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公开(公告)号:KR1020090022305A
公开(公告)日:2009-03-04
申请号:KR1020070087560
申请日:2007-08-30
Applicant: 삼성전자주식회사
IPC: H01L21/027
CPC classification number: H01L21/0274 , G03F7/2063 , G03F7/70825
Abstract: An apparatus for supporting a reticle is provided to facilitate the reticle support by using a reticle support member made of an elastomer material. A reticle supporting member(20) is inserted into a chuck body(10) and is received in an upper surface of the chuck body. A holding member(30) is arranged in the upper surface of the reticle support member and is coupled to the chuck body to prevent the reticle supported by the reticle support member from being separated and fix the reticle support member in the chuck body. The reticle support member is made of the elastomer material to prevent the movement of the reticle. The chuck body is composed of a square frame. An insertion groove into which the reticle support member is inserted is formed in each edge of the chuck body.
Abstract translation: 提供一种用于支撑掩模版的装置,以通过使用由弹性体材料制成的掩模版支撑构件来促进光罩的支撑。 将标线片支撑构件(20)插入卡盘体(10)中并被容纳在卡盘主体的上表面中。 保持构件(30)布置在标线架支撑构件的上表面中并且联接到卡盘体,以防止由掩模版支撑构件支撑的掩模版分离并将掩模版支撑构件固定在卡盘体中。 标线支撑构件由弹性体材料制成以防止光罩的移动。 卡盘体由方形框架构成。 在卡盘体的每个边缘上形成插入有标线片支撑构件的插入槽。
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公开(公告)号:KR1020090038966A
公开(公告)日:2009-04-22
申请号:KR1020070104301
申请日:2007-10-17
Applicant: 삼성전자주식회사
IPC: H01L21/66 , H01L21/027
CPC classification number: G03F7/7085 , G01N21/956 , G03F7/70616 , H01L22/12
Abstract: An apparatus for checking uniformity of a critical dimension of a pattern is provided to shorten a check measurement time by performing a check in an atmosphere state. A Zeeman laser(20) irradiates a beam having a different frequency. A beam controller(60) controls a spot size of a laser beam irradiated form the Zeeman laser. A beam splitter(70) multiply separates a beam having a controlled spot size. An optical system(80) irradiates a multiply separated light to a sample(10) by changing an optical route, and guides an optical route of a beam reflected from the sample. A polarizer(30) transmits a reflected beam having changed polarization information. A detector(40) detects a light amount of the reflected beam. A lock-in amplifier(50) amplifies a beat frequency of the reflected beam detected in the detector and a reference signal frequency irradiated in the Zeeman laser, and measures an amplitude and a phase signal of a laser reflected from the sample at the same time. A check part(90) checks a critical dimension uniformity of a sample pattern.
Abstract translation: 提供了用于检查图案的临界尺寸的均匀性的装置,以通过在大气状态下执行检查来缩短检查测量时间。 塞曼激光器(20)照射具有不同频率的光束。 光束控制器(60)控制从塞曼激光器照射的激光束的光斑尺寸。 分束器(70)将具有受控光斑尺寸的光束分开。 光学系统(80)通过改变光学路线将多重分离的光照射到样品(10),并且引导从样品反射的光束的光路。 偏振器(30)透射具有改变的偏振信息的反射光束。 检测器(40)检测反射光束的光量。 锁定放大器(50)放大检测器中检测到的反射光束的拍频和在塞曼激光器中照射的参考信号频率,同时测量从样品反射的激光的振幅和相位信号 。 检查部件(90)检查样品图案的临界尺寸均匀性。
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公开(公告)号:KR1020140108953A
公开(公告)日:2014-09-15
申请号:KR1020130022906
申请日:2013-03-04
Applicant: 삼성전자주식회사
CPC classification number: H01J37/28 , H01J37/026
Abstract: Disclosed is a scanning electronic microscope which collects charges accumulated on a sample surface. The scanning electronic microscope includes: a column part which generates an electron beam and emits it to a sample; a chamber part which includes a sample stage which is combined to the column part, is arranged to be separated from the end of the column part, and receives the sample; a detection part which detects signals emitted from the sample; a charge collection part which is arranged between the sample stage and the end of the column part, and collects charges; and a power applying part which applies an optimal voltage by the sample to the charge collection part.
Abstract translation: 公开了一种扫描电子显微镜,其收集在样品表面上累积的电荷。 扫描电子显微镜包括:柱部分,其产生电子束并将其发射到样品; 包括与柱部组合的样品台的室部分被布置成与柱部分的端部分离,并接收样品; 检测从样品发出的信号的检测部; 设置在样品台与柱部的端部之间的收费部,收取费用; 以及通过样本将最佳电压施加到电荷收集部的电力施加部。
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公开(公告)号:KR1020120043850A
公开(公告)日:2012-05-07
申请号:KR1020100105098
申请日:2010-10-27
Applicant: 삼성전자주식회사
IPC: B23K26/064 , B23K26/082
CPC classification number: B23K26/02 , B23K26/0648 , B23K26/08 , B23K26/082 , G02B7/02 , G02F1/1303 , G02F1/1309
Abstract: PURPOSE: A laser optical system and a repair apparatus and method using the same are provided to implement image-to-image high-speed repair work for a large area through a scan module and review repair works in real time from real-time images of a laser irradiating area and the peripheral portions. CONSTITUTION: A laser optical system(500) comprises a laser generator(501), a scan module(510), an objective lens(560), a relay lens(530), a review optical unit(550), and a control device(519). The laser generator generates a laser beam for repairing a substrate(570). The scan module reflects the laser beam generated by the laser generator to change the propagating path of the laser beam. The objective lens compresses the laser beam to be focused on the substrate. The relay lens guides the laser beam scanned through the scan module to the recognition range of the object lens. The review optical unit takes images of a substrate repair process in real time. The control device controls the scan module.
Abstract translation: 目的:提供激光光学系统及其使用方法,通过扫描模块实现大面积的图像到图像高速修复,实时检查实时图像的实时图像 激光照射区域和周边部分。 构成:激光光学系统(500)包括激光发生器(501),扫描模块(510),物镜(560),中继透镜(530),检查光学单元(550)和控制装置 (519)。 激光发生器产生用于修复衬底的激光束(570)。 扫描模块反射由激光发生器产生的激光束以改变激光束的传播路径。 物镜将激光束压缩以聚焦在基板上。 中继透镜将通过扫描模块扫描的激光束引导到物镜的识别范围。 检查光学单元实时获取基板修复过程的图像。 控制装置控制扫描模块。
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公开(公告)号:KR1020100062654A
公开(公告)日:2010-06-10
申请号:KR1020080121379
申请日:2008-12-02
Applicant: 삼성전자주식회사
Abstract: PURPOSE: A pattern testing apparatus and a method thereof are provided to rapidly inspect the critical dimension and the height of a sample pattern with maintaining high accuracy by analyzing a detected spectrum. CONSTITUTION: A pattern testing apparatus method comprises the following steps. Light is directed on the entire area of a sample in one time(230). The topology data of the sample is created by using the reflected light from the sample(240). A spectrum is detected from the topology data of the sample(250). The detected spectrum is analyzed and the critical dimension and the height of the sample pattern are inspected(270). Light is directed on the entire area of a standard mirror in one time(200). The topology data of the standard mirror is created by using the reflected light from the standard mirror(210). A spectrum is detected from the topology data of the standard mirror(220). The spectrum of the sample is compensated by using the spectrum of the standard mirror(260).
Abstract translation: 目的:提供了一种图案测试装置及其方法,通过分析检测到的光谱,以高精度快速检查样品图案的临界尺寸和高度。 构成:图案测试装置的方法包括以下步骤。 灯一次被引导到样品的整个区域(230)。 通过使用来自样品(240)的反射光来创建样品的拓扑数据。 根据样品的拓扑数据(250)检测光谱。 分析检测到的光谱,检查样品图案的临界尺寸和高度(270)。 灯在一次(200)的指示在标准镜的整个区域。 通过使用来自标准反射镜(210)的反射光来创建标准反射镜的拓扑数据。 根据标准镜(220)的拓扑数据检测到光谱。 通过使用标准反射镜(260)的光谱来补偿样品的光谱。
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公开(公告)号:KR1020080060000A
公开(公告)日:2008-07-01
申请号:KR1020060134027
申请日:2006-12-26
Applicant: 삼성전자주식회사
CPC classification number: H01J37/28 , H01J37/026 , H01J2237/0044
Abstract: An apparatus for examining a sample using an SEM(Scanning Electronic Microscope) is provided to improve quality of an image of the sample surface by reducing charge accumulation on the sample surface using a charge collector. A sample examining apparatus includes a chamber(10), an SEM(20), a stage(40), a detector(24), and a charge collector(50). The chamber contains the SEM and the stage. The SEM generates an electronic beam to radiate on a surface of a sample(30), such as a photomask, through an object lens(21). The stage holds up the sample. If the electronic beam is scanned on the sample, reactive ions(32) are reflected toward a detector. The detector obtains an image of the sample surface based on the reactive ions. The charge collector is arranged between the object lens and the sample, and collects charge accumulated on the sample surface.
Abstract translation: 提供了一种使用SEM(扫描电子显微镜)检查样品的装置,以通过使用电荷收集器减少样品表面上的电荷累积来提高样品表面的图像质量。 样品检查装置包括室(10),SEM(20),载物台(40),检测器(24)和电荷收集器(50)。 房间包含SEM和舞台。 SEM产生电子束,通过物镜(21)辐射到诸如光掩模的样品(30)的表面上。 舞台举起样品。 如果电子束在样品上扫描,反应离子(32)将朝检测器反射。 检测器基于反应离子获得样品表面的图像。 电荷收集器布置在物镜和样品之间,并收集在样品表面上积累的电荷。
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