POLYMER THICK FILM RESISTOR, LAYOUT CELL, AND METHOD
    14.
    发明申请
    POLYMER THICK FILM RESISTOR, LAYOUT CELL, AND METHOD 审中-公开
    聚合物厚膜电阻,布局单元和方法

    公开(公告)号:WO2004109719A3

    公开(公告)日:2005-04-21

    申请号:PCT/US2004014665

    申请日:2004-05-11

    Abstract: A printed circuit polymer thick film (PTF) resistor (410, 420) includes tolerance control material (425, 426, 440) that substantially surrounds the resistor body (423) and significantly improves the linearity of resistance vs. resistor length, and significantly reduces resistor-to-resistor and board-to-board fabrication variances. In one embodiment (420), the tolerance control material is the same metallic material as the printed circuit conductors (430), and is formed in two finger patterns on each side of the resistor body, each finger pattern connected to one terminal pad (435) of the resistor. A layout cell (700) is used for fabricating the PTF resistor. A method is used for fabricating the PTF resistor.

    Abstract translation: 印刷电路聚合物厚膜(PTF)电阻器(410,420)包括基本上围绕电阻体(423)的公差控制材料(425,426,440),并显着地改善了电阻与电阻器长度的线性度,并显着地降低 电阻 - 电阻和板对板制造差异。 在一个实施例(420)中,公差控制材料是与印刷电路导体(430)相同的金属材料,并且形成在电阻器主体的每一侧上的两个指形图案中,每个指形图案连接到一个端子焊盘(435 )的电阻。 布局单元(700)用于制造PTF电阻。 一种制造PTF电阻的方法。

    MESO-MICROELECTROMECHANICAL SYSTEM HAVING A GLASS BEAM AND METHOD FOR ITS FABRICATION
    18.
    发明申请
    MESO-MICROELECTROMECHANICAL SYSTEM HAVING A GLASS BEAM AND METHOD FOR ITS FABRICATION 审中-公开
    具有玻璃光束的MESO-微电子机电系统及其制造方法

    公开(公告)号:WO2005062950A3

    公开(公告)日:2005-12-01

    申请号:PCT/US2004043415

    申请日:2004-12-22

    CPC classification number: H02N1/006 G02B26/0841

    Abstract: A meso-electromechanical system (900, 1100) includes a substrate (215), a standoff (405, 1160) disposed on a surface of the substrate, a first electrostatic pattern (205, 1105, 1110, 1115, 1120) disposed on the surface of the substrate, and a glass beam (810). The glass beam (810) has a fixed region (820) attached to the standoff and has a second electrostatic pattern (815, 1205, 1210, 1215, 1220) on a cantilevered location of the glass beam. The second electrostatic pattern is substantially co-extensive with and parallel to the first electrostatic pattern. The second electrostatic pattern has a relaxed separation (925) from the first electrostatic pattern when the first and second electrostatic patterns are in a non-energized state. In some embodiments, a mirror is formed by the electrostatic materials that form the second electrostatic pattern. The glass beam may be patterned using sandblasting (140).

    Abstract translation: 中间机电系统(900,1100)包括衬底(215),设置在衬底的表面上的支座(405,1160),设置在衬底上的第一静电图案(205,1105,1110,1115,1120) 基板的表面和玻璃光束(810)。 玻璃束(810)具有附接到支座的固定区域(820),并且在玻璃束的悬臂位置上具有第二静电图案(815,1205,1212,1215,1220)。 第二静电图案与第一静电图案基本上共同并且平行。 当第一静电图案和第二静电图案处于非通电状态时,第二静电图案具有与第一静电图案的松弛分离(925)。 在一些实施例中,由形成第二静电图案的静电材料形成反射镜。 可以使用喷砂将玻璃束图案化(140)。

    MESO-MICROELECTROMECHANICAL SYSTEM HAVING A GLASS BEAM AND METHOD FOR ITS FABRICATION
    20.
    发明申请
    MESO-MICROELECTROMECHANICAL SYSTEM HAVING A GLASS BEAM AND METHOD FOR ITS FABRICATION 审中-公开
    具有玻璃梁的微电子机械系统及其制造方法

    公开(公告)号:WO2005062950A2

    公开(公告)日:2005-07-14

    申请号:PCT/US2004/043415

    申请日:2004-12-22

    CPC classification number: H02N1/006 G02B26/0841

    Abstract: A meso-electromechanical system (900, 1100) includes a substrate (215), a standoff (405, 1160) disposed on a surface of the substrate, a first electrostatic pattern (205, 1105, 1110, 1115, 1120) disposed on the surface of the substrate, and a glass beam (810). The glass beam (810) has a fixed region (820) attached to the standoff and has a second electrostatic pattern (815, 1205, 1210, 1215, 1220) on a cantilevered location of the glass beam. The second electrostatic pattern is substantially co-extensive with and parallel to the first electrostatic pattern. The second electrostatic pattern has a relaxed separation (925) from the first electrostatic pattern when the first and second electrostatic patterns are in a non-energized state. In some embodiments, a mirror is formed by the electrostatic materials that form the second electrostatic pattern. The glass beam may be patterned using sandblasting (140).

    Abstract translation: 中介机电系统(900,1100)包括衬底(215),设置在衬底的表面上的支座(405,1160),第一静电图案(205,1105,1110) ,1115,1120)和玻璃梁(810)。 玻璃梁810具有附接到支座的固定区域820,并且在玻璃梁的悬臂位置上具有第二静电图案815,1205,1210,1215,1220。 第二静电图案与第一静电图案基本共同延伸并且平行于第一静电图案。 当第一静电图案和第二静电图案处于未通电状态时,第二静电图案与第一静电图案具有松弛分离(925)。 在一些实施例中,反射镜由形成第二静电图案的静电材料形成。 玻璃梁可以使用喷砂(140)进行图案化。

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