公开(公告)号：KR1020050097992A

公开(公告)日：2005-10-10

申请号：KR1020057014555

申请日：2003-12-23

Applicant: 램 리써치 코포레이션

Inventor： 보이드존 ,  쿠티앤드라스 ,  시윌리엄 ,  스미스마이클지알 ,  크놉로버트 ,  앤더슨토마스더블유

IPC: H01L21/302

CPC classification number: B08B3/12 ,  B06B1/0253 ,  B06B2201/71 ,  B08B3/10 ,  H01L21/67057 ,  H01L21/67253

Abstract: System and method of cleaning a substrate (202) includes a megasonic chamber (206) that includes a transducer (210) and a substrate (202). The transducer (210) is being oriented toward the substrate (202). A variable distance d separates the transducer (210) and the substrate (202). The system (200) also includes a dynamically adjustable RF generator (212) that has an output coupled to the transducer. The dynamically adjustable RF generator (212) can be controlled by a phase comparison of an oscillator output (306) voltage and a phase of an RF generator output voltage. The dynamically adjustable RF generator (212) can also be controlled by monitoring a peak voltage of an output signal and controlling the RF generator to maintain the peak voltage within a predetermined voltage range. The dynamically adjustable RF generator (212) can also be controlled by dynamically controlling a variable DC power supply voltage.

Abstract translation: 清洁衬底（202）的系统和方法包括包括换能器（210）和衬底（202）的兆声波室（206）。 换能器（210）朝向衬底（202）定向。 可变距离d分离换能器（210）和基底（202）。 系统（200）还包括动态可调的RF发生器（212），其具有耦合到换能器的输出。 动态可调RF发生器（212）可以通过振荡器输出（306）电压和RF发生器输出电压的相位的相位比较来控制。 也可以通过监视输出信号的峰值电压并控制RF发生器将峰值电压保持在预定的电压范围内来控制可动态调节的RF发生器（212）。 动态调节的RF发生器（212）也可以通过动态地控制可变直流电源电压来控制。

公开(公告)号：US11975358B1

公开(公告)日：2024-05-07

申请号：US17357015

申请日：2021-06-24

Applicant: Cleaning Technologies Group, LLC

Inventor： Brian D. Bernhardt

IPC: B08B3/12 ,  B06B1/02 ,  B08B13/00 ,  H01L21/67

CPC classification number: B06B1/0253 ,  B08B3/12 ,  B08B13/00 ,  H01L21/67057 ,  B06B2201/71

Abstract: A system for delivering ultrasonic energy to a transducer load has at least one ultrasonic transducer, and a radio frequency (RF) generator for delivering RF power to the transducer load. The RF generator has an output circuit that has at least one tunable resonant frequency, a voltage circuitry system that senses an output voltage waveform, a current circuitry system that senses an output current waveform, and a phase detector circuit for measuring a phase differential between the output voltage waveform and the output current waveform. The phase detector circuit has an XOR gate that receive a voltage signal input and a current signal input, a comparator that compares the measured phase differential to a desired phase difference to generate a phase value; and a motor controller evaluates the phase value and based on the phase value automatically repositions or maintains the position of a moveable metallic core within a variable inductor, to generate a desired ultrasonic transmission in a liquid wherein the voltage and current phases are approximately aligned.

公开(公告)号：US20230364657A1

公开(公告)日：2023-11-16

申请号：US18359139

申请日：2023-07-26

Applicant: Guangdong University of Technology

Inventor： Yun CHEN ,  Biao LI ,  Aoke SONG ,  Shankun DONG ,  Shengbao LAI ,  Maoxiang HOU ,  Xin CHEN

IPC: B08B7/02 ,  B06B1/06

CPC classification number: B08B7/028 ,  B06B1/0688 ,  B06B2201/56 ,  B06B2201/71 ,  G03F7/405

Abstract: A method of fabricating a film vibration device, including: photoetching a surface of a silicon wafer to form a circular-hole array; etching an aluminum layer on the silicon wafer; etching the silicon wafer to form a through-hole array to obtain a porous silicon wafer; attaching a polyethylene terephthalate (PET) sheet to a side of the porous silicon wafer; ablating the PET sheet to obtain a porous PET film; attaching a polyvinylidene fluoride (PVDF) film to a lower side of the porous silicon wafer; performing vacuumization above the porous silicon wafer, while heating the PVDF film below the porous silicon wafer to create dome micro-structures on the PVDF film; and laminating the porous PET film on each of two sides of the PVDF film to obtain the film vibration device. This application also provides a cleaning device having the film vibration device.

公开(公告)号：US20230218127A1

公开(公告)日：2023-07-13

申请号：US18009606

申请日：2021-06-09

Applicant: TRANZERO B.V.

Inventor： Dennis Gerardus Karel Maria LUITEN ,  Hidde Frank REITSMA

IPC: A47K11/10 ,  B08B3/12 ,  A46B5/00 ,  A46B13/02 ,  A46B9/02 ,  A46B15/00 ,  B06B1/02 ,  B06B1/06

CPC classification number: A47K11/10 ,  B08B3/12 ,  A46B5/0095 ,  A46B13/023 ,  A46B9/026 ,  A46B15/0004 ,  B06B1/0261 ,  B06B1/0611 ,  A46B2200/304 ,  B06B2201/55 ,  B06B2201/71

Abstract: The invention relates to a toilet cleaning tool comprising:



a handle;
a vibration member attached at a free end of the handle, wherein said vibration member includes an emitting surface for emitting vibrational waves;

wherein the toilet cleaning tool further includes one or more spacers arranged around the vibration member to keep the vibration member free of the toilet bowl during cleaning.

公开(公告)号：US09673373B2

公开(公告)日：2017-06-06

申请号：US13967950

申请日：2013-08-15

Applicant: IMEC

Inventor： Steven Brems ,  Paul Mertens

IPC: H01L41/09 ,  B08B3/12 ,  B06B1/06 ,  H01L21/67

CPC classification number: H01L41/09 ,  B06B1/0622 ,  B06B1/0688 ,  B06B2201/20 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/67086

Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.

公开(公告)号：US20160288166A1

公开(公告)日：2016-10-06

申请号：US15037719

申请日：2014-11-21

Applicant: THUNDER BAY REGIONAL RESEARCH INSTITUTE

Inventor： Oleg RUBEL ,  Samuel PICHARDO ,  Laura CURIEL ,  Sheikh Jamil AHMED ,  Jeremy COLE

IPC: B06B1/06 ,  H01L41/09 ,  H01L41/04 ,  B06B1/02 ,  H01L41/047

CPC classification number: B06B1/06 ,  A61B8/12 ,  A61B8/4483 ,  A61B8/546 ,  A61N7/00 ,  A61N2007/0043 ,  B06B1/0207 ,  B06B1/0215 ,  B06B1/0238 ,  B06B2201/71 ,  B06B2201/72 ,  B06B2201/76 ,  B08B3/12 ,  H01L41/042 ,  H01L41/047 ,  H01L41/09

Abstract: Methods and devices are described for driving ferroelectric perovskite oxide crystals to achieve polarization inversion with reduced coercivity. In some embodiments, the anisotropy in the potential energy surface of a ferroelectric material is employed to drive polarization inversion and switching with a reduced coercive field relative to uniaxial excitation. In some embodiments, polarization inversion with reduced coercivity is produced via the application of an electric field that exhibits a time-dependent orientation, in contrast with conventional uniaxial electrical excitation, thereby causing the central ion (and the crystal structure as a whole) to evolve along a lower-energy path, in which the central ion is driven such that it avoids the potential energy maximum. This may be achieved, for example, by applying at least two non-parallel time-dependent voltages (e.g. bias, potential) such that orientation of the electric field changes with time during the switching cycle.

Abstract translation: 描述了用于驱动铁电钙钛矿氧化物晶体以降低矫顽力的极化反转的方法和装置。 在一些实施例中，铁电材料的势能表面中的各向异性用于驱动极化反转和相对于单轴激励的减小的矫顽场的切换。 在一些实施例中，与传统的单轴电激励相反，通过施加呈现时间依赖取向的电场产生具有降低的矫顽力的极化反转，从而使中心离子（和晶体结构整体）放出 沿着较低能量的路径，其中中心离子被驱动，使得其避免了最大的势能。 这可以通过例如通过施加至少两个不平行的时间相关电压（例如偏置，电位）来实现，使得电场的取向在开关周期期间随时间而变化。

公开(公告)号：US08539969B2

公开(公告)日：2013-09-24

申请号：US12847621

申请日：2010-07-30

Applicant: Abbas Rastegar

Inventor： Abbas Rastegar

IPC: B08B3/12

CPC classification number: H01L21/67046 ,  B06B1/0276 ,  B06B1/0622 ,  B06B2201/20 ,  B06B2201/55 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/02041

Abstract: An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.

Abstract translation: 介绍了一种用于清洁表面的Gigasonic Brush的设备，系统和方法。 该系统的一个实施例包括耦合到衬底的声学换能器阵列，其中各个声学换能器的尺寸在9um2至250,000um2的范围内。 系统可以包括耦合到目标表面或声换能器阵列中的至少一个的定位机构，并且被配置为将声换能器阵列定位在目标表面的1毫米内。 该系统还可以包括布置成提供用于将声换能器阵列耦合到目标表面的清洁液体的清洁液体供应。 系统还可以包括耦合到声换能器阵列并被配置为激活声换能器阵列的控制器。

公开(公告)号：US20130160791A1

公开(公告)日：2013-06-27

申请号：US13618784

申请日：2012-09-14

Applicant: Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

Inventor： Teruo Haibara ,  Etsuko Kubo ,  Yoshihiro Mori ,  Masashi Uchibe

IPC: B08B3/12

CPC classification number: B08B3/12 ,  B06B2201/71 ,  H01L21/02052 ,  H01L21/67057

Abstract: An ultrasonic cleaning method for cleaning an object in a solution having a gas dissolved therein includes irradiating ultrasonic waves to the solution having a first dissolved gas concentration. While the ultrasonic waves are being irradiated to the solution, a dissolved gas concentration in the solution is changed from the first dissolved gas concentration to a second dissolved gas concentration that is lower than the first dissolved gas concentration such that sonoluminescence occurs.

Abstract translation: 一种用于清洗溶解有气体的溶液中的物体的超声波清洗方法包括：在具有第一溶解气体浓度的溶液中照射超声波。 当超声波被照射到溶液时，溶液中的溶解气体浓度从第一溶解气体浓度变为低于第一溶解气体浓度的第二溶解气体浓度，从而发生声发光。

公开(公告)号：US07909934B2

公开(公告)日：2011-03-22

申请号：US11217523

申请日：2005-08-31

Applicant: John Boyd ,  Andras Kuthi ,  Michael G. R. Smith ,  Thomas W. Anderson ,  William Thie

Inventor： John Boyd ,  Andras Kuthi ,  Michael G. R. Smith ,  Thomas W. Anderson ,  William Thie

IPC: B08B7/00 ,  B08B7/04

CPC classification number: H01L21/67253 ,  B06B1/0253 ,  B06B2201/71 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67057 ,  Y10S134/902

Abstract: A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer.

Abstract translation: 清洁衬底的系统和方法包括包括换能器和衬底的兆声波室。 换能器朝向基板。 可变距离d分离换能器和基板。 该系统还包括具有耦合到换能器的输出的动态可调的RF发生器。

公开(公告)号：US20070262676A1

公开(公告)日：2007-11-15

申请号：US11819265

申请日：2007-06-26

Applicant: Sameer Madanshetty

Inventor： Sameer Madanshetty

IPC: H02N2/00

CPC classification number: B06B1/0215 ,  B06B1/0603 ,  B06B1/067 ,  B06B2201/71 ,  B08B3/12 ,  G10K11/006 ,  G10K11/08 ,  G10K15/043 ,  Y10S134/902

Abstract: An apparatus to produce acoustic cavitation by controlling cavitation events in a liquid insonification medium utilizing a waveform to excite a transducer with a series of bipolar inharmonic tone bursts having medium recovery intervals between respective bursts so that the medium repeatedly recovers from cavitation events between bursts. The apparatus may be used to clean a semiconductor wafer, to de-coat a painted surface having, to induce a chemical reaction, and/or to provide recycled paper made from inked paper de-inked by cavitation. Cavitation events are generated using a transducer and a waveform generator, e.g., square wave tone bursts, to excite the transducer with a signal controlled in frequency, burst repetition rate, duty-cycle and/or amplitude, e.g., utilizing bursts having a frequency between 500 KHz and 10 MHz, and a duty cycle between 0.1% and 70%.