公开(公告)号：US10689752B2

公开(公告)日：2020-06-23

申请号：US16192838

申请日：2018-11-16

Applicant: Axcelis Technologies, Inc.

Inventor： David A. Kirkwood ,  Joseph F. Valinski

IPC: C23C14/48 ,  H01J37/00 ,  H01J37/317 ,  H01L21/265

Abstract: An electrically conductive component is provided for a near-wafer environment of an ion implantation system, where the component has a carbon-based substrate having a microscopically textured surface overlying a macroscopically textured surface. The macroscopically textured surface is a mechanically, chemically, or otherwise roughened surface. The microscopically textured surface can be a converted surface formed by a chemical reaction forming a non-stoichiometric silicon and carbon surface. The one or more components can be a dose cup, exit aperture, and tunnel wall. The carbon-based substrate can be graphite. The microscopically textured surface can be a modified graphite surface. No defined interface layer exists between the microscopically textured surface and macroscopically textured surface. The carbon-based graphite is selected based on a final porosity and grain size of the graphite.

公开(公告)号：US20200066478A1

公开(公告)日：2020-02-27

申请号：US16106745

申请日：2018-08-21

Applicant: Axcelis Technologies, Inc.

Inventor： Bo Vanderberg ,  Edward Eisner

IPC: H01J37/147 ,  H01J37/317 ,  H01F7/20

Abstract: A scanning magnet is positioned downstream of a mass resolving magnet of an ion implantation system and is configured to control a path of an ion beam downstream of the mass resolving magnet for a scanning or dithering of the ion beam. The scanning magnet has a yoke having a channel defined therein. The yoke is ferrous and has a first side and a second side defining a respective entrance and exit of the ion beam. The yoke has a plurality of laminations stacked from the first side to the second side, wherein at least a portion of the plurality of laminations associated with the first side and second side comprise one or more slotted laminations having plurality of slots defined therein.

公开(公告)号：US10553392B1

公开(公告)日：2020-02-04

申请号：US16218884

申请日：2018-12-13

Applicant: Axcelis Technologies, Inc.

Inventor： Edward Eisner ,  Bo Vanderberg

IPC: H01J37/153 ,  H01J37/317 ,  H01J37/147

Abstract: An ion implantation system and method provide a non-uniform flux of a ribbon ion beam. A spot ion beam is formed and provided to a scanner, and a scan waveform having a time-varying potential is applied to the scanner. The ion beam is scanned by the scanner across a scan path, generally defining a scanned ion beam comprised of a plurality of beamlets. The scanned beam is then passed through a corrector apparatus. The corrector apparatus is configured to direct the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece. The corrector apparatus further comprises a plurality of magnetic poles configured to provide a non-uniform flux profile of the scanned ion beam at the workpiece.

公开(公告)号：US10515780B1

公开(公告)日：2019-12-24

申请号：US16225298

申请日：2018-12-19

Applicant: Axcelis Technologies, Inc.

Inventor： Yusef Nouri

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/24 ,  H01J37/302 ,  H01J37/248

Abstract: The present invention is directed to circuits, systems, and methods to quickly to quench an arc that may form between high voltage electrodes associated with an ion source to shorten the duration of the arc and mitigate non-uniform ion implantations. In one example, an arc detection circuit for detecting an arc in an ion implantation system includes an analog-to-digital converter (ADC) and an analysis circuit. The ADC is configured to convert a sensing current indicative of a current being supplied to an electrode in the ion implantation system to a digital current signal that quantifies the sensing current. The analysis circuit is configured to analyze the digital current signal to determine if the digital current signal meets threshold parameter value and in response to the digital current signal meeting the threshold parameter value, provide an arc detection signal to a trigger control circuit that activates an arc quenching mechanism.

公开(公告)号：US20190304820A1

公开(公告)日：2019-10-03

申请号：US16367948

申请日：2019-03-28

Applicant: Axcelis Technologies, Inc.

Inventor： John F. Baggett ,  Ronald N. Reece ,  Petros Miltiades Kopalidis

IPC: H01L21/67 ,  H01L21/683 ,  H01L21/687 ,  H01J37/317 ,  H01J37/20

Abstract: A thermal chuck selectively retains a workpiece on a clamping surface. The thermal chuck has one or more heaters to selectively heat the clamping surface and the workpiece. A thermal monitoring device determines a temperature of a surface of the workpiece when the workpiece resides on the clamping surface, defining one or more measured temperatures. A controller selectively energizes the one or more heaters based on the one or more measured temperatures. The thermal monitoring device may be one or more of a thermocouple or RTD in selective contact with the surface of the workpiece and an emissivity sensor or pyrometer not in contact with the surface. The thermal chuck can be part of an ion implantation system configured to implant ions into the workpiece. The controller can be further configured to control the heaters based on the measured temperatures.

公开(公告)号：US10395891B1

公开(公告)日：2019-08-27

申请号：US15909318

申请日：2018-03-01

Applicant: Axcelis Technologies, Inc.

Inventor： Michael Paul Cristoforo ,  Justin White McCabe

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/304 ,  H01J37/317

Abstract: A resolving aperture assembly for an ion implantation system has a first plate and a second plate, where the first plate and second plate generally define a resolving aperture therebetween. A position of the first plate with respect to the second plate generally defines a width of the resolving aperture. One or more actuators are operably coupled to one or more of the first plate and second plate and are configured to selectively vary the position the first plate and second plate with respect to one another, thus selectively varying the width of the resolving aperture. A servo motor precisely varies the resolving aperture width and a pneumatic cylinder independently selectively closes the resolving aperture. A downstream position actuator varies a position of the resolving aperture along a path of the ion beam, and a controller controls the one or more actuators based on desired properties of the ion beam.

公开(公告)号：US10361081B2

公开(公告)日：2019-07-23

申请号：US15807652

申请日：2017-11-09

Applicant: Axcelis Technologies, Inc.

Inventor： Neil Colvin ,  Tseh-Jen Hsieh

IPC: H01L21/265 ,  H01J37/317

Abstract: Processes and systems for carbon ion implantation include utilizing phosphine as a co-gas with a carbon oxide gas in an ion source chamber. In one or more embodiments, carbon implantation with the phosphine co-gas is in combination with the lanthanated tungsten alloy ion source components, which advantageously results in minimal oxidation of the cathode and cathode shield, among other components within the ion source chamber.

公开(公告)号：US10128084B1

公开(公告)日：2018-11-13

申请号：US15707473

申请日：2017-09-18

Applicant: Axcelis Technologies, Inc.

Inventor： John Baggett ,  Joe Ferrara ,  Brian Terry

IPC: H01L21/67 ,  G21K5/08 ,  H01J37/317 ,  H01L21/265 ,  H01J37/302 ,  H01J37/147 ,  G01K7/22 ,  H01J37/18

Abstract: A system and method is provided maintaining a temperature of a workpiece during an implantation of ions in an ion implantation system, where the ion implantation system is characterized with a predetermined set of parameters. A heated chuck is provided at a first temperature and heats the workpiece to the first temperature. Ions are implanted into the workpiece concurrent with the heating, and thermal energy is imparted into the workpiece by the ion implantation. A desired temperature of the workpiece is maintained within a desired accuracy during the implantation of ions by selectively heating the workpiece on the heated chuck to a second temperature. The desired temperature is maintained based, at least in part, on the characterization of the ion implantation system. Thermal energy imparted into the workpiece from the implantation is mitigated by the selective heating of the workpiece on the heated chuck at the second temperature.

公开(公告)号：US10024825B2

公开(公告)日：2018-07-17

申请号：US14963703

申请日：2015-12-09

Applicant: Axcelis Technologies, Inc.

Inventor： Shu Satoh

IPC: G01H13/00 ,  G01N29/34 ,  H01L21/67 ,  G01N29/09 ,  G01N29/12 ,  G01N29/24 ,  H01L21/683 ,  H01L21/66

Abstract: A workpiece clamping status detection system and method for detecting a clamping state of a clamping device is provided. A clamping device having a clamping surface is configured to selectively clamp a workpiece to the clamping surface. The clamping device may be an electrostatic chuck or a mechanical clamp for selectively securing a semiconductor wafer thereto. A vibration-inducing mechanism is further provided, wherein the vibration-inducing mechanism is configured to selectively vibrate one or more of the clamping device and workpiece. A vibration-sensing mechanism is also provided, wherein the vibration-sensing mechanism is configured to detect the vibration of the one or more of the clamping device and workpiece. Detection of clamping status utilizes changes in acoustic properties, such as a shift of natural resonance frequency or acoustic impedance, to determine clamping condition of the workpiece. A controller is further configured to determine a clamping state associated with the clamping of the workpiece to the clamping surface, wherein the clamping state is associated with the detected vibration of the one or more of the clamping device and workpiece.

公开(公告)号：US20180197761A1

公开(公告)日：2018-07-12

申请号：US15866209

申请日：2018-01-09

Applicant: Axcelis Technologies, Inc.

Inventor： Joseph Ferrara ,  Brian Terry ,  John Baggett

IPC: H01L21/67 ,  C23C14/48 ,  H01L21/683 ,  H01L21/687 ,  C23C14/56 ,  H01J37/317

CPC classification number: H01L21/67248 ,  C23C14/48 ,  C23C14/56 ,  H01J37/3171 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67213 ,  H01L21/6833 ,  H01L21/68728

Abstract: A heated chuck for an ion implantation system selectively clamps a workpiece to a carrier plate having heaters to selectively heat a clamping surface. A gap between a base plate and carrier plate of the heated chuck contains a heat transfer media. A cooling fluid source is coupled to cooling channels in the base plate. A controller operates the heated chuck in a first mode and second mode. In the first mode, the controller does not activate the heaters and flows the cooling fluid through the cooling channel, where heat is transferred through the heat transfer media and to the cooling fluid. In the second mode, the controller activates the heaters and optionally purges the cooling fluid from the cooling channel or otherwise alters its cooling capacity. A gas can be selectively provided in the gap to further control heat transfer in the first and second modes.