Abstract:
PROBLEM TO BE SOLVED: To provide technology that compensates for a gap between a detected wavelength and a calculated wavelength derived from non-linearity of an emission angle from a spectroscopic element by using a simple configuration.SOLUTION: A spectroscopic detector 100 includes: a diffraction grating 1 for dispersing light IL; a photodetector 2 for detecting light (light R, light G and light B) dispersed by the diffraction grating 1; and a light collection optical system 3 that is arranged between the diffraction grating 1 and the photodetector 2 and collects the light dispersed by the diffraction grating 1 into the photodetector 2, for each wavelength. The light collection optical system 3 has such an optical characteristic that a chromatic aberration of magnification on the short-wavelength side is larger than a chromatic aberration of magnification on the long-wavelength side, and the chromatic aberration of magnification with the characteristic of this kind enables compensation for a detected wavelength gap derived from non-linearity of an emission angle generated at the diffraction grating 1.
Abstract:
Gemäß verschiedenen Ausführungsbeispielen wird ein Verfahren zum Ermitteln einer nicht-therapeutischen Behandlung von Zähnen beschrieben, das das Anwenden eines Vitalfarbstoffs, der Plaque anfärbt, auf die Zähne, das Messen einer aus dem Vitalfarbstoff resultierenden Einfärbung der Zähne mittels eines optischen Sensors, das Ermitteln eines Plaque-Belastung der Zähne basierend auf der gemessenen Einfärbung, und das Ermitteln einer nicht-therapeutischen Behandlung der Zähne basierend auf der ermittelten Plaque-Belastung der Zähne aufweist.
Abstract:
In a method and apparatus (400), a property of an optically diffuse medium comprising a first optical absorber having a first concentration and a second optical absorber having a second concentration is determined. A surface area (406) of the medium is imaged at multiple wavelengths around an isosbestic wavelength of the first absorber and the second absorber. A reflectance spectrum of the medium at the surface area at the multiple wavelengths is determined. A derivative of the determined reflectance spectrum around the isosbestic wavelength is determined. From the derivative, a concentration ratio of the first concentration and the second concentration is estimated.
Abstract:
An example system determines biomechanical properties of eye tissue. The system includes a confocal microscopy system configured to scan the incident light across a plurality of cross-sections of the tissue. The incident light is reflected by the plurality of cross-sections of tissue as scattered light. The system includes a spectrometer to receive the scattered light and provide spectral information for the scattered light. The system includes processor(s) to determine a Brillouin frequency shift from the spectral information and to generate a three-dimensional profile of the corneal tissue according to the Brillouin frequency shift. The three-dimensional profile provides an indicator of one or more biomechanical properties of the tissue. The spectrometer includes a multipass optical device that generates an interference pattern from the scattered light. The interference pattern provides the spectral information for the scattered light. The spectrometer includes a camera to detect the interference pattern from the optical device.
Abstract:
Disclosed is the detection of emulsions and microdispersions with an optical computing device. One disclosed method includes emitting electromagnetic radiation from an electromagnetic radiation source, optically interacting the electromagnetic radiation with a fluid and thereby generating sample interacted radiation, detecting a portion of the sample interacted radiation with a reference detector arranged within an optical channel of an optical computing device, generating a reference signal with the reference detector, and determining an emulsive state of the fluid based on the reference signal.
Abstract:
The present invention is in the field of multi spectrum vision aid, use thereof, and a method using the aid. The present invention relates in a first aspect to a multi spectrum vision aid comprising at least two transparent elements, in a second aspect to use thereof and in a third aspect to a method of distinguishing elements in a population.
Abstract:
A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask 316 having an exposure pattern 332,334 for forming a three dimensional structure; (ii) exposing the first mask 316 to radiation to form the exposure pattern 332,334 on a radiation-sensitive resist 314; the exposure pattern 332,334 defined by irradiated areas 336 and non-irradiated areas 337 of the resist 314; (ii) providing a second mask 328; and (iii) during exposure, changing relative positions (arrows B and C) between the first mask 316 and the second mask 328 to shield selected portions of the irradiated areas 336 from radiation to enable varying depth profiles to be created in the three dimensional structure.
Abstract:
Impinging electromagnetic radiation generates pairs of majority and minority carriers in a substrate. A spectrometer device for detection of electromagnetic radiation impinging on a substrate comprises means for generating, in the substrate, a majority carrier current; at least one detection region for collecting generated minority carriers, the minority carriers being directed under influence of the majority carrier current; and means for determining spectral information based on minority carriers collected at the at least one detection region.
Abstract:
A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.