METHOD FOR COARSE WAFER ALIGNMENT IN A LITHOGRAPHIC APPARATUS

    公开(公告)号:SG155856A1

    公开(公告)日:2009-10-29

    申请号:SG2009018151

    申请日:2009-03-10

    Abstract: A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning the mark in a direction perpendicular to a direction of the mark's periodic structure along a first scan path across the mark, scanning the spot of the illumination beam along a second scan path across the mark, the second scan path being parallel to the first scan path, wherein the second scan path is shifted relative to the first scan path over a first shift that corresponds to a fraction of the repeating distance of the periodic structure.

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