公开(公告)号：DE602005001870T2

公开(公告)日：2008-04-30

申请号：DE602005001870

申请日：2005-02-17

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

IPC: G03F7/20 ,  H01L21/027 ,  G03F9/00

Abstract: The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system (IL) configured to provide a beam of radiation (PB), a first support structure (MT) configured to support a patterning device (MA) that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure (WT) that includes a substrate holder for holding a substrate (W), a projection system (PL) configured to project the patterned beam of radiation onto a target portion (C) on a surface of the substrate, and a servo unit (PW) configured to position the substrate holder. The apparatus further includes a sensor unit (LS) configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane (REF), a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.

公开(公告)号：SG132608A1

公开(公告)日：2007-06-28

申请号：SG2006077291

申请日：2006-11-07

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

Abstract: A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.

公开(公告)号：SG125108A1

公开(公告)日：2006-09-29

申请号：SG200401153

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： BRINKHOF RALPH ,  BOONMAN MARCUS EMILE JOANNES ,  DE NIVELLE MARTIN JULES MARIE-

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: An assembly according to an embodiment of the invention includes a sensor for determining at least one of tilt and height of a surface of a substrate in a lithographic apparatus. The substrate is moveable along at least one path substantially parallel to the surface of the substrate with respect to the sensor. The lithographic apparatus has an exposure scanning direction and the assembly is arranged to move the substrate relative to the sensor along the at least one path and to provide measurement data about the at least one of tilt and height along the at least one path. The assembly includes a memory configured to store the measurement data for use during a later exposure of the substrate by the lithographic apparatus. The at least one path of the substrate is at least partly at an angle to the exposure scanning direction.

公开(公告)号：SG114737A1

公开(公告)日：2005-09-28

申请号：SG200500901

申请日：2005-02-16

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BOONMAN MARCUS EMILE JOANNES ,  VAN DEN BIGGELAAR PETRUS MARIN

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

Abstract: The present invention discloses a lithographic apparatus a lithographic apparatus with an improved focus control system. The lithographic apparatus includes an illumination system (IL) configured to provide a beam of radiation (PB), a first support structure (MT) configured to support a patterning device (MA) that imparts the beam of radiation with a desired pattern in its cross-section, a second support structure (WT) that includes a substrate holder for holding a substrate (W), a projection system (PL) configured to project the patterned beam of radiation onto a target portion (C) on a surface of the substrate, and a servo unit (PW) configured to position the substrate holder. The apparatus further includes a sensor unit (LS) configured to determine a distance of at least one location point on the surface of the substrate relative to a reference plane (REF), a memory unit configured to store surface information of the substrate based on respective distances of corresponding the at least one location point on the substrate surface, and a calculating unit configured to determine a feed-forward set-point signal based on the stored surface information, such that the feed-forward set-point signal is forwardly fed to the servo unit in order to position the substrate holder.