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    Apparatus and method for flow of process gas in an ultra-clean environment
    14.
    发明专利
    Apparatus and method for flow of process gas in an ultra-clean environment 未知

    公开(公告)号：AU9322501A

    公开(公告)日：2002-03-13

    申请号：AU9322501

    申请日：2001-08-28

    Applicant: REFLECTIVITY INC

    Inventor： PATEL SATYADEV ,  SCHAADT GREGORY P ,  MACDONALD DOUGLAS B ,  MACDONALD NILES K

    IPC: H01L21/302 ,  B81B3/00 ,  C03C15/00 ,  C23F1/00 ,  C23F1/08 ,  C23F1/12 ,  C25F3/12 ,  H01L20060101 ,  H01L21/00

    Abstract: Processes for the addition or removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the use of recirculation of the process gas. Recirculation is effected by a pump that has no sliding or abrading parts that contact the process gas, nor any wet (such as oil) seals or purge gas in the pump. Improved processing can be achieved by a process chamber that contains a baffle, a perforated plate, or both, appropriately situated in the chamber to deflect the incoming process gas and distribute it over the workpiece surface. In certain embodiments, a diluent gas is added to the recirculation loop and continuously circulated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop. Also, cooling of the process gas, etching chamber and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample of microscopic dimensions.

    A method for forming a micromechanical device
    17.
    发明专利
    A method for forming a micromechanical device 未知

    公开(公告)号：AU3298701A

    公开(公告)日：2001-08-07

    申请号：AU3298701

    申请日：2001-01-25

    Applicant: REFLECTIVITY INC

    Inventor： TRUE RANDALL J ,  HUIBERS ANDREW G

    IPC: B81B3/00 ,  G02B26/08 ,  H01L21/00 ,  G02B26/00

    Abstract: A method is disclosed for forming a micromechanical device. The method includes providing a sacrificial layer on a substrate, providing a first structural layer on the sacrificial layer and removing a portion of the first structural layer in an area intended for a hinge. Then, a second structural layer is provided over the first layer and in the removed area for the hinge. The second layer is preferably deposited directly on the sacrificial layer in this area. Last, a metal layer is deposited and the various layers are patterned to define a micromechanical device having one portion (e.g. a mirror plate) more stiff than another portion (e.g. hinge). Because a portion of the reinforcing layer is removed, there is no overetching into the hinge material. Also, because the metal layer is provided last, materials can be provided at higher temperatures, and the method can be performed in accordance with CMOS foundry rules and thus can be performed in a CMOS foundry.

    A double substrate reflective spatial light modulator with self-limiting micro-mechanical elements
    18.
    发明专利
    A double substrate reflective spatial light modulator with self-limiting micro-mechanical elements 未知

    公开(公告)号：AU9583798A

    公开(公告)日：2000-04-10

    申请号：AU9583798

    申请日：1998-09-24

    Applicant: REFLECTIVITY INC

    Inventor： HUIBERS ANDREW GERRIT

    IPC: B81B3/00 ,  G02B26/08 ,  G02B26/00

    Abstract: A spatial light modulator (12) includes an upper optically transmissive substrate (20) held above a lower substrate (34) containing addressing circuitry (36). One or more electrostatically deflectable elements (48) are suspended by hinges (50) from the upper substrate (20). In operation, individual mirrors (48) are selectively deflected and serve to spatially modulate light (56) that is incident to, and then reflected back through, the upper substrate (20). Motion stops (49) may be attached to the reflective deflectable elements so that the mirror (48) does not snap to the bottom substrate (34). Instead, the motion stop (49) rests against the upper substrate (20) thus limiting the deflection angle of the reflective deflectable elements (48).

    上方具有類絞鍊裝置及可偏離零件之可偏離空間光調變器
    19.
    发明专利
    上方具有類絞鍊裝置及可偏離零件之可偏離空間光調變器 失效
    上方具有类绞炼设备及可偏离零件之可偏离空间光调制器

    公开(公告)号：TW588398B

    公开(公告)日：2004-05-21

    申请号：TW090101584

    申请日：2001-02-19

    Applicant: 雷弗萊提維提公司 REFLECTIVITY, INC.

    Inventor： 安德魯G 輝伯斯 ANDREW G. HUIBERS ,  彼得J 休利可絲 PETER J. HEUREUX

    IPC: B81B ,  G02B ,  H01L

    CPC classification number: G02B26/0841

    Abstract: 一空間光調變器，其具有一基板，該基板上支撐一可偏離(例如鏡子)元件的陣列。該可偏離元件經由其相對應之絞鏈以可偏離之方式耦合至基板，其中每一絞鏈配置於該可偏離元件之一側，而該基板則位於該可偏離元件之另一側，經由此絞鏈之置放形式，陣列的充填(fill)因數得以改善。絞鏈可以達到與該可偏離元件齊平的位置，或者可與可偏離元件存在一間隙。絞鏈可經由一或多個支柱或牆而附著連接至基板，並具有一易彎曲或可變形的部分，從基板(例如玻璃基板)看去時這些部份會完全或大體上完全被隱藏。在一實施例中，絞鏈被連結至基板和可偏離元件的下側，並往可偏離元件的中心部分連接。如此，絞鏈的長度可為較長者，也因此可降低絞鏈上任何部分的應力。本發明的優點包括：(1)當力矩絞鏈隱藏在反射板後面時，填充因數會增加；(2)由於光散射光表面較少及控制角度和幾何結構之能力增加，對比因此增加；且(3)幾何結構的設計較為彈性，用以在製造上使電機械性能和堅韌性達到最佳化。

    Abstract in simplified Chinese: 一空间光调制器，其具有一基板，该基板上支撑一可偏离(例如镜子)组件的数组。该可偏离组件经由其相对应之绞链以可偏离之方式耦合至基板，其中每一绞链配置于该可偏离组件之一侧，而该基板则位于该可偏离组件之另一侧，经由此绞链之置放形式，数组的充填(fill)因子得以改善。绞链可以达到与该可偏离组件齐平的位置，或者可与可偏离组件存在一间隙。绞链可经由一或多个支柱或墙而附着连接至基板，并具有一易弯曲或可变形的部分，从基板(例如玻璃基板)看去时这些部份会完全或大体上完全被隐藏。在一实施例中，绞链被链接至基板和可偏离组件的下侧，并往可偏离组件的中心部分连接。如此，绞链的长度可为较长者，也因此可降低绞链上任何部分的应力。本发明的优点包括：(1)当力矩绞链隐藏在反射板后面时，填充因子会增加；(2)由于光散射光表面较少及控制角度和几何结构之能力增加，对比因此增加；且(3)几何结构的设计较为弹性，用以在制造上使电机械性能和坚韧性达到最优化。

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