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    Immersion lithographic apparatus with immersion fluid recirculating system
    5.
    发明专利
    Immersion lithographic apparatus with immersion fluid recirculating system 有权
    具有浸入式流体循环系统的倾斜平面设备

    公开(公告)号：JP2009177177A

    公开(公告)日：2009-08-06

    申请号：JP2009007808

    申请日：2009-01-16

    Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

    Inventor： SEWELL HARRY ,  LOOPSTRA ERIK ROELOF ,  HUBERTUS MULKENS JOHANNES C ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To regenerate immersion fluid whose specified quality does not meet a specified threshold, and to make the regenerated immersion fluid recirculate. SOLUTION: A lithography apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycle control device. The projection system projects a pattern projecting a radiation beam onto a target part of a substrate, and the substrate is supported on a substrate table. The fluid handling structure provides the immersion fluid to a space between the projection system and the substrate and/or the substrate table. The metrology device monitors a parameters of the immersion fluid. The recycle control device adjusts the routing of the immersion fluid so as to be reused or regenerated in the fluid handling structure, based on the quality of the immersion fluid indicated by the metrology device. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了再生特定质量不符合规定阈值的浸渍液，并使再生浸液流体再循环。 解决方案：光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。 投影系统将投影辐射束的图案投影到基板的目标部分上，并且将基板支撑在基板台上。 流体处理结构将浸没流体提供到投影系统与衬底和/或衬底台之间的空间。 计量装置监测浸液的参数。 再循环控制装置基于由计量装置指示的浸液的质量来调节浸没流体的路线，以便在流体处理结构中重新使用或再生。 版权所有（C）2009，JPO＆INPIT

    Correction system for thermally induced aberration in liquid immersion lithography, and method therefor
    6.
    发明专利
    Correction system for thermally induced aberration in liquid immersion lithography, and method therefor 有权
    液体渗透层析中热诱导的校正系统及其方法

    公开(公告)号：JP2008147653A

    公开(公告)日：2008-06-26

    申请号：JP2007309574

    申请日：2007-11-30

    Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

    Inventor： SEWELL HARRY ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE

    IPC: H01L21/027

    CPC classification number: G03B27/72 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70858

    Abstract: PROBLEM TO BE SOLVED: To provide an aberration control system for liquid immersion lithography and a method for compensating the heat effect of the exposure energy for a liquid immersion fluid over the entire exposure region.
    SOLUTION: The aberration control system includes an actuator for adjusting an optical element in a liquid immersion lithography system, and a fluid heat compensating module connected to the actuator. The fluid heat regulation module determines an actuator command for aberration correction of the optical element in the liquid immersion lithography system, based on the one or a plurality of change or changes in the amount of the fluid of a liquid immersion liquid, an exposure dose, and a reticule pattern image. In one embodiment, an interference sensor for preliminarily correcting the aberrations, according to the variation of the operational characteristics related to the liquid immersion fluid, is included. A method of regulating the actuator, by correcting the aberration and determining the actuator adjustment, when the operating characteristics change for regulating the aberration effect, is provided.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于液浸光刻的像差控制系统以及用于补偿在整个曝光区域上的浸液液体的曝光能量的热效应的方法。 解决方案：像差控制系统包括用于调节液浸光刻系统中的光学元件的致动器和连接到致动器的流体热补偿模块。 流体热调节模块基于液浸液体的流体量的一个或多个变化或变化，确定用于液浸光刻系统中的光学元件的像差校正的致动器命令，曝光剂量， 和网状图案图像。 在一个实施例中，包括用于根据与液浸流体相关的操作特性的变化来初步校正像差的干涉传感器。 提供了当用于调节像差效应的操作特性变化时通过校正像差并确定致动器调节来调节致动器的方法。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2008160085A

    公开(公告)日：2008-07-10

    申请号：JP2007302407

    申请日：2007-11-22

    Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

    Inventor： MCCAFFERTY DIANE ,  SEWELL HARRY ,  MARKOYA LOUIS JOHN

    IPC: H01L21/027 ,  G02B5/18 ,  G03F7/20

    CPC classification number: G03F7/70408

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is configured to image a small pattern while having high pattern-width control and uniformity. SOLUTION: A lithographic apparatus is presented. The lithographic apparatus includes a beam splitter configured to split a radiation beam into a plurality of radiation beams, a substrate stage configured to support a substrate, a beam combiner adapted to redirect and combine at least a certain part of a plurality of the radiation beams so as to form an interference pattern on the substrate, and a control unit in communication with the substrate stage and a radiation source configured to output the radiation beam. The control unit is configured to synchronize a motion of the substrate stage with a repetition rate at which the radiation beam is outputted by the radiation source. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种被配置为在具有高图案宽度控制和均匀性的同时对小图案进行成像的光刻设备。 解决方案：介绍了一种光刻设备。 光刻设备包括：分束器，其配置成将辐射束分裂成多个辐射束;衬底台，被配置为支撑衬底;光束组合器，适于重定向和组合多个辐射束的至少一部分，因此 以在衬底上形成干涉图案，以及与衬底台连通的控制单元和被配置为输出辐射束的辐射源。 控制单元被配置为使衬底台的运动与由辐射源输出辐射束的重复频率同步。 版权所有（C）2008，JPO＆INPIT

    INTERFERING LITHOGRAPHY PROJECTOR
    8.
    发明专利
    INTERFERING LITHOGRAPHY PROJECTOR 审中-公开

    公开(公告)号：JP2006352071A

    公开(公告)日：2006-12-28

    申请号：JP2006021608

    申请日：2006-01-31

    Applicant: ASML HOLDING NV

    Inventor： MARKOYA LOUIS J ,  SEWELL HARRY I ,  MCCAFFERTY DIANE ,  KHMELICHEK ALEKSANDR ,  KREUZER JUSTIN L

    IPC: H01L21/027 ,  G02B5/18 ,  G03F7/20

    Abstract: PROBLEM TO BE SOLVED: To provide an interfering lithography projector which has a capability of printing a plurality of patterns. SOLUTION: The lithography projector comprises a lighting system, a replaceable upper optical module, and a lower optical module 208. The lighting system emits radiation beams 106A, 106B. The replaceable upper optical module includes a beam splitter 104 which receives a beam and splits the beam into a plurality of portions, an aperture plate 206, and a plurality of reflection surfaces. The lower optical module 208 receives the plurality of portions of the beam from respective reflection surfaces, and directs the portions of the beam toward the surface of a board. As a result, interference fringes or contact hole patterns are formed on the board using the portions of the beam. COPYRIGHT: (C)2007,JPO&INPIT

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