Spectroscopic detector
    131.
    发明专利
    Spectroscopic detector 有权
    光谱检测器

    公开(公告)号:JP2012127901A

    公开(公告)日:2012-07-05

    申请号:JP2010281508

    申请日:2010-12-17

    Inventor: MIYAZONO YUYA

    CPC classification number: G01J3/00 G01J3/02 G01J3/0208 G01J3/28 G01J3/2803

    Abstract: PROBLEM TO BE SOLVED: To provide technology that compensates for a gap between a detected wavelength and a calculated wavelength derived from non-linearity of an emission angle from a spectroscopic element by using a simple configuration.SOLUTION: A spectroscopic detector 100 includes: a diffraction grating 1 for dispersing light IL; a photodetector 2 for detecting light (light R, light G and light B) dispersed by the diffraction grating 1; and a light collection optical system 3 that is arranged between the diffraction grating 1 and the photodetector 2 and collects the light dispersed by the diffraction grating 1 into the photodetector 2, for each wavelength. The light collection optical system 3 has such an optical characteristic that a chromatic aberration of magnification on the short-wavelength side is larger than a chromatic aberration of magnification on the long-wavelength side, and the chromatic aberration of magnification with the characteristic of this kind enables compensation for a detected wavelength gap derived from non-linearity of an emission angle generated at the diffraction grating 1.

    Abstract translation: 要解决的问题:提供通过使用简单的构造来补偿从分光元件的发射角的非线性导出的检测波长和计算出的波长之间的间隙的技术。 光谱检测器100包括:用于分散光IL的衍射光栅1; 用于检测由衍射光栅1分散的光(光R,光G和光B)的光电检测器2; 以及配置在衍射光栅1和光电检测器2之间的收集光学系统3,并且对于每个波长将由衍射光栅1分散的光聚集到光电检测器2中。 光收集光学系统3具有这样的光学特性:短波长侧的倍率色差大于长波长侧的倍率色像差,具有这种特性的倍率色像差 可以补偿从衍射光栅1产生的发射角的非线性导出的检测波长间隙。版权所有(C)2012,JPO&INPIT

    一种光信号接收器
    134.
    发明申请

    公开(公告)号:WO2016110014A1

    公开(公告)日:2016-07-14

    申请号:PCT/CN2015/076067

    申请日:2015-04-08

    Inventor: 潘建根

    CPC classification number: G01J1/00 G01J3/00

    Abstract: 公开了一种光信号接收器,在光电接收部件(1)上设置若干通光处(2),光电接收部件(1)和通光处(2)接收待测光信号,在同一光学接收面上实现多种光色性能的探测。通光处(2)以及光电接收部件(1)的紧凑设计,可有效减小空间光色分布不均匀带来的测量误差;此外,光电接收部件(1)和测量装置(3)之间可相互校正,进一步提高测量准确度。这种光信号接收器具有结构紧凑、测量准确度高、测试功能强大等特点,可广泛应用于各种高精度测量场合,特别是各种高精度小型/微型光学探测测试场合。

    MULTIPASS VIRTUALLY IMAGED PHASED ARRAY ETALON
    135.
    发明申请
    MULTIPASS VIRTUALLY IMAGED PHASED ARRAY ETALON 审中-公开
    多个虚拟的虚拟幻灯片ETALON

    公开(公告)号:WO2016077747A1

    公开(公告)日:2016-05-19

    申请号:PCT/US2015/060667

    申请日:2015-11-13

    Applicant: AVEDRO, INC.

    Abstract: An example system determines biomechanical properties of eye tissue. The system includes a confocal microscopy system configured to scan the incident light across a plurality of cross-sections of the tissue. The incident light is reflected by the plurality of cross-sections of tissue as scattered light. The system includes a spectrometer to receive the scattered light and provide spectral information for the scattered light. The system includes processor(s) to determine a Brillouin frequency shift from the spectral information and to generate a three-dimensional profile of the corneal tissue according to the Brillouin frequency shift. The three-dimensional profile provides an indicator of one or more biomechanical properties of the tissue. The spectrometer includes a multipass optical device that generates an interference pattern from the scattered light. The interference pattern provides the spectral information for the scattered light. The spectrometer includes a camera to detect the interference pattern from the optical device.

    Abstract translation: 示例系统确定眼组织的生物力学性质。 该系统包括配置成扫描穿过组织的多个横截面的入射光的共焦显微镜系统。 入射光被组织的多个横截面反射为散射光。 该系统包括用于接收散射光并提供散射光的光谱信息的光谱仪。 该系统包括从光谱信息确定布里渊频移并且根据布里渊频移产生角膜组织的三维轮廓的处理器。 三维轮廓提供组织的一个或多个生物力学性质的指示。 光谱仪包括从散射光产生干涉​​图案的多光学光学装置。 干涉图案为散射光提供光谱信息。 光谱仪包括用于检测来自光学装置的干涉图案的照相机。

    EMULSION DETECTION USING OPTICAL COMPUTING DEVICES
    136.
    发明申请
    EMULSION DETECTION USING OPTICAL COMPUTING DEVICES 审中-公开
    使用光学计算设备的乳液检测

    公开(公告)号:WO2015183310A1

    公开(公告)日:2015-12-03

    申请号:PCT/US2014/040266

    申请日:2014-05-30

    Abstract: Disclosed is the detection of emulsions and microdispersions with an optical computing device. One disclosed method includes emitting electromagnetic radiation from an electromagnetic radiation source, optically interacting the electromagnetic radiation with a fluid and thereby generating sample interacted radiation, detecting a portion of the sample interacted radiation with a reference detector arranged within an optical channel of an optical computing device, generating a reference signal with the reference detector, and determining an emulsive state of the fluid based on the reference signal.

    Abstract translation: 公开了使用光学计算装置检测乳液和微分散体。 一种公开的方法包括从电磁辐射源发射电磁辐射,将电磁辐射与流体光学相互作用,从而产生样品相互作用的辐射,用设置在光学计算装置的光学通道内的参考检测器检测样品相互作用的辐射的一部分 ,用参考检测器产生参考信号,以及基于参考信号确定流体的乳化状态。

    MULTI SPECTRAL VISION AID
    137.
    发明申请
    MULTI SPECTRAL VISION AID 审中-公开
    多光谱视力援助

    公开(公告)号:WO2013066157A1

    公开(公告)日:2013-05-10

    申请号:PCT/NL2012/000065

    申请日:2012-10-31

    Abstract: The present invention is in the field of multi spectrum vision aid, use thereof, and a method using the aid. The present invention relates in a first aspect to a multi spectrum vision aid comprising at least two transparent elements, in a second aspect to use thereof and in a third aspect to a method of distinguishing elements in a population.

    Abstract translation: 本发明涉及多光谱视觉辅助领域,其应用和使用该方法的方法。 本发明在第一方面涉及包括至少两个透明元件的多光谱视觉援助,在第二方面涉及其使用以及在第三方面涉及区分群体中元素的方法。

    LITHOGRAPHY METHOD AND APPARATUS
    138.
    发明申请
    LITHOGRAPHY METHOD AND APPARATUS 审中-公开
    LITHOGRAPHY方法和装置

    公开(公告)号:WO2012057707A1

    公开(公告)日:2012-05-03

    申请号:PCT/SG2011/000376

    申请日:2011-10-25

    Abstract: A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask 316 having an exposure pattern 332,334 for forming a three dimensional structure; (ii) exposing the first mask 316 to radiation to form the exposure pattern 332,334 on a radiation-sensitive resist 314; the exposure pattern 332,334 defined by irradiated areas 336 and non-irradiated areas 337 of the resist 314; (ii) providing a second mask 328; and (iii) during exposure, changing relative positions (arrows B and C) between the first mask 316 and the second mask 328 to shield selected portions of the irradiated areas 336 from radiation to enable varying depth profiles to be created in the three dimensional structure.

    Abstract translation: 本文公开了一种光刻方法和装置。 在所描述的实施例中,该方法包括(i)提供具有用于形成三维结构的曝光图案332,334的第一掩模316; (ii)将第一掩模316暴露于辐射以在辐射敏感抗蚀剂314上形成曝光图案332,334; 由曝光区域336和抗蚀剂314的未照射区域337限定的曝光图案332,334; (ii)提供第二掩模328; 和(iii)在曝光期间,改变第一掩模316和第二掩模328之间的相对位置(箭头B和C)以屏蔽被照射区域336的所选部分免受辐射,以使得能够在三维结构中产生变化的深度分布 。

    PHOTOSPECTROMETER
    139.
    发明申请
    PHOTOSPECTROMETER 审中-公开

    公开(公告)号:WO2009090263A1

    公开(公告)日:2009-07-23

    申请号:PCT/EP2009/050557

    申请日:2009-01-19

    CPC classification number: G01J3/00 G01J3/28 H01L27/14643 H01L31/1013

    Abstract: Impinging electromagnetic radiation generates pairs of majority and minority carriers in a substrate. A spectrometer device for detection of electromagnetic radiation impinging on a substrate comprises means for generating, in the substrate, a majority carrier current; at least one detection region for collecting generated minority carriers, the minority carriers being directed under influence of the majority carrier current; and means for determining spectral information based on minority carriers collected at the at least one detection region.

    Abstract translation: 发射电磁辐射在衬底中产生成对的多数和少数载流子。 用于检测照射在衬底上的电磁辐射的光谱仪装置包括用于在衬底中产生多数载流子电流的装置; 用于收集所生成的少数载体的至少一个检测区域,所述少数载体受多数载波电流的影响; 以及用于基于在所述至少一个检测区域收集的少数载波来确定频谱信息的装置。

    SYSTEM AND METHOD OF BROAD BAND OPTICAL END POINT DETECTION FOR FILM CHANGE INDICATION
    140.
    发明申请
    SYSTEM AND METHOD OF BROAD BAND OPTICAL END POINT DETECTION FOR FILM CHANGE INDICATION 审中-公开
    用于电影变化指示的宽带光端点检测系统和方法

    公开(公告)号:WO2003083522A2

    公开(公告)日:2003-10-09

    申请号:PCT/US2003/009666

    申请日:2003-03-26

    IPC: G02B

    Abstract: A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

    Abstract translation: 公开了一种用于在化学机械抛光工艺期间检测端点的系统和方法,其包括用第一宽光束照射晶片表面的第一部分。 接收到第一反射光谱数据。 数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。 具有第二宽光束的晶片表面的第二部分。 接收第二反射光谱数据。 数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。 将第一反射光谱数据归一化,并将第二反射光谱数据归一化。 基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

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