公开(公告)号：KR1020120082367A

公开(公告)日：2012-07-23

申请号：KR1020120003948

申请日：2012-01-12

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 후꾸오까데쯔오 ,  데라다가즈오 ,  기따노다까히로

IPC: H01G9/058 ,  H01G9/155

CPC classification number: Y02E60/13 ,  H01G13/04 ,  H01G11/06 ,  H01G11/34 ,  H01G11/86 ,  H01G13/02 ,  H01M4/04 ,  H01M4/139 ,  Y02E60/122

Abstract: PURPOSE: An apparatus and a method for manufacturing an electrode and a computer storage medium are provided to control a film thickness of an active material mixture by controlling a distance between a surface of a corresponding roller and the surface of a metal thin film. CONSTITUTION: A unwind roll unwinds a strip-shaped metal film. A coating part applies an active material mixture on both sides of the metal film. A drying part(12) forms the active material layer by drying the active material mixture on the metal film. A winding roll winds the metal film. The drying part comprises a plurality of road heaters(30) irradiating infrared rays, a plurality of reflectors(31) reflecting the infrared rays from the road heater, an air supply outlet(32) supplying air to a dry region between the metal film and the reflector, and an exhaust pipe(33) exhausting the air within the dry region.

Abstract translation: 目的：提供一种用于制造电极和计算机存储介质的装置和方法，以通过控制相应辊的表面和金属薄膜的表面之间的距离来控制活性材料混合物的膜厚度。 构成：展开卷展开带状金属薄膜。 涂层部分在金属膜的两面上施加活性物质混合物。 干燥部件（12）通过干燥金属膜上的活性物质混合物形成活性物质层。 卷绕卷绕金属膜。 干燥部包括照射红外线的多个道路加热器（30），反射来自道路加热器的红外线的多个反射器（31），将空气供给到金属膜与金属膜之间的干燥区域的供气口 反射器和排出管（33），排出干燥区域内的空气。

公开(公告)号：KR1020100081925A

公开(公告)日：2010-07-15

申请号：KR1020090130685

申请日：2009-12-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 도시마다카유키 ,  데라다가즈오

IPC: H01L21/302

CPC classification number: H01L21/02057 ,  H01L21/02101

Abstract: PURPOSE: A supercritical processing apparatus, a substrate processing system, and a supercritical processing method are provided to improve throughput by rapidly raise the temperature of a processing fluid without on and off state of a heating unit. CONSTITUTION: A carrier(C) in which a plurality of wafers(W) is loaded is arranged on a carrier loading part(11). A transferring part(12) pulls a wafer from the carrier, and a conveying part(13) conveys the wafer into a liquid processing system. In the liquid processing system, the wafer is successively transferred through a liquid processing machine(2) and a supercritical processing apparatus(3).

Abstract translation: 目的：提供超临界处理装置，基板处理系统和超临界处理方法，通过在加热单元的开和关状态下快速提高处理流体的温度来提高生产量。 构成：其中装载有多个晶片（W）的载体（C）布置在载体装载部分（11）上。 转印部分（12）从载体上拉晶片，并且输送部分（13）将晶片输送到液体处理系统中。 在液体处理系统中，晶片依次通过液体处理机（2）和超临界处理装置（3）传送。

公开(公告)号：KR101384320B1

公开(公告)日：2014-04-14

申请号：KR1020090130685

申请日：2009-12-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 도시마다카유키 ,  데라다가즈오

IPC: H01L21/302

CPC classification number: H01L21/02057 ,  H01L21/02101

Abstract: 본 발명은 패턴 붕괴의 발생을 억제하고, 작업 처리량이 많으며, 유지보수(maintenance) 주기가 긴 초임계 처리 장치 등을 제공한다.
기판(W)에 부착된 액체를 초임계 상태의 처리 유체에 의해 제거하는 초임계 처리 장치(3)에 있어서, 가열부(323)는 처리 용기(31) 내에 공급된 처리 유체를 초임계 상태로 하기 위해 상기 처리 유체를 가열하고, 냉각 기구(322)는 기판(W)이 배치대(321)에 배치될 때까지 기판(W)으로부터의 액체의 증발을 억제하기 위해, 상기 가열부(323)로부터 상기 기판에 열이 전달되는 영역을 강제 냉각한다.

公开(公告)号：KR1020120082365A

公开(公告)日：2012-07-23

申请号：KR1020120003827

申请日：2012-01-12

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 후꾸오까데쯔오 ,  데라다가즈오 ,  기따노다까히로

IPC: H01G9/058 ,  H01G9/155

CPC classification number: Y02E60/13 ,  H01G13/04 ,  H01G11/06 ,  H01G11/34 ,  H01G11/86 ,  H01G13/02 ,  H01M4/04 ,  H01M4/139 ,  Y02E60/122

Abstract: PURPOSE: An apparatus for manufacturing an electrode, and a method thereof, and a computer storage medium are provided to adjust a film thickness of an active material mixture by adjusting a distance between a surface of a corresponding roller itself and the surface of a metal film. CONSTITUTION: A unwind roll(10) unwinds a strip-shaped metal film. A coating part(11) applies an active material mixture on both sides of the metal film. A drying part(12) forms the active material layer by drying the active material mixture on the metal film. A winding roll(13) winds the metal film. The dryer part is arranged in a long direction of the metal film side by side. A plurality of LEDs(30a,30b,30c) emits infrared rays. The drying part is divided into a plurality of regions(Ta,Tb,Tc).

Abstract translation: 目的：提供一种用于制造电极的设备及其方法和计算机存储介质，以通过调节相应辊本身的表面与金属膜表面之间的距离来调节活性材料混合物的膜厚度 。 构成：展开卷（10）展开条形金属膜。 涂覆部件（11）在金属膜的两面上施加活性物质混合物。 干燥部件（12）通过干燥金属膜上的活性物质混合物形成活性物质层。 卷绕辊（13）卷绕金属膜。 干燥部分并排设置在金属膜的长方向上。 多个LED（30a，30b，30c）发射红外线。 干燥部分被分成多个区域（Ta，Tb，Tc）。

公开(公告)号：KR1020100089752A

公开(公告)日：2010-08-12

申请号：KR1020100006070

申请日：2010-01-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 도시마다카유키 ,  데라다가즈오

IPC: H01L21/677 ,  B65G49/07 ,  H01L21/027

CPC classification number: H01L21/67057 ,  H01L21/67034 ,  H01L21/67346 ,  H01L21/67748 ,  H01L21/68742 ,  B65G49/065 ,  G03F7/70733

Abstract: PURPOSE: A substrate transferring unit and a substrate processing unit are provided to transfer a substrate having a liquid on top by making a liquid undercurrent to a tray. CONSTITUTION: A bottom plate(521) is installed on the top side of a carrier tray(50) and supports a substrate. The carrier tray includes tray members(51,52) having an opening between them. The opening is formed on the bottom of the carrier tray. A transport apparatus horizontally moves the carrier tray. A space forming unit(54) forms a temporal space so that an elevating member passes between the opening and the carrier tray.

Abstract translation: 目的：提供基板转印单元和基板处理单元，以通过向盘托液体下流而将具有液体的基板传送到顶部。 构成：底板（521）安装在托架（50）的顶侧并支撑基板。 托盘包括在它们之间具有开口的托盘构件（51,52）。 开口形成在托盘的底部。 运送装置水平移动托盘。 空间形成单元（54）形成时间空间，使得升降构件在开口和托盘之间通过。