公开(公告)号：AU2003295983A8

公开(公告)日：2004-06-18

申请号：AU2003295983

申请日：2003-11-25

Applicant: REFLECTIVITY INC

Inventor： PATEL SATYADEV R ,  DUBOC ROBERT M ,  HUIBERS ANDREW G

IPC: B81B3/00 ,  B81B7/04 ,  G02B26/08 ,  G02B26/00

公开(公告)号：AU2002303842A1

公开(公告)日：2002-12-03

申请号：AU2002303842

申请日：2002-05-22

Applicant: REFLECTIVITY INC

Inventor： PATEL SATYADEV R ,  SCHAADT GREGORY P ,  HUIBERS ANDREW G ,  HEUREUX PETER J

IPC: B81B3/00 ,  C23F1/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461 ,  B81C5/00 ,  G02B26/08

Abstract: An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

公开(公告)号：AU8019000A

公开(公告)日：2001-05-08

申请号：AU8019000

申请日：2000-10-13

Applicant: REFLECTIVITY INC

Inventor： PATEL SATYADEV R ,  SCHAADT GREGORY P ,  MACDONALD DOUGLAS B

IPC: H01L21/306 ,  H01L21/308 ,  C03C15/00

公开(公告)号：AU2003295983A1

公开(公告)日：2004-06-18

申请号：AU2003295983

申请日：2003-11-25

Applicant: REFLECTIVITY INC

Inventor： HUIBERS ANDREW G ,  PATEL SATYADEV R ,  DUBOC ROBERT M

IPC: B81B3/00 ,  B81B7/04 ,  G02B26/08

公开(公告)号：WO2004049017A2

公开(公告)日：2004-06-10

申请号：PCT/US0337941

申请日：2003-11-25

Applicant: REFLECTIVITY INC ,  HUIBERS ANDREW G ,  PATEL SATYADEV R ,  DUBOC ROBERT M

Inventor： HUIBERS ANDREW G ,  PATEL SATYADEV R ,  DUBOC ROBERT M

IPC: B81B3/00 ,  B81B7/04 ,  G02B26/08 ,  G02B

CPC classification number: G02B26/0841 ,  B82Y30/00 ,  Y10T428/30

Abstract: A projection system, a spatial light modulator, and a method for forming micromirrors are disclosed. A substrate comprises circuitry and electrodes for electrostatically deflecting micromirror elements that are disposed within an array of such elements forming the spatial light modulator. In one embodiment, the substrate is a silicon substrate having circuitry and electrodes thereon for electrostatically actuating adjacent micromirror elements, and the substrate is fully or selectively covered with a light absorbing material.

Abstract translation: 公开了投影系统，空间光调制器和用于形成微镜的方法。 衬底包括用于静电偏转微镜元件的电路和电极，微镜元件设置在形成空间光调制器的这种元件的阵列内。 在一个实施例中，衬底是具有电路和电极的硅衬底，用于静电地驱动相邻的微镜元件，并且衬底被完全或选择性地覆盖有光吸收材料。

公开(公告)号：WO2004087561A3

公开(公告)日：2004-12-29

申请号：PCT/US2004009222

申请日：2004-03-24

Applicant: REFLECTIVITY INC ,  PATEL SATYADEV R ,  DOAN JONATHAN

Inventor： PATEL SATYADEV R ,  DOAN JONATHAN

IPC: B81B20060101 ,  B81B3/00 ,  H01L21/00

CPC classification number: B81C1/00476 ,  B81B2201/042 ,  B81C2201/0107

Abstract: A sacrificial layer and a method for applying said sacrificial layer in fabricating microelectromechanical devices are disclosed herein. The sacrificial layer comprises an early transition metal. Specifically, the sacrificial layer comprises an early transition metal element, an early transition metal alloy or an early transition metal silicide.

公开(公告)号：WO2004072696A2

公开(公告)日：2004-08-26

申请号：PCT/US2004004441

申请日：2004-02-11

Applicant: REFLECTIVITY INC ,  PATEL SATYADEV R ,  HUIBERS ANDREW G

Inventor： PATEL SATYADEV R ,  HUIBERS ANDREW G

IPC: G02B26/08 ,  G03B21/28 ,  G02B

CPC classification number: G03B21/28 ,  G02B26/0841

Abstract: A spatial light modulator is disclosed, along with methods for making such a modulator, that comprises an array of micromirrors each having a hinge and a micromirror plate held via the hinge on a substrate, the micromirror plate being disposed in a plane separate from the hinge and having a diagonal extending across the micromirror plate, the micromirror plate being attached to the hinge such that the micromirror plate can rotate along a rotation axis that is parallel to, but off-set from the diagonal of the micromirror plate. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造这种调制器的方法，其包括每个具有铰链的微镜阵列和通过铰链固定在基板上的微镜板，微镜板设置在与铰链相分离的平面中 并且具有延伸穿过微镜板的对角线，微镜板附接到铰链，使得微镜板可以沿着与微镜板的对角线平行但偏离的旋转轴线旋转。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：WO2004102229A2

公开(公告)日：2004-11-25

申请号：PCT/US2004015008

申请日：2004-05-13

Applicant: REFLECTIVITY INC ,  PATEL SATYADEV R ,  HUIBERS ANDREW G ,  SPINDT CHRISTOPHER ,  HEUREUX PETER

Inventor： PATEL SATYADEV R ,  HUIBERS ANDREW G ,  SPINDT CHRISTOPHER ,  HEUREUX PETER

IPC: B81B3/00 ,  C10L1/02 ,  G02B20060101 ,  G02B26/00 ,  G02B26/08 ,  G02B

CPC classification number: B81B3/0051 ,  B81B2201/042 ,  B81B2203/058 ,  C10L1/026 ,  G02B26/0841

Abstract: A spatial light modulator is disclosed, along with methods for making such a modulator that comprises an array of mirror devices each having at least a preferably at least a first electrode and a second electrode. The first electrode is designated for driving the mirror plate of the micromirror device to an ON state, and the second electrode is designated for driving the mirror plate to an OFF state. The two electrodes can be disposed on the same side of the mirror plate but on opposite sides of the rotation axis of the mirror plate for driving the mirror plate to rotate in opposite directions. Alternatively, the two electrodes can be disposed on the opposite sides of the mirror plate, but on the same side of the rotation axis of the mirror plate for driving the mirror plate to rotate in opposite directions. The ON state and OFF state of the mirror plate can be defined by stops. The stops may be formed on substrate(s), hinge structures holding the mirror plates of the micromirror device and/or a desired location within the micromirror device. Alternatively, the electrodes for the ON state and the OFF state can be used as stops, either individually or in combination, or in combination with other component(s), such as substrate(s) of the micromirror device. The OFF state angle and the ON state angle are preferably different.

Abstract translation: 公开了一种空间光调制器，以及用于制造这种调制器的方法，该调制器包括每个具有至少优选至少第一电极和第二电极的反射镜装置的阵列。 第一电极被指定用于将微镜器件的镜板驱动到ON状态，并且第二电极被指定用于将镜板驱动到OFF状态。 两个电极可以设置在镜板的相同侧上，但是可以设置在镜板的旋转轴的相对侧上，用于驱动镜板沿相反方向旋转。 或者，两个电极可以设置在镜板的相对侧上，但是设置在用于驱动镜板的相反方向旋转的镜板的旋转轴的同一侧。 镜片的ON状态和OFF状态可以通过停止来定义。 止动件可以形成在基底上，保持微镜装置的镜板的铰链结构和/或微镜装置内的期望位置。 或者，用于ON状态和OFF状态的电极可以单独地或组合地用作停止，或者与诸如微镜装置的基板的其它部件组合使用。 OFF状态角度和ON状态角度优选地不同。

公开(公告)号：WO2005049481A3

公开(公告)日：2005-09-09

申请号：PCT/US2004024206

申请日：2004-07-26

Applicant: REFLECTIVITY INC ,  PATEL SATYADEV R ,  HUIBERS ANDREW G

Inventor： PATEL SATYADEV R ,  HUIBERS ANDREW G

IPC: B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors.In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过接触件连接到铰链，并且镜板和铰链之间的距离根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定。在制造方法中 这样的空间光调制器，一个牺牲层沉积在衬底上，随后形成镜面板，另一牺牲层沉积在镜面板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：WO2005010933A2

公开(公告)日：2005-02-03

申请号：PCT/US2004018818

申请日：2004-06-10

Applicant: REFLECTIVITY INC ,  PATEL SATYADEV R ,  HUIBERS ANDREW G

Inventor： PATEL SATYADEV R ,  HUIBERS ANDREW G

IPC: G02B26/00 ,  G02B26/08 ,  H01L20060101 ,  H01L21/00 ,  H01L

CPC classification number: G02B26/0841

Abstract: A micromirror device is disclosed, along with a method of making such a micromirror device that comprises a mirror plate, a hinge and an extension plate. The extension plate is formed on the mirror plate and between the mirror plate and the electrode associated with the mirror plate for rotating the mirror plate. The.extension plate can be metallic or dielectric. Also disclosed is a method of making such a micromirror device. In particular, the extension plate is formed after the formation of the mirror plate. Moreover, also disclosed is a projection system that comprises a spatial light modulator having an array of such micromirrors, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种微反射镜装置，以及制造这种微镜装置的方法，其包括镜板，铰链和延伸板。 延伸板形成在镜板上，并且在镜板和与用于旋转镜板的镜板相关联的电极之间。 延伸板可以是金属或电介质。 还公开了制造这种微镜装置的方法。 特别地，在形成镜板之后形成延伸板。 此外，还公开了一种投影系统，其包括具有这种微镜阵列的空间光调制器以及光源聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射光的投影光学器件 从微镜阵列选择性地反射到目标上，以及用于选择性地致动阵列中的微镜的控制器。