公开(公告)号：US20240128043A1

公开(公告)日：2024-04-18

申请号：US18530109

申请日：2023-12-05

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Roy Ramon VEENSTRA ,  Erwin Paul SMAKMAN ,  Tom VAN ZUTPHEN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/147 ,  H01J2237/2448

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：US20230207255A1

公开(公告)日：2023-06-29

申请号：US18117373

申请日：2023-03-03

Applicant: ASML Netherlands B.V.

Inventor： Vincent Claude BEUGIN ,  Stijn Wilem Herman Karel STEENBRINK ,  Martin EBERT ,  Diego MARTINEZ NEGRETE GASQUE ,  Hindrik Willem MOOK ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28

Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.

公开(公告)号：US20210232052A1

公开(公告)日：2021-07-29

申请号：US17051287

申请日：2019-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Richard QUINTANILHA ,  Scott Anderson MIDDLEBROOKS ,  Adrianus Cornelis Matheus KOOPMAN ,  Albertus Victor Gerardus MANGNUS

IPC: G03F7/20 ,  G01B11/24 ,  G01B15/04

Abstract: A method of determining a measurement sequence for an inspection tool inspecting a structure generated by a lithographic process performed by a lithographic system is presented, the method including deriving a model for the lithographic process as performed by the lithographic system, the model including a relationship between a set of system variables describing the lithographic system and an output variable representing the structure resulting of the lithographic process, determining an observability of one or more system variables in the output variable, and determining the measurement sequence for the inspection tool, based on the observability.

公开(公告)号：US20240339294A1

公开(公告)日：2024-10-10

申请号：US18743011

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Yan REN ,  Erwin Paul SMAKMAN ,  Jurgen VAN SOEST

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28

Abstract: A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising: a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector; wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.

公开(公告)号：US20240272312A1

公开(公告)日：2024-08-15

申请号：US18568628

申请日：2022-06-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS

IPC: G01T1/20 ,  G01N23/2251

CPC classification number: G01T1/20182 ,  G01N23/2251

Abstract: A detector assembly for use in a charged particle device for an assessment tool to detect signal particles emitted by a sample in response to a charged particle beam, the detector assembly including: a scintillator element configured to generate photons on interaction with signal particles above a first energy threshold; a charge based element configured to detect signal particles below a second energy threshold, wherein the charge based element is positioned so that at least some of the signal particles above a first energy threshold pass through the charged based element to the scintillator element.

公开(公告)号：US20240044824A1

公开(公告)日：2024-02-08

申请号：US18487946

申请日：2023-10-16

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Albertus Victor Gerardus MANGNUS

IPC: G01N23/2251 ,  G01N23/203 ,  H01J37/10 ,  H01J37/244

CPC classification number: G01N23/2251 ,  G01N23/203 ,  H01J37/10 ,  H01J37/244

Abstract: The embodiments of the present disclosure provide various techniques for detecting backscatter charged particles, including accelerating charged particle sub-beams along sub-beam paths to a sample, repelling secondary charged particles from detector arrays, and providing devices and detectors which can switch between modes for primarily detecting charged particles and modes for primarily detecting secondary particles.

公开(公告)号：US20230048580A1

公开(公告)日：2023-02-16

申请号：US17790097

申请日：2021-01-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN ,  Yan REN

IPC: H01J37/153

Abstract: An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.

公开(公告)号：US20230005706A1

公开(公告)日：2023-01-05

申请号：US17856722

申请日：2022-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Albertus Victor Gerardus MANGNUS ,  Erwin SLOT

IPC: H01J37/244 ,  H01J37/145 ,  H01J37/28

Abstract: A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector including a substrate, the substrate including: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge-based element configured to detect signal particles below a second energy threshold.

公开(公告)号：US20220415611A1

公开(公告)日：2022-12-29

申请号：US17778036

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK ,  Marco Jan-Jaco WIELAND ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/141 ,  H01J37/147

Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.

公开(公告)号：US20220213593A1

公开(公告)日：2022-07-07

申请号：US17600493

申请日：2020-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Tamara DRUZHININA ,  Jim Vincent OVERKAMP ,  Alexey Olegovich POLYAKOV ,  Teis Johan COENEN ,  Evgenia KURGANOVA ,  Ionel Mugurel CIOBICA ,  Alexander Ludwig KLEIN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Bastiaan Maurice VAN DEN BROEK

IPC: C23C16/26 ,  C23C16/48 ,  C23C16/56 ,  G03F7/20 ,  G03F1/22

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.