公开(公告)号：JP2009177177A

公开(公告)日：2009-08-06

申请号：JP2009007808

申请日：2009-01-16

Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： SEWELL HARRY ,  LOOPSTRA ERIK ROELOF ,  HUBERTUS MULKENS JOHANNES C ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To regenerate immersion fluid whose specified quality does not meet a specified threshold, and to make the regenerated immersion fluid recirculate. SOLUTION: A lithography apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycle control device. The projection system projects a pattern projecting a radiation beam onto a target part of a substrate, and the substrate is supported on a substrate table. The fluid handling structure provides the immersion fluid to a space between the projection system and the substrate and/or the substrate table. The metrology device monitors a parameters of the immersion fluid. The recycle control device adjusts the routing of the immersion fluid so as to be reused or regenerated in the fluid handling structure, based on the quality of the immersion fluid indicated by the metrology device. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了再生特定质量不符合规定阈值的浸渍液，并使再生浸液流体再循环。 解决方案：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。 投影系统将投影辐射束的图案投影到基板的目标部分上，并且将基板支撑在基板台上。 流体处理结构将浸没流体提供到投影系统与衬底和/或衬底台之间的空间。 计量装置监测浸液的参数。 再循环控制装置基于由计量装置指示的浸液的质量来调节浸没流体的路线，以便在流体处理结构中重新使用或再生。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：WO2016079051A3

公开(公告)日：2016-09-22

申请号：PCT/EP2015076687

申请日：2015-11-16

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KRUIZINGA MATTHIAS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BOGAART ERIK WILLEM ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  BRULS RICHARD JOSEPH ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KAMALI MOHAMMAD REZA ,  KRAMER RONALD HARM GUNTHER ,  LANSBERGEN ROBERT GABRIËL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIPSON MATTHEW ,  LOOPSTRA ERIK ROELOF ,  LYONS JOSEPH H ,  ROUX STEPHEN ,  VAN DEN BOSCH GERRIT ,  VAN DEN HEIJKANT SANDER ,  VAN DER GRAAF SANDRA ,  VAN DER MEULEN FRITS ,  VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。

公开(公告)号：CA2968151A1

公开(公告)日：2016-05-26

申请号：CA2968151

申请日：2015-11-16

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： KRUIZINGA MATTHIAS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BOGAART ERIK WILLEM ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  BRULS RICHARD JOSEPH ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KAMALI MOHAMMAD REZA ,  KRAMER RONALD HARM GUNTHER ,  LANSBERGEN ROBERT GABRIEL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIPSON MATTHEW ,  LOOPSTRA ERIK ROELOF ,  LYONS JOSEPH H ,  ROUX STEPHEN ,  VAN DEN BOSCH GERRIT ,  VAN DEN HEIJKANT SANDER ,  VAN DER GRAAF SANDRA ,  VAN DER MEULEN FRITS ,  VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：NL1036432A1

公开(公告)日：2009-07-27

申请号：NL1036432

申请日：2009-01-16

Applicant: ASML HOLDING NV

Inventor： SEWELL HARRY ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE

IPC: G03F7/20