-
公开(公告)号：WO2022194482A1
公开(公告)日：2022-09-22
申请号：PCT/EP2022/053966
申请日：2022-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： OTTEN, Christiaan , TEUNISSEN, Christan , SCHEEPERS, Paul, Hendricus , MEIJER, Joseph, Reinier
Abstract: Disclosed herein is a flood column for projecting a charged particle flooding beam along a beam path towards a sample to flood the sample with charged particles prior to assessment of the flooded sample using an assessment column, the flood column comprising: an anchor body arranged along the beam path; a lens arrangement arranged in a down-beam part of the flood column; and a lens support arranged between the anchor body and the lens arrangement; wherein the lens support is configured to position the lens arrangement and the anchor body relative to each other; the lens support comprises an electrical insulator; and the lens support is in the direct line of sight of at least a portion of the beam path in the down-beam part.
-
公开(公告)号：WO2022194448A1
公开(公告)日：2022-09-22
申请号：PCT/EP2022/052816
申请日：2022-02-07
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , GOOSEN, Maikel, Robert
Abstract: Disclosed herein is a method of reducing a sample charging effect in a scanning electron microscope (SEM) image, the method comprising: obtaining a first SEM image from a first electron beam scan with a parameter being a first quantity; obtaining a second SEM image from a second electron beam scan with the parameter being a second quantity different from the first quantity; and generating a reduced sample charging effect image based on convolution equations comprising a representation of the first SEM image, a representation of the second SEM image, a first point spread function corresponding to the first SEM image and a second point spread function corresponding to the second SEM image.
-
公开(公告)号：WO2022189250A1
公开(公告)日：2022-09-15
申请号：PCT/EP2022/055393
申请日：2022-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： VON FINCK, Alexander , HALM, Simon , MARKEL, Ingo , NEUMANN, Maciej
Abstract: A measuring apparatus (100) which is configured for roughness and/or defect measurement on a plurality of surface sections (2) of a surface of a sample (1) to be investigated comprises an illumination device (10) having at least two light sources (11A, 11B, 11C, 11D) which are arranged for illuminating a measuring region (3) of the surface with measuring light, a detector device (20) having a detector array (21) with a plurality of detector pixels which are arranged for capturing scattered light scattered at the surface, and an evaluation device (30) which is configured for determining at least one roughness feature of the surface, from the captured scattered light, the at least two light sources (11A, 11B, 11C, 11D) being configured for illuminating the measuring region (3) along at least two illumination beam paths (LA, LB, LC, LD) at different angles of incidence relative to a surface normal of the surface, the at least two light sources (11A, 11B, 11C, 11D) being able to be fixed with respect to the detector device (20), the detector device (20) being provided with imaging optics (22) arranged for imaging the measuring region (3) of the surface on the detector array (21), the detector device (20) being configured for detecting at least two scattered light images (4A, 4B, 4C, 4D) of surface sections (2) in the illuminated measuring region (3) at a predetermined viewing angle relative to the surface normal of the surface, portions of the scattered light received by the detector pixels, which portions are formed in each case by the illumination in one of the illumination beam paths (LA, LB, LC, LD), in each case having a common spatial frequency, and the evaluation device (30) being configured for determining the at least one roughness feature of the surface sections (2) from the at least two scattered light images (4A, 4B, 4C, 4D). A method for roughness and/or defect measurement is also described.
-
公开(公告)号：WO2022189088A1
公开(公告)日：2022-09-15
申请号：PCT/EP2022/053207
申请日：2022-02-10
Applicant: ASML NETHERLANDS B.V.
Inventor： TREES, Dietmar, Uwe, Herbert , DRIESSEN, Theodorus, Wilhelmus , SAMS, Benjamin, Andrew , ATENCIO, Edgardo, Zamora , DVORAK, Ondrej
IPC: F16K13/10 , F16K99/00 , F16L55/103 , H05G2/00
Abstract: A component for a target material transfer system for a laser-produced plasma radiation source and a method of manufacturing such a component are disclosed. The component, which may, for example, be a target material transfer line, a freeze valve, or a flow restrictor, or some combination of this functionality, is made up of a glass capillary body sealed with glass-to-metal seals at both of its ends to a respective metal fitting. The method of manufacturing involves heating the ends of the glass capillary and then forming them to conform with, and forming a glass-to-metal seal with, the interior contours of the respective channels in each of the metal fittings.
-
公开(公告)号：WO2022179739A1
公开(公告)日：2022-09-01
申请号：PCT/EP2021/086729
申请日：2021-12-20
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: Disclosed herein is a method for representing control parameter data for controlling a lithographic apparatus during a scanning exposure of an exposure field on a substrate, the method comprising: obtaining a set of periodic base functions, each base function out of said set of periodic base functions having a different frequency and a period smaller than a dimension associated with the exposure field across which the lithographic apparatus needs to be controlled; obtaining the control parameter data; and determining a representation of said control parameter data using the set of periodic base functions.
-
Patent Agency Ranking
公开(公告)号：WO2022174991A1
公开(公告)日：2022-08-25
申请号：PCT/EP2022/050490
申请日：2022-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , REININK, Johan , REIJNDERS, Marinus, Petrus , NIENHUYS, Han-Kwang , O'DWYER, David , ROOBOL, Sander, Bas , PORTER, Christina, Lynn , EDWARD, Stephen
Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.
-
公开(公告)号：WO2022167179A1
公开(公告)日：2022-08-11
申请号：PCT/EP2022/050489
申请日：2022-01-12
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Abstract: An optical filter apparatus comprising an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at said optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.
-
178.发明申请
公开(公告)号：WO2022167178A1
公开(公告)日：2022-08-11
申请号：PCT/EP2022/050480
申请日：2022-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN LAARHOVEN, Hendrik, Adriaan , VAN DEN BROEK, Bastiaan, Maurice , RUTIGLIANI, Vito, Daniele
IPC: G03F7/20
Abstract: Disclosed is a method of determining a measurement recipe for measurement of in-die targets (IDM) located within one or more die areas of an exposure field (EF). The method comprises obtaining first measurement data relating to measurement of a plurality of reference targets (RF) and second measurement data relating to measurement of a plurality of in-die targets (IDM), said targets having respective different overlay biases and measured using a plurality of different acquisition settings for acquiring said measurement data. One or more machine learning models are trained using said first measurement data to obtain a plurality of candidate measurement recipes, wherein said candidate measurement recipes comprise a plurality of combinations of a trained machine learned model and a corresponding acquisition setting; and a preferred measurement recipe is determined from said candidate measurement recipes using said second measurement data.
-
公开(公告)号：WO2022167177A1
公开(公告)日：2022-08-11
申请号：PCT/EP2022/050471
申请日：2022-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： TEN BERGE, Gerardus, Ferdinandus , HENDRIKS, Jimi
Abstract: There is described a lithographic apparatus including a membrane assembly and a radiation beam path, wherein the membrane assembly includes a membrane, the membrane being disposed in the radiation beam path, wherein the membrane assembly is configured to selectively move the membrane from a first position in the radiation beam path to a second position in the radiation beam path. Also described is a membrane assembly, a method of extending the lifespan of a membrane, and the use of such apparatuses and methods in a lithographic apparatus or process.
-
公开(公告)号：WO2022161736A1
公开(公告)日：2022-08-04
申请号：PCT/EP2021/087888
申请日：2021-12-30
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
IPC: G03F7/20
Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.
-
-
-
-
-
-
-
-
-
Search Results
14605
records
(took 0.074 seconds)
