公开(公告)号：US20250140520A1

公开(公告)日：2025-05-01

申请号：US18919483

申请日：2024-10-18

Applicant: Axcelis Technologies, Inc.

Inventor： Michael Cristoforo ,  Bo Vanderberg

IPC: H01J37/304 ,  H01J37/317

Abstract: A profiling apparatus has a hollow cylinder having a circumferential slit having a circumferential slit width disposed about cylinder axis. Two or more beam current detectors are disposed within the cylinder to determine a respective beam current of an ion beam received at respective detector surfaces. An aperture plate is upstream of the cylinder and has an aperture slit running parallel to the cylinder having a slit width. A rotary input apparatus controls a rotational position of the cylinder. A linear translation apparatus controls a linear position of the cylinder and aperture plate. A controller determines a uniformity and angular profile of the ion beam in a plurality of dimensions based, at least in part, on the rotational position of the cylinder, the linear position of the cylinder and aperture plate, and the respective beam current of the ion beam received.

公开(公告)号：US11114270B2

公开(公告)日：2021-09-07

申请号：US16106745

申请日：2018-08-21

Applicant: Axcelis Technologies, Inc.

Inventor： Bo Vanderberg ,  Edward Eisner

IPC: H01J37/147 ,  H01F7/20 ,  H01J37/317 ,  H01F3/02 ,  H01F27/28

Abstract: A scanning magnet is positioned downstream of a mass resolving magnet of an ion implantation system and is configured to control a path of an ion beam downstream of the mass resolving magnet for a scanning or dithering of the ion beam. The scanning magnet has a yoke having a channel defined therein. The yoke is ferrous and has a first side and a second side defining a respective entrance and exit of the ion beam. The yoke has a plurality of laminations stacked from the first side to the second side, wherein at least a portion of the plurality of laminations associated with the first side and second side comprise one or more slotted laminations having plurality of slots defined therein.

公开(公告)号：US10573485B1

公开(公告)日：2020-02-25

申请号：US16227296

申请日：2018-12-20

Applicant: Axcelis Technologies, Inc.

Inventor： Wilhelm Platow ,  Edward Eisner ,  Bo Vanderberg ,  Neil Bassom ,  Michael Cristoforo ,  Joshua Abeshaus

IPC: H01J37/08 ,  H01J37/317

Abstract: An electrode system for an ion source has a source electrode that defines a source aperture in an ion source chamber, and is coupled to a source power supply. A first ground electrode defines a first ground aperture that is electrically coupled to an electrical ground potential and extracts ions from the ion source. A suppression electrode is positioned downstream of the first ground electrode and defines a suppression aperture that is electrically coupled to a suppression power supply. A second ground electrode is positioned downstream of the suppression electrode and defines a second ground aperture. The first and second ground electrodes are fixedly coupled to one another and are electrically coupled to the electrical ground potential.

公开(公告)号：US09318302B1

公开(公告)日：2016-04-19

申请号：US14674694

申请日：2015-03-31

Applicant: Axcelis Technologies, Inc.

Inventor： Bo Vanderberg ,  Joseph Valinski ,  Michael Cristoforo

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/024 ,  H01J2237/061

Abstract: A modular ion source and extraction apparatus comprises an ion source chamber selectively electrically coupled to a voltage potential, wherein the ion source chamber comprises an extraction aperture. An extraction electrode is positioned proximate to the extraction aperture of the ion source chamber, wherein the extraction electrode is electrically grounded and configured to extract ions from the ion source chamber. One or more linkages operably couple to the ion source chamber, and one or more insulators couple the extraction electrode to the respective one or more linkages, wherein the one or more insulators electrically insulate the respective one or more linkages from the extraction electrode, therein electrically insulating the extraction electrode from the ion source chamber. One or more actuators operably couple the one or more linkages to the ion source chamber, wherein the one or more actuators are configured to translate the one or more linkages with respect to the ion source chamber, therein translating the extraction electrode in one or more axes.

Abstract translation: 模块化离子源和提取装置包括选择性地电耦合到电压电位的离子源室，其中离子源室包括提取孔。 提取电极位于靠近离子源室的提取孔的位置，其中提取电极被电接地并被配置为从离子源室提取离子。 一个或多个键可操作地耦合到离子源室，并且一个或多个绝缘体将引出电极耦合到相应的一个或多个键，其中一个或多个绝缘体将相应的一个或多个键与引出电极电绝缘，其中电 将引出电极与离子源室绝缘。 一个或多个致动器可操作地将所述一个或多个连杆耦合到所述离子源室，其中所述一个或多个致动器被配置成相对于所述离子源室平移所述一个或多个连杆，其中在所述离心源室中平移所述引出电极 。

公开(公告)号：US11037754B2

公开(公告)日：2021-06-15

申请号：US16720499

申请日：2019-12-19

Applicant: Axcelis Technologies, Inc.

Inventor： Edward Eisner ,  Bo Vanderberg

IPC: H01J37/153 ,  H01J37/317 ,  H01J37/147

Abstract: An ion implantation system and method provide a non-uniform flux of a ribbon ion beam. A spot ion beam is formed and provided to a scanner, and a scan waveform having a time-varying potential is applied to the scanner. The ion beam is scanned by the scanner across a scan path, generally defining a scanned ion beam comprised of a plurality of beamlets. The scanned beam is then passed through a corrector apparatus. The corrector apparatus is configured to direct the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece. The corrector apparatus further comprises a plurality of magnetic poles configured to provide a non-uniform flux profile of the scanned ion beam at the workpiece.

公开(公告)号：US20200066478A1

公开(公告)日：2020-02-27

申请号：US16106745

申请日：2018-08-21

Applicant: Axcelis Technologies, Inc.

Inventor： Bo Vanderberg ,  Edward Eisner

IPC: H01J37/147 ,  H01J37/317 ,  H01F7/20

Abstract: A scanning magnet is positioned downstream of a mass resolving magnet of an ion implantation system and is configured to control a path of an ion beam downstream of the mass resolving magnet for a scanning or dithering of the ion beam. The scanning magnet has a yoke having a channel defined therein. The yoke is ferrous and has a first side and a second side defining a respective entrance and exit of the ion beam. The yoke has a plurality of laminations stacked from the first side to the second side, wherein at least a portion of the plurality of laminations associated with the first side and second side comprise one or more slotted laminations having plurality of slots defined therein.

公开(公告)号：US10553392B1

公开(公告)日：2020-02-04

申请号：US16218884

申请日：2018-12-13

Applicant: Axcelis Technologies, Inc.

Inventor： Edward Eisner ,  Bo Vanderberg

IPC: H01J37/153 ,  H01J37/317 ,  H01J37/147

Abstract: An ion implantation system and method provide a non-uniform flux of a ribbon ion beam. A spot ion beam is formed and provided to a scanner, and a scan waveform having a time-varying potential is applied to the scanner. The ion beam is scanned by the scanner across a scan path, generally defining a scanned ion beam comprised of a plurality of beamlets. The scanned beam is then passed through a corrector apparatus. The corrector apparatus is configured to direct the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece. The corrector apparatus further comprises a plurality of magnetic poles configured to provide a non-uniform flux profile of the scanned ion beam at the workpiece.