公开(公告)号：US09416040B2

公开(公告)日：2016-08-16

申请号：US14569535

申请日：2014-12-12

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  G02B5/10 ,  G03F7/20

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

公开(公告)号：US20160185645A1

公开(公告)日：2016-06-30

申请号：US14911506

申请日：2014-07-22

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stefan OCHS ,  Klaus BECKER ,  Stephan THOMAS

IPC: C03B19/14 ,  C03C4/00 ,  G03F1/52 ,  C03C3/00

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2204/00 ,  G03F1/52 ,  G03F1/60

Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例为Ti3 + / Ti4 +＆nlE; 5×10-4。

公开(公告)号：US20150218039A1

公开(公告)日：2015-08-06

申请号：US14604998

申请日：2015-01-26

Applicant: Corning Incorporated

Inventor： William R. Angell, IV ,  Sezhian Annamalai ,  Carlos Alberto Duran ,  John Edward Maxon

IPC: C03C3/076 ,  C03B19/09 ,  C03C3/06

CPC classification number: C03C3/076 ,  C03B19/09 ,  C03B19/1407 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/50 ,  C03C3/06 ,  C03C3/062 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2203/40 ,  G03F1/24 ,  G03F1/60

Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).

Abstract translation: 提供了一种用于极光紫外光刻（EUVL）的玻璃制品。 玻璃制品包括通过玻璃制品具有组成梯度的二氧化硅 - 二氧化钛玻璃，组成梯度由以下功能定义：[TiO 2] =（c + f（x，y，z））和[SiO 2] =（ 100- {c + f（x，y，z）}-δ（x，y，z））其中[TiO 2]是二氧化钛的重量浓度。 ％，[SiO2]是二氧化硅的重量浓度。 ％，c是以重量计的二氧化钛浓度。 对于预定的零交叉温度（Tzc），f（x，y，z）是三维空间中的函数，其定义以坐标（x，y，z）为中心的体积元素的平均成分的差异与 对于c而言，δ（x，y，z）是定义以坐标（x，y，z）为中心的体元素的所有其他分量的和的三维空间中的函数。

公开(公告)号：US20150183677A1

公开(公告)日：2015-07-02

申请号：US14660561

申请日：2015-03-17

Applicant: NIKON CORPORATION

Inventor： Toshio YOSHINARI

IPC: C03B19/14 ,  C03B11/08 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B11/08 ,  C03B19/1469 ,  C03B23/0493 ,  C03B32/005 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/80 ,  C03B2215/44 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44 ,  G03F1/60

Abstract: A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, includes: an ingot growing step of growing an SiO2—TiO2 based glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein the ingot growing step includes: a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO2—TiO2 based glass ingot grows until the ratio reaches a predetermined value; and a second step of gradually growing the SiO2—TiO2 based glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range.

Abstract translation: 通过直接法在靶材上制造SiO 2 -TiO 2基玻璃的方法包括：通过将硅化合物进料火焰水解生长具有预定长度的SiO 2 -TiO 2基玻璃锭的锭生长步骤， 钛化合物变成氢氧焰，其中所述锭生长步骤包括：第一步骤，当所述SiO 2 -TiO 2基玻璃锭生长直到所述比率达到时，增加所述钛化合物的进料速率与所述硅化合物的进料速率的比率 预定值 以及在比率达到规定值的情况下在第一阶段中将SiO 2 -TiO 2基玻璃锭逐渐生长的第二步骤，并将比例保持在预定范围内。

公开(公告)号：US08931307B2

公开(公告)日：2015-01-13

申请号：US13499352

申请日：2010-09-28

Applicant: Bodo Kuehn

Inventor： Bodo Kuehn

IPC: B32B17/00 ,  C03B23/13 ,  C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

公开(公告)号：US08789390B2

公开(公告)日：2014-07-29

申请号：US13044684

申请日：2011-03-10

Applicant: Windsor P Thomas ,  Daniel Warren Hawtof

Inventor： Windsor P Thomas ,  Daniel Warren Hawtof

IPC: C03B19/06

CPC classification number: C03B19/1492 ,  C03B19/1453 ,  C03B2201/31 ,  C03B2201/42 ,  C03B2201/58 ,  F42B10/46 ,  F42B15/34 ,  Y10T428/131 ,  Y10T428/1317

Abstract: A near-net or net shape fused silica glass article, such as a radome. The article is formed by depositing silica soot onto a mandrel having a shape that corresponds to the shape of the fused silica glass article. In some embodiments, the mandrel is inductively heated to a temperature that is sufficient to consolidate or sinter the silica soot upon deposition onto the mandrel to form fused silica glass. The fused silica glass article may have an outer layer that is under compression and/or multiple layers comprising various dopants that can alter or affect physical, mechanical, electrical, and/or optical properties.

Abstract translation: 近净或净形熔融石英玻璃制品，如天线罩。 该制品通过将二氧化硅烟灰沉积到具有对应于熔融石英玻璃制品的形状的形状的心轴上而形成。 在一些实施例中，心轴被感应加热到足以在沉积到心轴上时固化或烧结二氧化硅烟炱以形成熔融石英玻璃的温度。 熔融石英玻璃制品可以具有处于压缩下的外层和/或包含可以改变或影响物理，机械，电和/或光学性质的各种掺杂剂的多层。

公开(公告)号：US20140190212A1

公开(公告)日：2014-07-10

申请号：US14204009

申请日：2014-03-11

Applicant: CARL ZEISS SMT GMBH

Inventor： Wilfried CLAUSS

IPC: C03C23/00 ,  C03C17/00

CPC classification number: C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract translation: 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。

公开(公告)号：US20140155246A1

公开(公告)日：2014-06-05

申请号：US13835039

申请日：2013-03-15

Applicant: CORNING INCORPORATED

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: G03F1/22

CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃

公开(公告)号：US20130316890A1

公开(公告)日：2013-11-28

申请号：US13955409

申请日：2013-07-31

Applicant: ASAHI GLASS COMPANY, LIMITED

Inventor： Junko MIYASAKA ,  Tomonori Ogawa ,  Masahiro Kawagishi ,  Masaaki Takata

IPC: C03C3/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/42 ,  C03C2201/42 ,  C03C2203/40

Abstract: The present invention relates to a method for producing a silica glass body containing titania, containing: a flame hydrolysis step of feeding a silica (SiO2) precursor and a titania (TiO2) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania, in which in the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more.

Abstract translation: 本发明涉及含有二氧化钛的二氧化硅玻璃体的制造方法，其特征在于，含有将二氧化硅（SiO 2）前体和二氧化钛（TiO 2）前体供给到氢氧焰中的火焰水解工序，将火焰中的水解反应 形成二氧化钛的二氧化硅玻璃微粒，其中在火焰水解步骤中，二氧化硅前体的水解反应的反应速率为80％以上。

公开(公告)号：US08541325B2

公开(公告)日：2013-09-24

申请号：US13028472

申请日：2011-02-16

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

IPC: C03C3/06

CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G03F1/60 ,  G03F7/0002 ,  G03F7/70958

Abstract: In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.

Abstract translation: 在一个实施方案中，本公开涉及在340nm至840nm的波长下具有> 90％/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。 在另一个实施例中，在340nm至840nm的波长下，内透射率> 93％/ cm。 在另一个实施方案中，在340nm至840nm的波长下，内透射率> 95％/ cm。 在另一个实施方案中，本发明涉及一种二氧化硅 - 二氧化钛玻璃，其透射率通过玻璃制成的光学透镜在340nm至840nm的波长处> 84％。 在另一个实施例中，通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86％。 在另一实施例中，通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88％。 在另一个实施方案中，二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。