公开(公告)号：WO01096253A1

公开(公告)日：2001-12-20

申请号：PCT/US2001/017326

申请日：2001-05-30

IPC: C03B23/047 ,  C03B37/012 ,  C03B37/014 ,  C03B37/018 ,  C03B37/027 ,  C03B37/07

CPC classification number: C03B37/01413 ,  C03B37/0124 ,  C03B37/01426 ,  C03B37/01466 ,  C03B37/01823 ,  C03B37/01861 ,  C03B2201/02 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/42 ,  C03B2203/22

Abstract: A plasma torch (40) deposits silica on a target rod (30). The torch (40) traverses along the lathe (24) multiple times, so as to build up the preform (34).

Abstract translation: 等离子体焰炬（40）将二氧化硅沉积在靶棒（30）上。 割枪（40）多次沿着车床（24）移动，以便建立预成型件（34）。

公开(公告)号：WO01017919A1

公开(公告)日：2001-03-15

申请号：PCT/US2000/024776

申请日：2000-09-08

IPC: C03B20/00 ,  C01B33/12 ,  C03B5/43 ,  C03B8/04 ,  C03B19/14 ,  C04B35/10 ,  F27B9/26 ,  F27B17/00 ,  F27D1/00 ,  F27D1/02 ,  F27D3/00 ,  C03B37/018 ,  C03B37/01

CPC classification number: C04B35/10 ,  C03B19/1407 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/50 ,  F27B9/26 ,  F27B17/00 ,  F27D1/0006 ,  F27D1/0043 ,  F27D3/0033

Abstract: An article of relatively pure silica, and a furnace (50) and method of producing the article. The article is produced by collecting molten silica particles (30) in a refractory furnace (50) in which at least a portion of the refractory (32) has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory (32).

Abstract translation: 相对纯的二氧化硅制品，炉（50）和制品的制造方法。 该制品通过将熔融二氧化硅颗粒（30）在耐火炉（50）中收集，其中耐火材料（32）的至少一部分暴露于含卤素的气体以与耐火材料中的污染金属离子反应（ 32）。

公开(公告)号：WO01008163A1

公开(公告)日：2001-02-01

申请号：PCT/US2000/018798

申请日：2000-07-10

IPC: C03B8/04 ,  C03B20/00 ,  C03C17/36 ,  G02B5/08 ,  G02B5/10 ,  G02B5/26 ,  G02B5/28 ,  G02B17/06 ,  G03F1/00 ,  G03F1/24 ,  G03F1/60 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027 ,  G21K5/00 ,  C23C14/02 ,  C23C28/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/42 ,  G02B5/0891 ,  G02B17/0615 ,  G02B17/0636 ,  G03F1/24 ,  G03F1/60 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation lambda from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation lambda produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation lambda . A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

Abstract translation: 用于制造集成电路和具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照明级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。 保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。

公开(公告)号：WO1998000372A2

公开(公告)日：1998-01-08

申请号：PCT/US1997009988

申请日：1997-06-09

Applicant: CORNING INCORPORATED ,  BURKE, Gerald, E. ,  TRUESDALE, Carlton, M.

Inventor： CORNING INCORPORATED

IPC: C03C00/00

CPC classification number: C03B37/01413 ,  C03B37/01446 ,  C03B2201/42 ,  C03C13/045

Abstract: The present invention is directed to a process for forming a preform suitable for consolidation to a glass blank for producing an optical waveguide fiber. The preform comprises a core portion and an inner cladding layer surrounding the core portion and contains SiO2 and TiO2. A portion of the TiO2 in the preform is in a crystalline form that is predominantly rutile. In addition to SiO2 and TiO2, the preform contains an additive compound that is preferentially sacrificed instead of TiO2 when the preform is consolidated. The process includes oxidizing Si and Ti containing compounds as well as a precursor of the additive compound to form SiO2, TiO2, and the additive compound. The preform containing these materials is then formed. In addition, the preform can be converted to a glass blank by consolidation of the preform.

Abstract translation: 本发明涉及一种用于形成适合于固化到用于制造光波导纤维的玻璃坯料的预成型件的方法。 预型件包括芯部分和围绕芯部分的内包层，并且包含SiO 2和TiO 2。 预成型体中的一部分TiO 2为主要为金红石的结晶形式。 除了SiO 2和TiO 2之外，预成型体还含有当预制件被固结时优先牺牲代替TiO 2的添加剂化合物。 该方法包括氧化含Si和Ti的化合物以及添加剂化合物的前体以形成SiO 2，TiO 2和添加剂化合物。 然后形成包含这些材料的预成型体。 此外，通过预成型件的固结，可以将预制件转化为玻璃坯料。

公开(公告)号：US11987521B2

公开(公告)日：2024-05-21

申请号：US17136642

申请日：2020-12-29

Applicant: Carl Zeiss SMT GmbH

Inventor： Eric Eva

IPC: C03C3/06 ,  G02B5/08 ,  G02B7/18 ,  C03C17/40

CPC classification number: C03C3/06 ,  G02B5/0891 ,  G02B7/181 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42

Abstract: In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates (51) or reflective optical elements (50), in particular for EUV lithography, with substrates (51) of this type, are proposed. These substrates (51), which have a surface region (511) with a reflective coating (54), are characterised in that, at least near to the surface region (511), the titanium-doped quartz glass has a proportion of Si—O—O—Si bonds of at least 1*1016/cm3 and/or a proportion of Si—Si bonds of at least 1*1016/cm3 or, along a notional line (513) perpendicular to the surface region (511), over a length (517) of 500 nm or more, a hydrogen content of more than 5×1018 molecules/cm3.

公开(公告)号：US20180127296A1

公开(公告)日：2018-05-10

申请号：US15348136

申请日：2016-11-10

Applicant: Goodrich Corporation

Inventor： Bari M. Southard ,  Matthew J. East ,  Daniel E. Dunn ,  Kramer Harrison

IPC: C03B19/01 ,  B33Y10/00 ,  B33Y80/00 ,  C03C8/02 ,  G02B5/10

CPC classification number: C03B19/01 ,  B33Y10/00 ,  B33Y80/00 ,  C03B19/06 ,  C03B2201/42 ,  C03C8/02 ,  C03C17/04 ,  C03C17/3417 ,  C03C23/0025 ,  C03C2218/32 ,  C03C2218/35 ,  G02B5/10

Abstract: A method of forming an optical component includes depositing slurry that includes glass powder material onto a facesheet and fusing the glass powder material to a facesheet to form a first core material layer on the facesheet. The method also includes successively fusing glass powder material in a plurality of additional core material layers to build a core material structure on the facesheet. The method can include selectively depositing slurry including glass powder material over only a portion of at least one of the facesheet, the first core material layer, and/or the one of the additional core material layers. Depositing the slurry can include extruding the slurry from an extruder.

公开(公告)号：US09878943B2

公开(公告)日：2018-01-30

申请号：US15471344

申请日：2017-03-28

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Robert Brett Desorcie ,  Hazel Benton Matthews, III ,  Pushkar Tandon

IPC: G02B6/036 ,  C03C25/66 ,  C03C25/10

CPC classification number: C03C25/66 ,  C03B37/01205 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/027 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/24 ,  C03C3/06 ,  C03C13/045 ,  C03C25/1061 ,  C03C25/1068 ,  C03C2201/11 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2203/54 ,  G02B6/02 ,  G02B6/021 ,  G02B6/03627 ,  G02B6/0365 ,  Y02P40/57

Abstract: The present disclosure is directed to a method of making an optical fiber with improved bend performance, the optical fiber having a core and at least one cladding layer, and a chlorine content in the in the last layer of the at least one cladding layer that is greater than 500 ppm by weight. The fiber is prepared using a mixture of a carrier gas, a gaseous chlorine source material and a gaseous reducing agent during the sintering of the last or outermost layer of the at least one cladding layer. The inclusion of the reducing gas into a mixture of the carrier gas and gaseous chlorine material reduces oxygen-rich defects that results in at least a 20% reduction in TTP during hydrogen aging testing.

公开(公告)号：US20170240454A1

公开(公告)日：2017-08-24

申请号：US15050589

申请日：2016-02-23

Applicant: Douglas Llewellyn Butler ,  Matthew John Dejneka ,  Daniel Warren Hawtof ,  Dale Robert Powers ,  Pushkar Tandon

Inventor： Douglas Llewellyn Butler ,  Matthew John Dejneka ,  Daniel Warren Hawtof ,  Dale Robert Powers ,  Pushkar Tandon

IPC: C03B37/027 ,  G02B6/10 ,  C03B37/018 ,  H01S3/063

CPC classification number: G02B6/10 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B23/037 ,  C03B23/047 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  H01S3/0632 ,  H01S3/17

Abstract: Layered glass structures and fabrication methods are described. The methods include depositing soot on a dense glass substrate to form a composite structure and sintering the composite structure to form a layered glass structure. The dense glass substrate may be derived from an optical fiber preform that has been modified to include a planar surface. The composite structure may include one or more soot layers. The layered glass structure may be formed by combining multiple composite structures to form a stack, followed by sintering and fusing the stack. The layered glass structure may further be heated to softening and drawn to control linear dimensions. The layered glass structure or drawn layered glass structure may be configured as a planar waveguide.

公开(公告)号：US09612525B2

公开(公告)日：2017-04-04

申请号：US15137954

申请日：2016-04-25

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/24 ,  C03B19/14 ,  C03C3/06 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/42 ,  Y02P40/57

Abstract: Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

公开(公告)号：US09580350B2

公开(公告)日：2017-02-28

申请号：US14921487

申请日：2015-10-23

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06 ,  C03C3/076 ,  C03C10/00 ,  C03B19/14 ,  C03B19/06 ,  C03B19/12 ,  C03B32/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/10 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/076 ,  C03C10/0009 ,  C03C2201/10 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2201/58 ,  C03C2203/54

Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.

Abstract translation: 超低膨胀二氧化钛 - 二氧化硅玻璃。 玻璃具有高羟基含量，并且任选地包括一种或多种掺杂剂。 代表性的可选掺杂剂包括硼，碱元素，碱土金属元素或诸如Nb，Ta，Al，Mn，Sn Cu和Sn的金属。 玻璃通过包括蒸汽固结以增加羟基含量的方法制备。 高羟基含量或掺杂剂和高羟基含量的组合降低了玻璃的假想温度，以提供具有非常低的热膨胀系数（CTE），低假想温度（Tf）和低膨胀斜率的玻璃。