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11.发明公开COMPOSITION AND PROCESS FOR POST-ETCH REMOVAL OF PHOTORESIST AND/OR SACRIFICIAL ANTI-REFLECTIVE MATERIAL DEPOSITED ON A SUBSTRATE 有权IS组合物和PROCESS FOR AFTER蚀刻脱除光致抗蚀剂和/或牺牲ANTI REFLEX MATERIAL ON沉积在衬底
公开(公告)号：EP1730600A4
公开(公告)日：2010-07-28
申请号：EP05724288
申请日：2005-03-02
Applicant: ADVANCED TECH MATERIALS
Inventor： RATH MELISSA K , BERNHARD DAVID D , MINSEK DAVID , KORZENSKI MICHAEL B , BAUM THOMAS H
CPC classification number: C11D3/044 , C11D3/30 , C11D3/3947 , C11D7/06 , C11D11/0047 , G03F7/423 , G03F7/425
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