公开(公告)号：KR101425192B1

公开(公告)日：2014-08-06

申请号：KR1020120090231

申请日：2012-08-17

Applicant: 한국기계연구원

Inventor： 김사라 ,  김철현 ,  이지혜 ,  최준혁 ,  정준호 ,  이응숙 ,  정주연 ,  최대근

IPC: H01L51/42 ,  H01L51/48

CPC classification number: Y02E10/549 ,  Y02P70/521

Abstract: 본 발명의 태양 전지는 기판, 기판 위에 형성되어 있는 제1 전극, 제1 전극 위에 형성되어 있으며 돌출부를 포함하는 금속산화층, 금속산화층 위에 형성되어 있는 활성층, 활성층 위에 형성되어 있는 완충층, 완충층 위에 형성되어 있는 제2 전극을 포함한다.

公开(公告)号：KR1020140023778A

公开(公告)日：2014-02-27

申请号：KR1020120090231

申请日：2012-08-17

Applicant: 한국기계연구원

Inventor： 김사라 ,  김철현 ,  이지혜 ,  최준혁 ,  정준호 ,  이응숙 ,  정주연 ,  최대근

IPC: H01L51/42 ,  H01L51/48

CPC classification number: Y02E10/549 ,  Y02P70/521 ,  H01L51/42

Abstract: A solar cell according to the present invention includes a substrate, a first electrode which is formed on the substrate, a metal oxide layer which is formed on the first electrode and includes a protrusion part, an active layer which is formed on the metal oxide layer, a buffer layer which is formed on the active layer, and a second electrode which is formed on the buffer layer.

Abstract translation: 根据本发明的太阳能电池包括基板，形成在基板上的第一电极，形成在第一电极上并包括突出部分的金属氧化物层，形成在金属氧化物层上的有源层 形成在有源层上的缓冲层和形成在缓冲层上的第二电极。

公开(公告)号：KR100995897B1

公开(公告)日：2010-11-22

申请号：KR1020100009904

申请日：2010-02-03

Applicant: 한국기계연구원

Inventor： 전소희 ,  박형호 ,  정준호 ,  김기돈 ,  최준혁 ,  이지혜 ,  박성제 ,  최대근 ,  김사라

IPC: B82B3/00 ,  H01L51/56

CPC classification number: H01L51/56 ,  B01J19/123 ,  B82Y20/00 ,  C08L101/00

Abstract: PURPOSE: A gap filling method of a nanostructure and a manufacturing method of an organic light-emitting device(OLED) using thereof are provided to form an oxide thin film with a flat surface by pressing a gap of the nanostructure with a mold. CONSTITUTION: A gap filling method of a nanostructure comprises the following steps: supplying a substrate with the nanostructure including a gap on the upper side(S1); spreading a coating composition to fill the gap(S2); pressing the layer of the coating composition with a mold(S3); irradiation ultraviolet rays to the coating composition layer(S4); heating the layer to form a metal oxide thin film; and separating the mold from the metal oxide thin film(S5).

Abstract translation: 目的：提供纳米结构的间隙填充方法和使用其的有机发光器件（OLED）的制造方法，以通过用模具压制纳米结构的间隙来形成具有平坦表面的氧化物薄膜。 构成：纳米结构的间隙填充方法包括以下步骤：向衬底提供包括在上侧的间隙的纳米结构（S1）; 铺展涂料组合物以填补间隙（S2）; 用模具挤压涂层组合物层（S3）; 向涂料组合物层照射紫外线（S4）; 加热层以形成金属氧化物薄膜; 并将模具与金属氧化物薄膜分离（S5）。

公开(公告)号：KR100965904B1

公开(公告)日：2010-06-24

申请号：KR1020090082592

申请日：2009-09-02

Applicant: 한국기계연구원

Inventor： 박형호 ,  최대근 ,  정준호 ,  김기돈 ,  최준혁 ,  이지혜 ,  박성제 ,  전소희 ,  김사라

IPC: H01L21/027 ,  B82Y40/00

CPC classification number: H01L33/44 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L2933/0083 ,  B29C59/022

Abstract: PURPOSE: A patterning method of a metal oxide thin film using nano-imprint and manufacturing method of a light emitting diode are provided to reduce a pattern process by removing a process of covering an ultraviolet resin additionally. CONSTITUTION: A photosensitivity metal-organic precursor solution is coated on a substrate(S1). A photosensitivity metal-organic precursor coating layer is pressurized into a patterned mold(S2). Ultraviolet ray is radiated on the pressured metal-organic precursor coating layer to form a hardened metal oxide film pattern(S3). The patterned mold is removed from the metal oxide thin film pattern(S4). A plastic process of processing the metal oxide thin film pattern with a thermal process is performed.

Abstract translation: 目的：提供使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法，以通过除去另外掩盖紫外线树脂的工艺来减少图案处理。 构成：将光敏金属 - 有机前体溶液涂覆在基材上（S1）。 将光敏金属 - 有机前体涂层加压成图案化模具（S2）。 将紫外线照射在加压的金属 - 有机前体涂层上以形成硬化的金属氧化物膜图案（S3）。 从金属氧化物薄膜图案去除图案化的模具（S4）。 进行利用热处理来处理金属氧化物薄膜图案的塑性工艺。