公开(公告)号：US07386210B2

公开(公告)日：2008-06-10

申请号：US11538334

申请日：2006-10-03

Applicant: Julia A. Farroni ,  Adrian Carter ,  Kanishka Tankala

Inventor： Julia A. Farroni ,  Adrian Carter ,  Kanishka Tankala

IPC: G02B6/00

CPC classification number: G02B6/02114 ,  C03B37/01217 ,  C03B37/01231 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/31 ,  G02B6/024

Abstract: An optical fiber comprises a photosensitive core that includes a concentration of a first material that increases the refractive index of the core and a concentration of a second material that is other than boron and that reduces the refractive index of the core. A cladding is disposed about the core for tending to confine light to the core. The fiber also includes at least one longitudinally extending region having a thermal coefficient of expansion that is different from the thermal coefficient of expansion of the cladding. In another embodiment, the core includes a concentration of germanium and a concentration of boron. Also disclosed is a polarization-maintaining double-clad (PM DC) fiber comprising one or both of at least one circular axially extending stress inducing region(s) and an inner cladding comprising a circular outer perimeter. Fibers according to the invention can include a rare earth dopant for emitting light of a selected wavelength responsive to being pumped by pump light of a pump wavelength that is different than the selected wavelength.

Abstract translation: 光纤包括感光芯，其包括提高芯的折射率的第一材料的浓度和不同于硼的第二材料的浓度，并降低芯的折射率。 围绕芯部布置包层以倾向于将光限制在芯部上。 纤维还包括具有不同于包层的热膨胀系数的热膨胀系数的至少一个纵向延伸区域。 在另一个实施方案中，芯包括锗的浓度和硼的浓度。 还公开了一种包括至少一个圆形轴向延伸的应力诱导区域和包含圆形外周边的内包层中的一个或两个的偏振保持双包层（PMDC）光纤。 根据本发明的纤维可以包括用于发射选定波长的光的稀土掺杂剂，其响应于通过不同于所选波长的泵浦波长的泵浦光泵浦。

公开(公告)号：US20070207911A1

公开(公告)日：2007-09-06

申请号：US11747698

申请日：2007-05-11

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Noriaki Shimodaira ,  Shinya Kikugawa ,  Naoki Sugimoto

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Noriaki Shimodaira ,  Shinya Kikugawa ,  Naoki Sugimoto

IPC: C03C3/06 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/42 ,  G03F7/70958

Abstract: Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.

Abstract translation: 常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。

公开(公告)号：US20060276323A1

公开(公告)日：2006-12-07

申请号：US11435887

申请日：2006-05-18

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/30 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/50 ,  C03C2203/54

Abstract: A silica glass containing from 3 to 10 mass % of TiO2, which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE0 to 100, of 0±300 ppb/° C. and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, i.e. T200 to 700, of at most 80%.

Abstract translation: 含有3〜10质量％的TiO 2的二氧化硅玻璃，其热膨胀系数为0〜100℃，即CTE 0〜100℃ 0〜300ppb /℃，在200〜700nm的波长区域内的每mm厚度的内部透射率，即200〜700℃，为80％以下。

公开(公告)号：US06988377B2

公开(公告)日：2006-01-24

申请号：US10302347

申请日：2002-11-22

Applicant: James J. Bernas ,  Bradley F. Bowden ,  Kenneth E. Hrdina

Inventor： James J. Bernas ,  Bradley F. Bowden ,  Kenneth E. Hrdina

IPC: C03B19/06

CPC classification number: C03C3/06 ,  B33Y80/00 ,  C03B19/06 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/10

Abstract: A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.

公开(公告)号：US20050272590A1

公开(公告)日：2005-12-08

申请号：US11172950

申请日：2005-07-05

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03C3/06 ,  C03C3/112 ,  C03C4/00 ,  G03F1/22 ,  G03F1/24 ,  H01L21/027 ,  C03C3/076 ,  C03B19/06 ,  C03B37/018

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多​​孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US20050245383A1

公开(公告)日：2005-11-03

申请号：US11174533

申请日：2005-07-06

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03B20/00 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1484 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/42

Abstract: A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其特征在于，在30mm×30mm的区域内，折射率（Deltan）的波动至多为2×10 -4〜 飞机 含有TiO 2的二氧化硅玻璃，其特征在于TiO 2浓度为1质量％以上，条纹间距为10μm以下。 一种用于EUV光刻的光学材料，其特征在于其由含有TiO 2的二氧化硅玻璃制成，并且折射率（Deltan）的波动为至多2×10 -4 >垂直于入射光方向的平面。 一种用于EUV光刻的光学材料，其特征在于其由含有TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且差异 在垂直于入射光方向的平面中，TiO 2 2 浓度的最大值和最小值之间的浓度至多为0.06质量％。

公开(公告)号：US20050092029A1

公开(公告)日：2005-05-05

申请号：US10701175

申请日：2003-11-04

Applicant: Won-Taek Han ,  Yune-Hyoun Kim ,  Tae-Jung Ahn

Inventor： Won-Taek Han ,  Yune-Hyoun Kim ,  Tae-Jung Ahn

IPC: C03B37/014 ,  C03B37/018 ,  C03C13/04 ,  C03C25/60

CPC classification number: C03B37/01838 ,  C03B37/01433 ,  C03B2201/10 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/42 ,  C03C13/046 ,  C03C25/601

Abstract: Disclosed is a method of fabricating an optical fiber or an optical device doped with reduced metal ion and/or rare earth ion, comprising steps of: forming a partially-sintered fine structure in a base material for fabricating the optical fiber or the optical device; soaking the fine structure into a doping solution containing a reducing agent together with metal ion and rare earth ion during a selected time; drying the fine structure in which the metal ion and/or rare ion are/is soaked; and heating the fine structure such that the fine structure is sintered.

Abstract translation: 公开了一种制造光纤或掺杂有还原金属离子和/或稀土离子的光学器件的方法，包括以下步骤：在用于制造光纤或光学器件的基底材料中形成部分烧结的精细结构; 在选定的时间内将精细结构与金属离子和稀土离子一起浸入含有还原剂的掺杂溶液中; 干燥其中金属离子和/或稀有离子被浸泡的精细结构; 并加热精细结构，使得精细结构烧结。

公开(公告)号：US06574991B1

公开(公告)日：2003-06-10

申请号：US09658200

申请日：2000-09-08

Applicant: Robert S. Pavlik, Jr. ,  Lawrence H. Kotacska

Inventor： Robert S. Pavlik, Jr. ,  Lawrence H. Kotacska

IPC: C03B514

CPC classification number: C03B19/1407 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/50 ,  C04B35/10 ,  F27B9/26 ,  F27B17/00 ,  F27D1/0006 ,  F27D1/0043 ,  F27D3/0033

Abstract: An article of relatively pure silica, and a furnace and method of producing the article. The article is produced by collecting molten silica particles in a refractory furnace in which at least a portion of the refractory has been exposed to a halogen-containing gas to react with contaminating metal ions in the refractory.

Abstract translation: 相对纯二氧化硅的制品，以及制造该制品的炉子和方法。 该制品通过在难熔炉中收集熔融二氧化硅颗粒而制备，其中耐火材料的至少一部分暴露于含卤素的气体中以与耐火材料中的污染金属离子反应。

公开(公告)号：US20030027054A1

公开(公告)日：2003-02-06

申请号：US09920227

申请日：2001-08-01

Inventor： Laura J. Ball ,  Sylvain Rakotoarison

IPC: G03F009/00 ,  G21H001/00 ,  G21H005/00 ,  B01J019/08 ,  H01F041/00

CPC classification number: C03B19/1423 ,  C03B19/01 ,  C03B19/1415 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C23C16/401 ,  C23C16/513

Abstract: A method of making fused silica includes generating a plasma, delivering reactants comprising a silica precursor into the plasma to produce silica particles, and depositing the silica particles on a deposition surface to form glass.

Abstract translation: 制造熔融二氧化硅的方法包括产生等离子体，将包含二氧化硅前体的反应物输送到等离子体中以产生二氧化硅颗粒，并将二氧化硅颗粒沉积在沉积表面上以形成玻璃。

公开(公告)号：US20020076559A1

公开(公告)日：2002-06-20

申请号：US09935334

申请日：2001-08-22

Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida ,  Akira Fujinoki ,  Kyoichi Inaki ,  Tomoyuki Shirai

IPC: C03B008/02 ,  B32B017/06

CPC classification number: C30B31/14 ,  C03B19/01 ,  C03B19/066 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/06 ,  C03C2201/32 ,  C30B25/12 ,  C30B35/00 ,  Y10T428/24496 ,  Y10T428/26 ,  Y10T428/315

Abstract: An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.

Abstract translation: 本发明的目的是提供一种石英玻璃体，特别是用于等离子体反应的石英玻璃夹具，用于制造具有优异的耐等离子体腐蚀性的半导体，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。 提供由含有金属元素并具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 3小于100mm 2的投影面积表示的量的气泡和结晶相。