Abstract:
본발명은다공성입자및 다공성입자에담지된항균물질을포함하는항균물질을갖는다공성입자에관한것으로, 본발명의항균물질을갖는다공성입자는치과용인상재의항균제첨가량을제어하고치과용인상재와항균제가분리되지않도록안정성을향상시킬수 있고, 항균물질을갖는다공성입자의제조시 에멀젼법을이용하여입자의크기및 입자기공의크기를조절할수 있다.
Abstract:
PURPOSE: A manufacturing method of a zinc oxide based transparent conductive film is provided to prevent impure gas from emitting from a plastic substrate even if deposition is made in a vacuum state since the zinc oxide based transparent conductive film is deposited on the plastic substrate by sputtering after gas is removed from the plastic substrate in a separate vacuum heating device outside a sputtering deposition chamber. CONSTITUTION: A manufacturing method of a zinc oxide based transparent conductive film comprises next steps. A transparent plastic substrate is charged in a vacuum heating device. Impure gas is removed from the vacuum heating device, a rotary pump operates to become a vacuum state and air is discharged until pressure becomes 1×10-2Torr or less. Thermal treatment is made at a temperature of below a softening point of the transparent plastic substrate and impure gas is discharged from the transparent plastic substrate. The operation of the rotary pump stops and the transparent plastic substrate, from which impure gas has been removed, is unloaded.
Abstract:
PURPOSE: An implant having directional scratches on the surface through buffing and a manufacturing method thereof are provided to form directional scratches on the surface of an implant through buffing and then form microgrooves by patterning the surface, thereby improving the anchoring force of the implant with respect to alveolar bone tissue and the life expectancy of the implant according to the improvement of reactivity between the implant and the compact bone tissue and/or spongy bone tissue in the alveolar bone. CONSTITUTION: An implant having directional scratches on the surface through buffing includes the following parts: generally one-directional multiple scratches formed on the surface of the implant through buffing; and an oxide layer formed on the surface of the implant containing the scratches. A manufacturing method of the implant having directional scratches on the surface through buffing includes the following steps: a step of forming the generally one-directional multiple scratches on the surface of the implant through buffing; and a step of oxidizing the surface of the implant.
Abstract:
본 발명은, 투명 플라스틱 기판 위에 산화아연계 투명 도전박막을 스퍼터링으로 증착시켜 투명 도전필름을 제조하는 방법에 있어서, 플라스틱 기판을 연화점(glass transition temperature) 미만에서 가스 탈착(outgasing) 처리한 후 증착을 수행함으로서 비저항값을 낮출 수 있을 뿐만 아니라 우수한 공정 재현성을 제공할 수 있는 산화아연계 투명 도전필름의 제조방법 및 이에 의해 제조된 산화아연계 투명 도전필름에 관한 것이다. 본 발명에 의하면, 스퍼터링 공정 이전에 먼저 플라스틱 기판 내부에 존재하는 수분, 산소, 가소제 성분 등의 불순물 가스를 스퍼터링 증착챔버 밖의 진공 가열장치에서 미리 제거함으로써, 증착챔버 내부의 오염을 막아 비저항을 크게 개선할 수 있을 뿐 아니라 공정 재현성도 우수하고 전기적 특성도 우수한 산화아연계 투명 도전필름을 얻을 수가 있다. 플라스틱 기판, 산화아연(ZnO), 가스 탈착(outgasing), 불순물 가스