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    System and method for insitu lens cleaning in immersion lithography
    11.
    发明专利
    System and method for insitu lens cleaning in immersion lithography 审中-公开
    系统和方法用于浸入式LITHOGRAPHY中的INSITU LENS CLEANING

    公开(公告)号：JP2008235872A

    公开(公告)日：2008-10-02

    申请号：JP2008028305

    申请日：2008-02-08

    Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

    Inventor： SEWELL HARRY ,  MARKOYA LOUIS JOHN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70925 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a system and method for insitu lens cleaning used for an immersion lithography system. SOLUTION: The immersion lithography device including an oil immersion supply device 230 that creates a flow of liquid in an exposure zone, a showerhead that includes an oil immersion discharge device, and a cleaning device that cleans the portion of a projection optical system contacting an immersion liquid with a cleaning gas is provided. The cleaning device includes a gas supply device 250 that creates a flow of the cleaning gas incident on the exposure zone and a gas discharge device 260. A final lens element 136 is insitu cleaned inside the immersion lithography system having an immersion fluid showerhead that supplies an immersion fluid into the exposure zone of the immersion lithography system. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供用于浸没式光刻系统的立体透镜清洁的系统和方法。 解决方案：浸没式光刻设备包括在曝光区域中产生液体流的浸油供应装置230，包括浸油放电装置的喷头，以及清洁投影光学系统的部分的清洁装置 提供了将浸液与清洁气体接触。 清洁装置包括气体供应装置250，其产生入射在曝光区域上的清洁气体的流动和气体排出装置260.最后的透镜元件136在具有浸没式液体喷头的浸没式光刻系统内进行清洗， 浸没流体进入浸没式光刻系统的曝光区。 版权所有（C）2009，JPO＆INPIT

    LITHOGRAPHIC APPARATUS
    12.
    发明申请
    LITHOGRAPHIC APPARATUS 审中-公开
    LITHOGRAPHIC设备

    公开(公告)号：WO2014122151A3

    公开(公告)日：2014-11-20

    申请号：PCT/EP2014052204

    申请日：2014-02-05

    Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

    Inventor： DELPUERTO SANTIAGO E ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS JOHN ,  UITTERDIJK TAMMO ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  VAN DER WILK RONALD

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

    Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

    Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持诸如掩模版（300）的图案形成装置以将其固定并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面移动到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

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