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    Lithographic Method and Apparatus
    11.
    发明申请
    Lithographic Method and Apparatus 审中-公开

    公开(公告)号：US20180107120A1

    公开(公告)日：2018-04-19

    申请号：US15573029

    申请日：2016-05-30

    Applicant: ASML Netherlands B.V.

    Inventor： Lense Hendrik-Jan Maria SWAENEN ,  Johannes Jacobus Matheus BASELMANS ,  Bogathi Vishnu Vardhana REDDY ,  Patricius Aloysius Jacobus TINNEMANS ,  Beeri NATIV

    IPC: G03F7/20

    CPC classification number: G03F7/7055 ,  G03F7/20 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70525

    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimises the scaled cost function subject to satisfying the plurality of constraints.

    LITHOGRAPHIC APPARATUS AND METHOD
    13.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：US20160116848A1

    公开(公告)日：2016-04-28

    申请号：US14988944

    申请日：2016-01-06

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

    IPC: G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

    Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

    Abstract translation: 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

    PATTERNING DEVICE, METHOD OF PRODUCING A MARKER ON A SUBSTRATE AND DEVICE MANUFACTURING METHOD
    14.
    发明申请
    PATTERNING DEVICE, METHOD OF PRODUCING A MARKER ON A SUBSTRATE AND DEVICE MANUFACTURING METHOD 有权
    绘图装置，在基板上制作标记的方法和装置制造方法

    公开(公告)号：US20150370174A1

    公开(公告)日：2015-12-24

    申请号：US14764522

    申请日：2014-03-06

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Johannes Jacobus Matheus BASELMANS ,  Franciscus Godefridus BIJNEN ,  Daniëlle Elisabeth Maria PALMEN

    IPC: G03F7/20

    CPC classification number: G03F9/708 ,  G03F1/42 ,  G03F1/44 ,  G03F7/70058

    Abstract: A patterning device, for use in forming a marker on a substrate by optical projection, the patterning device including a marker pattern having a density profile that is periodic with a fundamental spatial frequency corresponding to a desired periodicity of the marker to be formed. The density profile is modulated (such as sinusoidally) so as to suppress one or more harmonics of the fundamental frequency, relative to a simple binary profile having the fundamental frequency.

    Abstract translation: 一种用于通过光学投影在基板上形成标记的图案形成装置，所述图案形成装置包括具有对应于待形成的标记物的所需周期性的基本空间频率周期性的密度分布的标记图案。 相对于具有基本频率的简单二进制分布，密度分布被调制（例如正弦曲线）以便抑制基频的一个或多个谐波。

    Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering
    16.
    发明申请
    Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering 有权

    公开(公告)号：US20130301025A1

    公开(公告)日：2013-11-14

    申请号：US13940796

    申请日：2013-07-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Johannes Jacobus Matheus BASELMANS

    IPC: G03F7/20

    CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.

    IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION
    18.
    发明申请
    IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION 有权

    公开(公告)号：US20220066327A1

    公开(公告)日：2022-03-03

    申请号：US17415101

    申请日：2019-12-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Johannes Jacobus Matheus BASELMANS ,  Duan-Fu Stephen HSU ,  Willem Jan BOUMAN ,  Frank Jan TIMMERMANS ,  Marie-Claire VAN LARE

    IPC: G03F7/20

    Abstract: Apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiation beam that is configured by a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the partially reflective regions are configured to suppress and apply a phase shift to a portion of the EUV radiation beam, may include a projection system. The projection system may be configured to suppress a zeroth order portion of a configured EUV radiation beam, and direct an unsuppressed portion of a configured EUV radiation beam towards a substrate to form an image on the substrate.

    OPTICAL SYSTEM AND METHOD
    20.
    发明申请
    OPTICAL SYSTEM AND METHOD 审中-公开

    公开(公告)号：US20180364587A1

    公开(公告)日：2018-12-20

    申请号：US16060195

    申请日：2016-12-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Johannes Jacobus Matheus BASELMANS

    IPC: G03F7/20 ,  G02B27/48

    CPC classification number: G03F7/70583 ,  G02B27/48 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  G03F7/70625 ,  G03F7/7085

    Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.

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