公开(公告)号：WO2006113126A2

公开(公告)日：2006-10-26

申请号：PCT/US2006/012608

申请日：2006-04-03

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

Inventor： WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

IPC: G03F1/00 ,  G03C5/00 ,  G06K9/00

CPC classification number: G03F1/84 ,  G03F1/38 ,  G03F1/50 ,  G03F7/70433 ,  G03F7/70625 ,  Y10S430/146

Abstract: Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may "heal" the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.

Abstract translation: 网状物可以包括用于局部改变光罩光学性质的遮蔽元件（SE）。 然而，由于辐射可能“治愈”SE，因此在光刻过程中由于反复暴露于辐射而导致这样的掩模版可能随时间而降解。 公开了用于监测掩模版的技​​术，以便保持关于掩模版的光学性质和将使用掩模版印刷的晶片上的图案的均匀性的置信度。 网格线进行定期检查，包括掩模版传输测量和/或掩模版的空中成像。 当这种检查表明足够的掩模版降解时，标线片被标记以在其后续在光刻工艺中使用之前进行校正。

公开(公告)号：WO2006105122A2

公开(公告)日：2006-10-05

申请号：PCT/US2006/011342

申请日：2006-03-28

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  SHAFER, David ,  ARMSTRONG, Joseph, J.

Inventor： CHUANG, Yung-Ho ,  SHAFER, David ,  ARMSTRONG, Joseph, J.

IPC: G02B23/00

CPC classification number: G02B17/0892 ,  G02B17/0812 ,  G02B17/0856 ,  G02B21/02 ,  G02B21/04 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

Abstract: A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group comprising at least one focusing lens configured to receive light energy and form focused light energy. The focused light energy forms an intermediate image. The objective further comprises at least one field lens located in proximity to an intermediate image, and a catadioptric arrangement positioned to receive the intermediate light energy from the at and form controlled light energy. The catadioptric arrangement may comprise at least one Mangin element and can include a meniscus lens element.

Abstract translation: 提供了用于成像试样的相对高的光谱带宽目标和用于成像试样的方法。 该目的包括透镜组，其包括被配置为接收光能并形成聚焦光能的至少一个聚焦透镜。 聚焦光能形成中间图像。 该目的还包括位于中间图像附近的至少一个场透镜，以及定位成从中接收中间光能并形成受控光能的反射折射结构。 折反射装置可以包括至少一个Mangin元件并且可以包括弯月形透镜元件。

公开(公告)号：WO2006045095A3

公开(公告)日：2006-04-27

申请号：PCT/US2005/038046

申请日：2005-10-19

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  SOLARZ, Richard, William

Inventor： SOLARZ, Richard, William

IPC: G02B6/032

Abstract: An apparatus for inspecting a specimen, such as a semiconductor wafer, is provided. The apparatus comprises a laser energy source, such as a deep ultraviolet (DUV) energy source and an optical fiber arrangement. The optical fiber arrangement comprises a core surrounded by a plurality of optical fibers structures used to frequency broaden energy received from the laser energy source into frequency broadened radiation. The frequency broadened radiation is employed as an illumination source for inspecting the specimen. In one aspect, the apparatus comprises a central core and a plurality of structures generally surrounding the central core, the plurality of fibers surround a hollow core fiber filled with a gas at high pressure, a tapered photonic fiber, and/or a spider web photonic crystalline fiber, configured to receive light energy and produce frequency broadened radiation for inspecting the specimen.

公开(公告)号：WO2005109317A2

公开(公告)日：2005-11-17

申请号：PCT/US2005/015206

申请日：2005-05-02

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MILLER, Lawrence, R.

Inventor： MILLER, Lawrence, R.

IPC: G06K9/00

CPC classification number: G06T7/0004 ,  G01N21/9501 ,  G01N2021/95615 ,  G01N2021/95676 ,  G06T2207/30148

Abstract: Disclosed is an image processing system for analyzing images of a specimen to determine whether the specimen contains defects. The system includes a plurality of processors (202, 306) for receiving image data from a specimen and for analyzing one or more selected patch(es) of such image data to determine whether the specimen has a defect. The system also includes a plurality of buses (206, 450) for coupling the processors together, wherein the bus has the following specifications: a data rate of about 50 gigabits per second or more and an error rate less than about 10 -16 . In one implementation, the buses are low voltage differential signal type buses, and in another implementation, the buses are hyper transport type buses.

Abstract translation: 公开了一种用于分析样本的图像以确定样本是否包含缺陷的图像处理系统。 该系统包括用于从样本接收图像数据并用于分析这些图像数据的一个或多个所选贴片的多个处理器（202,306），以确定样本是否具有缺陷。 该系统还包括用于将处理器连接在一起的多个总线（206,450），其中总线具有以下规格：大约50吉比特每秒或更大的数据速率和小于约10-16的错误率 。 在一个实施中，总线是低压差分信号型总线，在另一实现中，总线是超传输型总线。

公开(公告)号：WO2004092716A1

公开(公告)日：2004-10-28

申请号：PCT/US2004/010324

申请日：2004-04-05

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  LANGE, Steven, R.

Inventor： LANGE, Steven, R.

IPC: G01N21/95

CPC classification number: G01N33/54366 ,  G01N21/9501

Abstract: A surface inspection apparatus and method are disclosed. In particular, the method and apparatus are capable of inspecting a surface in two (or more) optical regimes thereby enhancing the defect detection properties of such method and apparatus. A method involves illuminating the surface with light in a first wavelength range and a second wavelength range. The first wavelength range selected so that the surface is opaque to the light of the first wavelength range so that a resultant optical signal is produced that is predominated by diffractive and scattering properties of the surface. The second wavelength range is selected so that the surface is at least partially transmissive to light in the second wavelength range so that another resultant optical signal is produced that is predominated by thin film optical properties of the surface. The resultant optical signals are detected and processed to detect defects in the surface. Devices for implementing such methods are also disclosed.

Abstract translation: 公开了一种表面检查装置和方法。 特别地，该方法和装置能够在两个（或多个）光学方式中检查表面，从而增强了这种方法和装置的缺陷检测特性。 一种方法包括用在第一波长范围和第二波长范围内的光来照射该表面。 选择的第一波长范围使得表面对于第一波长范围的光是不透明的，使得产生以表面的衍射和散射性质为主的所得光信号。 选择第二波长范围，使得表面对于第二波长范围内的光至少部分透射，从而产生以表面的薄膜光学性质为主的另外产生的光信号。 检测并处理所得到的光信号以检测表面中的缺陷。 还公开了用于实现这些方法的装置。

公开(公告)号：WO2004066028A2

公开(公告)日：2004-08-05

申请号：PCT/US2004/001570

申请日：2004-01-20

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MIEHER, Walter, D. ,  MACK, Chris ,  HANKINSON, Matt

Inventor： MIEHER, Walter, D. ,  MACK, Chris ,  HANKINSON, Matt

IPC: G03F

CPC classification number: G03F7/70558 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8416 ,  G03F7/70483 ,  G03F7/70533 ,  G03F7/70625 ,  G03F7/70641 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method for determining one or more process parameter settings of a photolithographic system is disclosed.

Abstract translation: 公开了一种用于确定光刻系统的一个或多个工艺参数设置的方法。

公开(公告)号：WO2004025848A1

公开(公告)日：2004-03-25

申请号：PCT/US2003/028593

申请日：2003-09-10

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： VAEZ-IRAVANI, Mehdi

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/474 ,  G01N21/956

Abstract: A compact surface inspection optical head is disclosed which comprises a frame with two rings of apertures (12a, 12b) therein. The first set of apertures (12a) surrounding and close to a normal direction (20’) to the surface to be inspected is connected to fibers used to collect scattered radiation useful for the detection of micro-scratches caused by chemical and mechanical polishing. A second ring of apertures (12b) at low elevation angles to the surface inspected is connected to fibers to collect radiation scattered by the surface inspected for anomaly detectoin on patterned surfaces. This ring of apertures (12b) segments azimuthally the collection space so that the signal outputs from detectors that are saturated by the pattern diffraction or scattering may be discarded and only the outputs of unsaturated detectors are used for anomaly detection. A pair of larger apertures (12c) in the double dark field positions may be employed for anomaly detection on unpatterned surfaces.

Abstract translation: 公开了一种紧凑的表面检查光学头，其包括其中具有两个孔环的框架。 围绕和接近待检查表面的正常方向的第一组孔径连接到用于收集用于检测由化学和机械抛光引起的微划痕的散射辐射的纤维。 在这些孔的位置被选择为远离图案化散射或衍射的情况下，这些孔及其相关联的纤维可用于图案化表面上的异常检测。 与被检查的表面的低仰角的第二个孔环连接到纤维上以收集由被检查的表面散射的辐射以在图案化表面上的异常检测。 这个孔环以方位方式分段收集空间，从而可以丢弃由图案衍射或散射饱和的检测器的信号输出，并且仅使用不饱和检测器的输出进行异常检测。 双暗场位置中的一对较大的孔可用于未图案化表面上的异常检测。 通过两个较大孔径的散射辐射可以被物镜或纤维束收集。

公开(公告)号：WO2003104929A3

公开(公告)日：2003-12-18

申请号：PCT/US2003/017899

申请日：2003-06-05

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： SELIGSON, Joel, L. ,  GHINOVKER, Mark ,  IZIKSON, Pavel ,  SIMKIN, Boris ,  ROBINSON, John ,  ADEL, Michael, E. ,  TULIPMAN, David

IPC: G06K9/00

Abstract: Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target. In other embodiments, an overlay and/or stepper analysis procedure is then performed based on the systematic error metric and/or the noise metric, as well as the overlay data.

公开(公告)号：WO2003040714A1

公开(公告)日：2003-05-15

申请号：PCT/US2002/036037

申请日：2002-11-07

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： JANIK, Gary ,  MOORE, Jeffrey

IPC: G01N23/20

CPC classification number: G01B15/02

Abstract: Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. An oblong x-ray beam can be produced by shaping the electron beam in an x-ray microfocus tube, or by creating a target with a metal strip having the desired beam cross section. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.

Abstract translation: 通过最小化散射和光束扩散效应可以增强x射线反射系统中的薄膜厚度测量精度。 可以通过在x射线微焦点管中成形电子束或通过用具有期望的束截面的金属条创建靶来制造长方形X射线束。 伸长率允许梁方向尺寸大大减小，而不会导致靶材过热。 通过阻挡聚焦在薄膜上的X射线束的部分并以增量产生反射率曲线，可以使散射的影响最小化。

公开(公告)号：WO2003029799A1

公开(公告)日：2003-04-10

申请号：PCT/US2002/031518

申请日：2002-10-01

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： NASSER-GHODSI, Mehran ,  TESTONI, Anne ,  OESTREICH, Steve

IPC: G01N23/223

CPC classification number: G01N23/20

Abstract: The present invention provides a system for characterizing voids (411) in test samples. An X-ray emission inducer scans a target such as a via on a test sample. A metallization (409) or thin film layer (405) emits X-rays as a result of the scan. The X-ray emission intensity can be measured and compared against a control measurement. The information obtained can be used to characterize a void in the scan target.

Abstract translation: 本发明提供一种用于表征测试样品中的空隙（411）的系统。 X射线发射诱导器在测试样品上扫描诸如通孔的靶。 作为扫描的结果，金属化（409）或薄膜层（405）发射X射线。 可以测量X射线发射强度并与对照测量进行比较。 获得的信息可用于表征扫描目标中的空白。