Abstract:
PURPOSE: A sputtering device is provided to achieve deposition of a large area at low temperature and enable treatment of a flexible substrate. CONSTITUTION: A sputtering device comprises a chamber(100), a loading unit, an inductive coupling plasma radiator(120), and a sputter gun(130). The loading unit is formed within the chamber and loads an object(112). The inductive coupling plasma radiator is formed on a side of the chamber and makes gas flowing in from outside into plasma to be provided to the chamber. The sputter gun is formed within the chamber and loads a target material ionized with the plasma.
Abstract:
PURPOSE: A composition for a sputtering target of an oxide semiconductor thin film, a method for manufacturing the sputtering target, and the sputtering target are provided to obtain a transparent oxide semiconductor film showing high mobility through a low-temperature process less than 300°C. CONSTITUTION: A method for manufacturing a sputtering target comprises the following steps: blending(S11) and crashing raw material powder consisting of aluminum oxide, zinc oxide, and tin oxide; molding(S12) the powder in a desired form; fist calcinating a molding product at 500 - 1000°C; pulverizing and mixing the molding product which is fist calcinated; and molding the mixed powder; sintering(S13) the molding product. Indium oxide is more included in the raw material powder.
Abstract:
PURPOSE: A method for manufacturing metal oxide nanoparticle is provided to be applicable in the plastic substrate weak on heat by forming a thin film at relatively low temperature in range of the room temperature to about 100°C. A manufacturing method of the metal oxide nanoparticle is provided to make an electric component including the metal oxide. CONSTITUTION: A method of manufacturing metal oxide nanoparticle comprises: a step(S11) of preparing an alcoholic solution including basic chemical species; a step(S12) of preparing a metal oxide precursor solution; a step(S13) of reacting the metal oxide precursor solution with the mixture of alcoholic solution to form metal oxide nanoparticle; a step(S14) of refining the metal oxide nanoparticle. The alcoholic solution comprises C1-C6 alcohol and basic chemical species is selected in the group consisting of LiOH, NaOH, KOH, NH4OH, their hydrate and their mixture.
Abstract:
PURPOSE: A method for preparing a ZTO thin film, a thin film transistor using the same and method for preparing the thin film transistor are provided increase the uniformity of a device by using an amorphous ZTO thin film as a channel layer. CONSTITUTION: In a method for preparing a ZTO thin film, a thin film transistor using the same and method for preparing the thin film transistor. The ZTO thin film is processed under 150- 450°C. An atomic ratio of the zinc is 4:1 or 2:1 at a deposition temperature less than 300°C and it is 4:1 to 1:4 under at a deposition temperature of 300 - 450°C. A source electrode, a drain electrode, a channel layer, a gate isolation layer, and a gate electrode are formed on the substrate.
Abstract:
A device for displaying an organic light emitting diode is provided to compensate for the deviation of the threshold voltage of transistor within the pixel structure without arranging the additional transistors within the pixel circuit. A device for displaying an organic light emitting diode comprises a display panel(210) and a driver circuit(220). The display panel has pixels. Each of the pixels has a transistor. The transistor is electrically and serially connected with the organic light-emitting diode. The transistor transmits the current to the organic light-emitting diode according to the data signal of the gate. The organic light-emitting diode is arranged between the first and the second power supply voltages with the transistor. The driver circuit drives the pixels by supplying the scan signal, the data signal, the first supply voltage and the second supply voltage to the display panel. The driver circuit has a threshold voltage variation calculation unit(221) and a power source voltage conversion unit(222). The threshold voltage variation calculation unit calculates the deviation between the threshold voltage and the standard threshold voltage of transistor.
Abstract:
A foldable display device using a transparent display is provided to output various images to respective transparent displays, thereby improving user's convenience. A transparent display unit(220) comprises a transparent display(222). The transparent display unit enables switching into a transparent mode transmitting light or a display mode outputting image data. A control unit(210) sets the transparent display in the transparent mode or the display mode based on a signal received during an activation state of a device. A lower panel housing is connected to the transparent display unit to enable folding and unfolding.
Abstract:
An apparatus and a method for modeling a source-drain current of a thin film transistor are provided to performing the modeling for an oxide thin film transistor and an organic thin film transistor. A modeling formula executing unit inputs various input values to a modeling formula when modeling variables are determined in modeling formula fitting unit(110). The modeling formula executing unit predicts an actual result according to the modeling formula. By applying the actually determined modeling variables to the modeling formula, a modeling formula applying unit(111) settles the modeling formula. In order to obtain an actual output value, the modeling formula executing unit input actual input data.
Abstract:
An organic light-emitting diode touch screen device and a manufacturing method thereof are provided to ensure a thin organic light-emitting diode touch screen device and to simplify a manufacturing process by using an infrared sensor. An organic light-emitting diode touch screen device comprises a display light-emitting unit and a touch sensing unit. The display light-emitting unit(200) includes a thin film transistor and an organic light-emitting diode controlled by the thin film transistor. The touch sensing unit(210) includes an infrared sensor and an infrared filter filtering and transmitting only infrared signals generated in the infrared sensor. The display light-emitting unit is arranged on the planar surface of the organic light-emitting diode touch screen device. The touch sensing unit is arranged between the display light-emitting units evenly.
Abstract:
A method for fabricating a p-type ZnO semiconductor layer is provided to form a thin film transistor including a p-type ZnO semiconductor layer on a large-area glass or plastic substrate and eliminate the necessity of a high temperature post-treatment by forming a p-type ZnO semiconductor layer by an ALD(atomic layer deposition) method. A substrate is disposed in a chamber(S101). A zinc precursor and an oxygen precursor are injected into the chamber, and a ZnO thin film is formed on the substrate by a surface chemical reaction of the zinc precursor and the oxygen precursor while using an ALD method(S104). A zinc precursor and a nitrogen precursor are injected into the chamber, and a doping layer is formed on the ZnO thin film by using a surface chemical reaction of the zinc precursor and the nitrogen precursor. The zinc precursor can be diethyl zinc or dimethyl zinc. The oxygen precursor can be made of one of water, ozone, oxygen, water plasma or oxygen plasma.
Abstract:
A multi-layer anode and a top emission organic light emitting diode including the multi-layer anode are provided to manufacture a conductive metal thin film as an anode electrode of the top emission organic light emitting diode. A top emission organic light emitting diode(10) includes a substrate(11), an anode(12), a hole injection layer(13a), a hole transporting layer(13b), a light emitting layer(14), an electron transporting layer(15a), an electron injection layer(15b), a cathode, a buffer layer(16), and a passivation layer(17). The anode is formed on the substrate. The hole transporting layer and the hole injection layer are formed on the anode. The cathode is formed on the electron injection layer. The buffer layer is formed on the cathode. The anode has a multi-layer structure. The anode includes a lower conduction layer(12a), a reflective conduction layer(12b), and an upper conductive layer(12c). The lower conductive layer is in direct contact with the substrate. The reflective layer is formed on the lower conduction layer. The upper conduction layer is formed on the reflective conduction layer.