패턴 임계치수의 균일도 검사장치
    11.
    发明公开
    패턴 임계치수의 균일도 검사장치 无效
    检查图案关键尺寸均匀性的装置

    公开(公告)号:KR1020090038966A

    公开(公告)日:2009-04-22

    申请号:KR1020070104301

    申请日:2007-10-17

    CPC classification number: G03F7/7085 G01N21/956 G03F7/70616 H01L22/12

    Abstract: An apparatus for checking uniformity of a critical dimension of a pattern is provided to shorten a check measurement time by performing a check in an atmosphere state. A Zeeman laser(20) irradiates a beam having a different frequency. A beam controller(60) controls a spot size of a laser beam irradiated form the Zeeman laser. A beam splitter(70) multiply separates a beam having a controlled spot size. An optical system(80) irradiates a multiply separated light to a sample(10) by changing an optical route, and guides an optical route of a beam reflected from the sample. A polarizer(30) transmits a reflected beam having changed polarization information. A detector(40) detects a light amount of the reflected beam. A lock-in amplifier(50) amplifies a beat frequency of the reflected beam detected in the detector and a reference signal frequency irradiated in the Zeeman laser, and measures an amplitude and a phase signal of a laser reflected from the sample at the same time. A check part(90) checks a critical dimension uniformity of a sample pattern.

    Abstract translation: 提供了用于检查图案的临界尺寸的均匀性的装置,以通过在大气状态下执行检查来缩短检查测量时间。 塞曼激光器(20)照射具有不同频率的光束。 光束控制器(60)控制从塞曼激光器照射的激光束的光斑尺寸。 分束器(70)将具有受控光斑尺寸的光束分开。 光学系统(80)通过改变光学路线将多重分离的光照射到样品(10),并且引导从样品反射的光束的光路。 偏振器(30)透射具有改变的偏振信息的反射光束。 检测器(40)检测反射光束的光量。 锁定放大器(50)放大检测器中检测到的反射光束的拍频和在塞曼激光器中照射的参考信号频率,同时测量从样品反射的激光的振幅和相位信号 。 检查部件(90)检查样品图案的临界尺寸均匀性。

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