portion of the polymer material and interacts with the element, and the element redirects the optical energy through the polymer material forming at least one area of indirectly exposed polymer material.

    Abstract translation: 公开了用于三维光刻,纳米压痕及其组合的系统和方法。 一种示例性的三维光刻方法,其中包括:提供具有至少一个光学元件的衬底,其中所述光学元件选自折射元件和衍射元件; 在所述基板和所述至少一个光学元件上设置聚合物层,其中所述聚合物层包括选自正性聚合物材料和负性聚合物材料的聚合物材料; 将掩模定位在所述聚合物层附近,其中所述掩模不覆盖直接覆盖所述至少一个元件的聚合物材料的至少一个直接暴露部分; 并且将所述聚合物材料的至少一个直接暴露部分暴露于光能,其中所述光能通过所述聚合物材料的所述至少一个直接暴露部分并且与所述元件相互作用,并且所述元件将所述光能重定向通过所述聚合物 形成间接暴露的聚合物材料的至少一个区域的材料。

    Method for integrating micro and nanoparticles into MEMS and apparatus including the same
    133.
    发明申请
    Method for integrating micro and nanoparticles into MEMS and apparatus including the same 有权
    将微纳米颗粒与微纳米颗粒整合到MEMS中的方法及包括其的设备

    公开(公告)号:US20050247989A1

    公开(公告)日:2005-11-10

    申请号:US11182906

    申请日:2005-07-18

    Abstract: MEMs devices are integrally fabricated with included micro or nanoparticles by providing a mixture of a sacrificial material and a multiplicity of particles, disposing the mixture onto a substrate, fabricating a MEMs structure on the substrate including at least part of the mixture, so that at least some of the mixture is enclosed in the MEMs structure, removing the sacrificial material, and leaving at least some of the multiplicity of particles substantially free and enclosed in the MEMs structure. The step of fabricating a MEMs structure is quite general and is contemplated as including one or a multiplicity of additional steps for creating some type of structure in which the particles, which may be microbeads or nanobeads, are included. A wide variety of useful applications for MEMs integrated with micro or nanoparticles are available.

    Abstract translation: 通过提供牺牲材料和多个颗粒的混合物将MEM装置与包含的微型或纳米颗粒整体制造,将混合物设置在衬底上,在包括至少部分混合物的衬底上制造MEM结构,使得至少 一些混合物被包封在MEMs结构中,去除牺牲材料,并且使至少一些多个颗粒基本上自由并且封闭在MEM结构中。 制造MEMs结构的步骤是相当普遍的,并且被设想为包括用于产生某些类型的结构的一个或多个附加步骤,其中可以包括可以是微珠或纳米珠的颗粒。 可以使用与微型或纳米颗粒集成的MEM的各种有用的应用。

    Micro electro-mechanical system with one or more moving parts method and apparatus
    137.
    发明授权
    Micro electro-mechanical system with one or more moving parts method and apparatus 失效
    具有一个或多个移动部件的微机电系统方法和装置

    公开(公告)号:US06777629B2

    公开(公告)日:2004-08-17

    申请号:US10156780

    申请日:2002-05-08

    Abstract: A meso-scale MEMS device having a movable member (51) is formed using standard printed wiring board and high density interconnect technologies and practices. In one embodiment, sacrificial material disposed about the movable member (51) is removed through openings (101, 102) as formed through a cover (91) to form a cavity (121) that retains and limits the freedom of movement of the movable member (51). The movable member can support a reflective surface (224) to thereby provide a mechanism that will support a projection display and/or image scanner (such as a bar code scanner).

    Abstract translation: 使用标准印刷线路板和高密度互连技术和实践形成具有可移动部件(51)的中尺度MEMS器件。 在一个实施例中,围绕可移动构件(51)设置的牺牲材料通过通过盖(91)形成的开口(101,102)去除以形成空腔(121),其保持并限制可移动构件 (51)。 可移动构件可以支撑反射表面(224),从而提供将支撑投影显示和/或图像扫描器(例如条形码扫描器)的机构。

    Trilayered beam MEMS device and related methods
    138.
    发明申请
    Trilayered beam MEMS device and related methods 有权
    三层梁MEMS器件及相关方法

    公开(公告)号:US20030119221A1

    公开(公告)日:2003-06-26

    申请号:US10290920

    申请日:2002-11-08

    Applicant: Coventor, Inc.

    Abstract: Trilayered Beam MEMS Device and Related Methods. According to one embodiment, a method for fabricating a trilayered beam is provided. The method can include depositing a sacrificial layer on a substrate and depositing a first conductive layer on the sacrificial layer. The method can also include forming a first conductive microstructure by removing a portion of the first conductive layer. Furthermore, the method can include depositing a structural layer on the first conductive microstructure, the sacrificial layer, and the substrate and forming a via through the structural layer to the first conductive microstructure. Still furthermore, the method can include the following: depositing a second conductive layer on the structural layer and in the via; forming a second conductive microstructure by removing a portion of the second conductive layer, wherein the second conductive microstructure electrically communicates with the first conductive microstructure through the via; and removing a sufficient amount of the sacrificial layer so as to separate the first conductive microstructure from the substrate, wherein the structural layer is supported by the substrate at a first end and is freely suspended above the substrate at an opposing second end.

    Abstract translation: 三层梁MEMS器件及相关方法。 根据一个实施例,提供一种制造三层梁的方法。 该方法可以包括在衬底上沉积牺牲层并在牺牲层上沉积第一导电层。 该方法还可以包括通过去除第一导电层的一部分来形成第一导电微结构。 此外,该方法可以包括在第一导电微结构,牺牲层和衬底上沉积结构层,并且通过结构层将通孔形成到第一导电微结构。 此外,该方法可以包括以下:在结构层和通孔中沉积第二导电层; 通过去除所述第二导电层的一部分来形成第二导电微结构,其中所述第二导电微结构通过所述通孔与所述第一导电微结构电连通; 以及去除足够量的牺牲层以便将第一导电微结构与衬底分开,其中结构层在第一端由衬底支撑并且在相对的第二端处自由地悬挂在衬底上方。

    Method for removing a sacrificial material with a compressed fluid
    140.
    发明申请
    Method for removing a sacrificial material with a compressed fluid 有权
    用压缩流体去除牺牲材料的方法

    公开(公告)号:US20030047533A1

    公开(公告)日:2003-03-13

    申请号:US10167272

    申请日:2002-06-10

    Abstract: A method comprises depositing an organic material on a substrate; depositing additional material different from the organic material after depositing the organic material; and removing the organic material with a compressed fluid. Also disclosed is a method comprising: providing an organic layer on a substrate; after providing the organic layer, providing one or more layers of a material different than the organic material of the organic layer; removing the organic layer with a compressed fluid; and providing an anti-stiction agent with a compressed fluid to material remaining after removal of the organic layer.

    Abstract translation: 一种方法包括在衬底上沉积有机材料; 在沉积有机材料之后沉积与有机材料不同的附加材料; 并用压缩流体除去有机材料。 还公开了一种方法,包括:在衬底上提供有机层; 在提供有机层之后,提供与有机层的有机材料不同的一层或多层材料; 用压缩流体去除有机层; 并且在去除有机层之后向剩余的材料提供具有压缩流体的抗静电剂。

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