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    Vacuum apparatus
    162.
    发明专利
    Vacuum apparatus 失效
    真空装置

    公开(公告)号：JPS6157231A

    公开(公告)日：1986-03-24

    申请号：JP15662184

    申请日：1984-07-27

    Applicant: Fujitsu Ltd

    Inventor： YOSHIDA TAKU ,  KISA TOSHIMASA

    IPC: B01J3/02 ,  B01J3/00 ,  H01L21/02 ,  H01L21/203 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/67

    CPC classification number: B01J3/006

    Abstract: PURPOSE:To certainly keep the vacuum of a vacuum chamber even when a vacuum source is cut off, by arranging a means for locking the valve body of the gate valve between a load lock chamber and a vacuum space by a cam mechanism when said gate valve is closed. CONSTITUTION:Because a lid 6 is opened at the time of the feed-in and feed- out of an object to be treated and the valve body 3 of a gate valve receives atmospheric pressure when the vacuum of a load clock chamber 2 is cut off, the valve body 3 must be pushed upwardly in order to keep the closed state of the gate valve but this force F is imparted to a cam 8. This cam 8 has an oblique surface in its cross-sectional shape and is guided by upper and lower guides 9, 10 and driven right and left by a cylinder 11. The bearing 13 attached to the drive shaft 12 of the valve body 3 is constituted so as to be capable of locking or opening the valve body 3 through the contact with the cam 8.

    Abstract translation: 目的：即使当真空源被切断时，也要保持真空室的真空，通过设置用于通过凸轮机构将门阀的阀体锁定在负载锁定室和真空空间之间的装置，当所述闸阀 关闭了。 构成：由于在进入待处理物体的时候打开盖6，当切断负载时钟室2的真空时，门阀的阀体3接收大气压 阀体3必须向上推动以保持闸阀的关闭状态，但该力F被赋予凸轮8.该凸轮8具有其横截面形状的倾斜表面并由上部和 下引导件9,10，并由缸11左右驱动。安装在阀体3的驱动轴12上的轴承13构成为能够通过与凸轮的接触来锁定或打开阀体3 8。

    Transporting device of vacuum vessel
    163.
    发明专利
    Transporting device of vacuum vessel 失效
    真空船的运输装置

    公开(公告)号：JPS59164696A

    公开(公告)日：1984-09-17

    申请号：JP4023583

    申请日：1983-03-10

    Applicant: Matsushita Electric Ind Co Ltd

    Inventor： SHIMA HIROZOU

    IPC: C30B25/02 ,  B01J3/00 ,  B01J3/02 ,  C30B35/00 ,  H01L21/205

    CPC classification number: B01J3/006 ,  C30B35/005

    Abstract: PURPOSE:To exterminate dust generation in a device for transporting a semiconductor substrate in vaccum out of a vacuum vessel to a vacuum reaction chamber and to prolong the life of the device by using a linear pulse motor and enabling straight advancing movement of the device. CONSTITUTION:One semiconductor substrate 20 in a cassette 21 is transferred into a vacuum vessel 16 by an interlocking action of transfer conveyors 22-2, 22-1 after opening an atmospheric air shielding valve 19. The vessel 16 is then evacuated by an evacuating device 18 by closing the valve 19 and opening a shielding valve 17. Next, a shielding valve 28 from vacuum is opened and a specified pulse signal is inputted into a linear pulse motor 26. Thus, a pushing plate 23 attached to a guide block 24 begins straight advancing movement to transfer the substrate 20 to a predetermined position in the vacuum reaction chamber 29. Thereafter a specified pulse signal is inputted into the motor 26 and the block 24 is made to retreat; and the valve 28 is closed and a vapor phase reaction is caused in a closed chamber 29. In this stage, the motor 26 is not in contact with a scale 27, and the motor 26 is moved with a certain space B; therefore, there is no fear of causing abrasion.

    Abstract translation: 目的：消除将真空中的半导体衬底从真空容器输送到真空反应室的装置中的灰尘产生，并且通过使用线性脉冲电机并使得装置能够直线前进移动来延长装置的使用寿命。 构成：在打开大气隔离阀19之后，盒21中的一个半导体衬底20通过转印输送器22-2,22-1的互锁作用被转移到真空容器16中。然后通过抽气装置 18，关闭阀19并打开屏蔽阀17.接下来，打开真空的屏蔽阀28，并将特定的脉冲信号输入到线性脉冲电动机26.因此，附接到引导块24的推板23开始 将基板20转移到真空反应室29中的预定位置的直线前进运动。此后，将特定的脉冲信号输入到马达26中，使块24退回; 关闭阀28，在封闭室29内产生汽相反应。在此阶段，电动机26不与秤27接触，马达26以一定的空间B移动。 因此，不用担心造成磨损。

    Method and apparatus for carrying out plasma treatment
    164.
    发明专利
    Method and apparatus for carrying out plasma treatment 失效
    用于实施等离子体处理的方法和装置

    公开(公告)号：JPS59164340A

    公开(公告)日：1984-09-17

    申请号：JP3820483

    申请日：1983-03-10

    Applicant: Toyota Motor Corp

    Inventor： FUKUDA KENJI ,  TAKAHASHI YOSHINOBU ,  KANEKO TAKAOKI

    IPC: C08J7/00 ,  B01J3/00 ,  B05D3/14 ,  B29C59/14 ,  H01J37/32

    CPC classification number: H01J37/32357 ,  B01J3/006 ,  B05D3/144 ,  B29C59/14

    Abstract: PURPOSE:To improve a plasma treating effect, by carrying out a plasma treatment while rotatably moving a plurality of materials to be treated in correlation to one another and independently rotating them. CONSTITUTION:When a rotating moving shaft 16 is rotated by driving a motor 27, the vertical disk surfaces 19-1 and 19-2 of a truck for receiving jigs are rotatably moved and at the same time shafts 17-1-17-4 supporting materials S-1-S-4 to be treated are rotatably moved while each of said shafts draws a circular locus 20. During the course of this rotating movement, the arranging directions of the materials S--S-4 to be treated are corrected around free rotating shafts 17-1-17-4. When an extending shaft 23 is interlocked with a junction means 24, rails 30-1-30-2 are lowered through an air cylinder 29 to a position at which they do not interface with the rotation of the vertical disks 19-1, 2 of the truck for receiving jigs. The door 21-1 of a treating container 1 is then closed to start a series of plasma treating operations.

    Abstract translation: 目的：为了提高等离子体处理效果，通过进行等离子体处理，同时相互旋转地移动待处理的多种材料并独立地旋转它们。 构成：通过驱动马达27使旋转移动轴16旋转时，用于接收夹具的卡车的垂直盘面19-1和19-2可旋转地移动，同时轴17-1-17-4支撑 要处理的材料S-1-S-4可旋转地移动，同时每个所述轴都绘制圆形轨迹20.在该旋转运动过程中，要处理的材料S-S-4的排列方向被校正 围绕自由旋转轴17-1-17-4。 当延伸轴23与接合装置24互锁时，轨道30-1-30-2通过气缸29下降到不与垂直盘19-1,2的旋转接触的位置 用于接收夹具的卡车。 然后将处理容器1的门21-1关闭以开始一系列等离子体处理操作。

    Method and apparatus for plasma treatment
    165.
    发明专利
    Method and apparatus for plasma treatment 失效
    等离子体处理的方法和装置

    公开(公告)号：JPS59155441A

    公开(公告)日：1984-09-04

    申请号：JP2937183

    申请日：1983-02-25

    Applicant: Toyota Motor Corp

    Inventor： FUKUDA KENJI ,  TAKAHASHI YOSHINOBU ,  KANEKO TAKAOKI

    IPC: H05H1/24 ,  B01J3/00 ,  B05D3/14 ,  B29C59/14 ,  C08J7/00 ,  H01J37/32

    CPC classification number: H01J37/32357 ,  B01J3/006 ,  B05D3/144 ,  B29C59/14

    Abstract: PURPOSE:To prevent an object from being unevenly treated, by providing blades for diffusing plasma within a reaction chamber and diffusing a plasma stream with the blades to make plasma concn. distribution uniform. CONSTITUTION:Plasma generated in a generating tube 7 (numeral 2 refers to an oscillator and 12 to a gas supply tube for plasma generation) is introduced through a tube 8 and from an irradiation tube 10 into a reaction chamber 1 and gas is sucked and discharged through an exhaust vent 29, whereby objects to be treated (not shown) placed within the chamber 1 under reduced pressure are subjected to a plasma treatment. In the above apparatus, plasma diffusers 14, 15 composed of a diffusing blade 26 driven by a motor 20 are provided within the chamber 1 and a plasma stream flowing from the irradiation tube 10 to the exhaust vent 10 is forcedly diffused to make plasma concn. uniform. Said diffusing blade may be provided in the neighborhood of the irradiation tube 10 or the exhaust vent 10 and driven by plasma stream.

    Abstract translation: 目的：为了防止物体受到不均匀的处理，通过提供用于在反应室内扩散等离子体的叶片，并使等离子体流与叶片扩散以使等离子体浓缩。 分布均匀。 构成：将发生管7（数字2表示振荡器，12表示用于等离子体产生的气体供给管）中产生的等离子体通过管8从照射管10引入反应室1，并且吸入和排出气体 通过排气口29，由此在减压下放置在室1内的待处理物体（未示出）进行等离子体处理。 在上述装置中，在室1内设置有由电动机20驱动的扩散叶片26构成的等离子体扩散器14,15，从照射管10流到排气口10的等离子体流被强制扩散，使等离子体浓缩。 制服。 所述扩散刀片可以设置在照射管10或排气口10的附近并由等离子体流驱动。

    Ion plating apparatus equipped with plural evaporation sources
    166.
    发明专利
    Ion plating apparatus equipped with plural evaporation sources 失效
    离子镀设备装备有多个蒸发源

    公开(公告)号：JPS58217674A

    公开(公告)日：1983-12-17

    申请号：JP9820082

    申请日：1982-06-08

    Applicant: Citizen Watch Co Ltd

    Inventor： SASANUMA KIYOUYUU ,  SHIMIZU SHIYOUTAROU ,  ENOMOTO MITSUGI

    IPC: B01J3/00 ,  B01J19/08 ,  C23C14/32 ,  H01L21/203 ,  H01L21/285

    CPC classification number: B01J3/006 ,  C23C14/32

    Abstract: PURPOSE:To make it possible to control a stable film composition by arranging plural evaporation sources high in mutual interference in a state dispersed above and below through a substrate holder to exclude the mutual interference between plural evaporation sources. CONSTITUTION:Below a substrate holder 3 in a vacuum chamber, an upwardly directed evaporation source A accommodating an evaporative material, for example, Ti is provided. On the other hand, above the holder 3, a downardly directed evaporation source C accommodating an evaporative material, for example, gold is provided. Plural substrates 2 on the holder 3 are revolved by the holder 3 while positive potential is respectively applied to anodes 61, 62 by power sources 81, 82 to ionize the evaporation sources A, C and positive potential is applied to the substrates 2 by a substrate power source 4. In forming an eutectic film of titanium nitride and gold, a N2-containing gas and an inert gas are respectively introduced from introducing ports 91, 92. By this method, nitriding reaction of Ti vapor is promoted and the evaporation amount of gold is also stabilized.

    Abstract translation: 目的：为了通过在基板保持器上分散上下分散的状态配置多个相互干涉的蒸发源，能够控制稳定的膜组成，以排除多个蒸发源之间的相互干扰。 构成：在真空室内的衬底保持器3的下面，提供容纳蒸发材料例如Ti的向上定向蒸发源A. 另一方面，在保持器3的上方，设置容纳蒸发材料例如金的下降的蒸发源C. 保持器3上的多个基板2由保持器3旋转，同时通过电源81,82将正电位分别施加到阳极61,62，以电离蒸发源A，C，并且通过基板将正电位施加到基板2 电源4.在形成氮化钛和金的共晶膜时，分别从引入口91,92引入含有N 2的气体和惰性气体。通过这种方法，促进Ti蒸气的氮化反应和蒸发量 黄金也稳定下来。

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